Assignee
HAYASHI DAISUKE
JP·22 granted patents·5 pending applications·88 citations·filing 2004–2012
Top patents by PatentIndex Score
27 records- 0190US8568554B2Movable gas introduction structure and substrate processing apparatus having sameHAYASHI DAISUKE·Filed 2009·Granted Oct 29, 2013·12 cites·12 claims
- 0289US9082593B2Electrode having gas discharge function and plasma processing apparatusHAYASHI DAISUKE·Filed 2012·Granted Jul 14, 2015·11 cites·19 claims
- 0388US8608856B2Sealing part and substrate processing apparatusHAYASHI DAISUKE·Filed 2006·Granted Dec 17, 2013·13 cites·20 claims
- 0487US8623172B2Gas flow path structure and substrate processing apparatusHAYASHI DAISUKE·Filed 2010·Granted Jan 7, 2014·8 cites·5 claims
- 0587US8537288B2Projector comprising an expanding and contracting member having a temperature coefficient that counters the increase and decrease of a focal distance of a projection lens caused by temperature changesHAYASHI DAISUKE·Filed 2010·Granted Sep 17, 2013·8 cites·11 claims
- 0684US8211232B2Substrate processing apparatusHAYASHI DAISUKE·Filed 2008·Granted Jul 3, 2012·5 cites·9 claims
- 0782US9550194B2Gas shower structure and substrate processing apparatusHAYASHI DAISUKE·Filed 2011·Granted Jan 24, 2017·2 cites·8 claims
- 0882US8283606B2Substrate processing apparatus and substrate stage used thereinHAYASHI DAISUKE·Filed 2008·Granted Oct 9, 2012·7 cites·7 claims
- 0980US8186832B2Projector having polarization conversion element array and light shielding sections provided thereonHAYASHI DAISUKE·Filed 2009·Granted May 29, 2012·6 cites·6 claims
- 1076US8852390B2Substrate processing apparatusHAYASHI DAISUKE·Filed 2010·Granted Oct 7, 2014·3 cites·9 claims
- 1171US8968513B2Plasma processing apparatusHAYASHI DAISUKE·Filed 2011·Granted Mar 3, 2015·2 cites·16 claims
- 1270US8522403B2Button as well as button body and fixture for such a buttonHAYASHI DAISUKE·Filed 2009·Granted Sep 3, 2013·3 cites·12 claims
- 1370US8444277B2Projector having light blocking members supported by corresponding supporting sectionsHAYASHI DAISUKE·Filed 2010·Granted May 21, 2013·2 cites·10 claims
- 1469US9366441B2Burner, combustor and remodeling method for burnerHAYASHI DAISUKE·Filed 2010·Granted Jun 14, 2016·1 cites·9 claims
- 1566US8206605B2Substrate processing method and substrate processing systemHAYASHI DAISUKE·Filed 2007·Granted Jun 26, 2012·2 cites·2 claims
- 1663US8465593B2Substrate processing apparatus and gas supply methodHAYASHI DAISUKE·Filed 2008·Granted Jun 18, 2013·2 cites·6 claims
- 1762US8941037B2Substrate processing apparatus, focus ring heating method, and substrate processing methodHAYASHI DAISUKE·Filed 2007·Granted Jan 27, 2015·1 cites·5 claims
- 1857US2007284085A1Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rodHAYASHI DAISUKE·Filed 2007·Application pending·0 cites
- 1951US8427409B2ProjectorHAYASHI DAISUKE·Filed 2008·Granted Apr 23, 2013·0 cites·12 claims
- 2050US9353951B2Burner, combustor and remodeling method for burnerHAYASHI DAISUKE·Filed 2011·Granted May 31, 2016·0 cites·1 claims
- 2147US8920598B2Electrode and plasma processing apparatusHAYASHI DAISUKE·Filed 2011·Granted Dec 30, 2014·0 cites·10 claims
- 2246US8629397B2Spectrophotometer and method for calibrating the sameHAYASHI DAISUKE·Filed 2012·Granted Jan 14, 2014·0 cites·3 claims
- 2344US8877005B2Plasma processing apparatus and electrode used thereinHAYASHI DAISUKE·Filed 2010·Granted Nov 4, 2014·0 cites·20 claims
- 2442US2007127888A1Audio and video recording and reproducing apparatus, audio and video recording method, and audio and video reproducing methodHAYASHI DAISUKE·Filed 2004·Application pending·0 cites
- 2542US2012073755A1Electrode and plasma processing apparatusHAYASHI DAISUKE·Filed 2011·Application pending·0 cites
- 2641US2012047109A1Data structure production method and backup deviceHAYASHI DAISUKE·Filed 2010·Application pending·0 cites
- 2741US2011074973A1Camera and recording method thereforHAYASHI DAISUKE·Filed 2010·Application pending·0 cites
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