Inventor · disambiguated record
Kazumasa Morishita
Also filed as: MORISHITA KAZUMASA
9 granted patents·39 citations·filing 1989–2012
83Inventor score
Files withFUJITSU SEMICONDUCTOR LTD3FUTATSUYA HIROKI2YAO TERUYOSHI2FUJITSU LTD1FUJITSU MICROELECTRONICS LTD1
Top patents by PatentIndex Score
9 records- 0180US7562334B2Method for manufacturing a photomaskFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Jul 14, 2009·4 cites·1 claims
- 0258US7926003B2Method for manufacturing a photomaskFUJITSU SEMICONDUCTOR LTD·Filed 2009·Granted Apr 12, 2011·0 cites·3 claims
- 0357US5046012APattern data processing methodFUJITSU LTD·Filed 1989·Granted Sep 3, 1991·32 cites·15 claims
- 0454US8037427B2Method for manufacturing a photomaskFUJITSU SEMICONDUCTOR LTD·Filed 2011·Granted Oct 11, 2011·0 cites·1 claims
- 0554US7732107B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureFUJITSU SEMICONDUCTOR LTD·Filed 2004·Granted Jun 8, 2010·3 cites·1 claims
- 0652US8316328B2Apparatus for manufacturing a photomaskFUTATSUYA HIROKI·Filed 2012·Granted Nov 20, 2012·0 cites·1 claims
- 0750US8553198B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureYAO TERUYOSHI·Filed 2012·Granted Oct 8, 2013·0 cites·2 claims
- 0850US8185848B2Apparatus for performing a manufacturing method of a photomaskFUTATSUYA HIROKI·Filed 2011·Granted May 22, 2012·0 cites·1 claims
- 0945US8227153B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureYAO TERUYOSHI·Filed 2010·Granted Jul 24, 2012·0 cites·1 claims
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