Inventor · disambiguated record
Takenori Narita
Also filed as: NARITA TAKENORI
7 granted patents·7 pending applications·89 citations·filing 1996–2018
84Inventor score
Files withIWANO TOMOHIRO5HITACHI CHEMICAL CO LTD4NARITA TAKENORI2ASAHI GLASS CO LTD1CONSORTIUM ADVANCED SEMICONDUCTOR MATERIALS & RELATED TECHNOLOGIES1
Top patents by PatentIndex Score
14 records- 0194US8728341B2Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrateRYUZAKI DAISUKE·Filed 2010·Granted May 20, 2014·39 cites·21 claims
- 0288US9988573B2Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2011·Granted Jun 5, 2018·7 cites·80 claims
- 0383US9982177B2Slurry, polishing fluid set, polishing fluid, and substrate polishing method using sameIWANO TOMOHIRO·Filed 2011·Granted May 29, 2018·6 cites·25 claims
- 0470US5905117ALow dielectric resin compositionASAHI GLASS CO LTD·Filed 1996·Granted May 18, 1999·33 cites·17 claims
- 0563US7554199B2Substrate for evaluationCONSORTIUM ADVANCED SEMICONDUCTOR MATERIALS & RELATED TECHNOLOGIES·Filed 2006·Granted Jun 30, 2009·3 cites·13 claims
- 0660US2018251680A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateHITACHI CHEMICAL CO LTD·Filed 2018·Application pending·0 cites
- 0756US10703947B2Slurry, polishing fluid set, polishing fluid, and substrate polishing method using sameHITACHI CHEMICAL CO LTD·Filed 2018·Granted Jul 7, 2020·0 cites·6 claims
- 0855US2013130501A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 0955US2013244431A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 1055US2013143404A1Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrateIWANO TOMOHIRO·Filed 2013·Application pending·0 cites
- 1152US8778803B2CPM slurry for silicon film polishing and polishing methodNARITA TAKENORI·Filed 2008·Granted Jul 15, 2014·1 cites·13 claims
- 1248US2010001229A1Cmp slurry for silicon filmHITACHI CHEMICAL CO LTD·Filed 2009·Application pending·0 cites
- 1341US2004253462A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmHITACHI CHEMICAL CO LTD·Filed 2004·Application pending·0 cites
- 1441US2006199021A1Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity filmNARITA TAKENORI·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →