Inventor · disambiguated record
Ryo Nonaka
Also filed as: NONAKA RYO
16 granted patents·6 pending applications·886 citations·filing 1993–2022
94Inventor score
Top patents by PatentIndex Score
22 records- 0197US6074518APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 13, 2000·276 cites·3 claims
- 0296US5997962APlasma process utilizing an electrostatic chuckTOKYO ELECTRON LTD·Filed 1996·Granted Dec 7, 1999·253 cites·11 claims
- 0390US7988062B2Temperature control device for target substrate, temperature control method and plasma processing apparatus including sameTOKYO ELECTRON LTD·Filed 2008·Granted Aug 2, 2011·16 cites·12 claims
- 0489US5310453APlasma process method using an electrostatic chuckTEL YAMANISHI KK·Filed 1993·Granted May 10, 1994·166 cites·14 claims
- 0587US5914568APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jun 22, 1999·95 cites·20 claims
- 0679US10408417B2Light-emitting device with light flux control member having prismatic elements on bottom surface forming acute angle with side edge of light sourceENPLAS CORP·Filed 2015·Granted Sep 10, 2019·3 cites·12 claims
- 0777US8950469B2Temperature control system and temperature control method for substrate mounting tableSASAKI YASUHARU·Filed 2010·Granted Feb 10, 2015·4 cites·6 claims
- 0875US7230202B2Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rodTOKYO ELECTRON LTD·Filed 2004·Granted Jun 12, 2007·9 cites·25 claims
- 0973US6492612B1Plasma apparatus and lower electrode thereofTOKYO ELECTRON LTD·Filed 1999·Granted Dec 10, 2002·49 cites·9 claims
- 1070US7005660B2Surface processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 28, 2006·8 cites·17 claims
- 1163US2025012008A1Urethane resin composition, synthetic leather, and method for producing synthetic leatherDAINIPPON INK & CHEMICALS·Filed 2022·Application pending·0 cites
- 1262US11578639B2Fan shroud and blower deviceMITSUBA CORP·Filed 2022·Granted Feb 14, 2023·0 cites·8 claims
- 1362US8132580B2Substrate processing system and substrate cleaning apparatus including a jetting apparatusMORIYA TSUYOSHI·Filed 2008·Granted Mar 13, 2012·1 cites·20 claims
- 1457US2007284085A1Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rodHAYASHI DAISUKE·Filed 2007·Application pending·0 cites
- 1553USD778334SLens for light emitting diodeENPLAS CORP·Filed 2015·Granted Feb 7, 2017·6 cites·1 claims
- 1651US9330891B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted May 3, 2016·0 cites·14 claims
- 1747US2009049981A1Mechanism for varying cylinder stop position and substrate processing apparatus including sameTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1846US2008226518A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1946US2009188428A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2045US11022842B2Planar light source device and display deviceENPLAS CORP·Filed 2017·Granted Jun 1, 2021·0 cites·5 claims
- 2144US2008314564A1Temperature control deviceTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2234US10418258B2Mounting table temperature control device and substrate processing apparatusNONAKA RYO·Filed 2012·Granted Sep 17, 2019·0 cites·5 claims
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