Plasma processing apparatus

Abstract

A baffle structure of a plasma processing apparatus includes a first member and at least one second member. The first member includes a cylindrical portion extending between a placement table and a processing container. A plurality of vertically elongated through holes are formed in the cylindrical portion to be arranged in the circumferential direction. The at least one second member is disposed in the outside of the cylindrical portion of the first member in the radial direction. The at least one second member is arranged to form a cylindrical body having an inner diameter larger than the outer diameter of the cylindrical portion. The vertical positions of a plurality of second members may be individually changed. Or, the horizontal position of a single second member may be changed. Or, the single second member may be made to be inclined.

What is claimed is: 
     
         1 . A plasma processing apparatus for performing a plasma processing on an object to be processed (“workpiece”), the plasma processing apparatus comprising:
 a processing container; 
 a placement table provided within the processing container and including a placement region on which the workpiece is placed; 
 a baffle structure interposed between the placement table and the processing container at a location below the placement region to define a first space in which the placement region is disposed and a second space below the placement region, the baffle structure including:
 a first member that includes a cylindrical portion extending between the placement table and the processing container, a plurality of vertically elongated through holes being formed to be arranged in a circumferential direction, and 
 at least one second member disposed in an outside of the cylindrical portion of the first member in a radial direction, the second member being configured to be arranged to form a cylindrical body having an inner diameter larger than an outer diameter of the cylindrical portion; 
 
 a gas supply portion connected to the first space; 
 an exhaust apparatus connected to the second space; and 
 a driving mechanism configured to: move the at least one second member in a vertical direction, individually move a plurality of circumferential areas of the cylindrical body in the vertical direction, and move the at least one member in the radial direction, or make the at least one second member inclined with respect to the vertical direction. 
 
     
     
         2 . The plasma processing apparatus of  claim 1 , wherein the at least one second member is a plurality of second members, the plurality of second members are configured to be arranged in the circumferential direction to form the cylindrical body, and the driving mechanism is configured to individually move the plurality of second members in the vertical direction. 
     
     
         3 . The plasma processing apparatus of  claim 1 , wherein the at least one second member is a single second member, and the driving mechanism is configured to move the single second member in the vertical direction and in the radial direction. 
     
     
         4 . The plasma processing apparatus of  claim 1 , wherein the at least one second member is a single second member, and the driving mechanism is configured to move the single second member in the vertical direction and make the single second member inclined with respect to the vertical direction.