Inventor · disambiguated record
Yoshihiro Umezawa
Also filed as: UMEZAWA YOSHIHIRO
13 granted patents·4 pending applications·130 citations·filing 1988–2024
88Inventor score
Top patents by PatentIndex Score
17 records- 0191US11804366B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 31, 2023·2 cites·13 claims
- 0285US5753568AMoisture-permeable, waterproof fabric and its production processKOMATSU SEIREN CO·Filed 1996·Granted May 19, 1998·57 cites·9 claims
- 0379US11101114B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 24, 2021·3 cites·6 claims
- 0475US4857001AElectrical connectors for leadless circuit boardsNIPPON TELEGRAPH & TELEPHONE·Filed 1988·Granted Aug 15, 1989·37 cites·10 claims
- 0572US10192774B2Temperature control device for processing target object and method of selectively etching nitride film from multilayer filmTOKYO ELECTRON LTD·Filed 2015·Granted Jan 29, 2019·2 cites·6 claims
- 0670US5626950AMoisture permeable, waterproof fabric and its production processKOMATSU SEIREN CO·Filed 1994·Granted May 6, 1997·29 cites·4 claims
- 0765US11348768B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted May 31, 2022·0 cites·13 claims
- 0860US2024186125A1Plasma processing apparatus, plasma state detection method, and plasma state detection programTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0959US2021320009A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1050US12340975B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 24, 2025·0 cites·14 claims
- 1148US2016260582A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1247US11935731B2Plasma processing apparatus, plasma state detection method, and plasma state detection programTOKYO ELECTRON LTD·Filed 2019·Granted Mar 19, 2024·0 cites·12 claims
- 1346US2019131136A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1439US10204766B2Ion beam irradiation apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Feb 12, 2019·0 cites·12 claims
- 1538US10510514B2Gas supply mechanism and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Dec 17, 2019·0 cites·13 claims
- 1637US10685816B2Method of etching object to be processedTOKYO ELECTRON LTD·Filed 2016·Granted Jun 16, 2020·0 cites·6 claims
- 1734US10950467B2Gas supply mechanism and semiconductor manufacturing systemTOKYO ELECTRON LTD·Filed 2017·Granted Mar 16, 2021·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →