Inventor · disambiguated record
Michael Barnes
Also filed as: BARNES MICHAEL · BARNES MICHAEL S · BARNES MICHAEL SCOTT
123 granted patents·24 pending applications·10,915 citations·filing 1991–2024
99Inventor score
Top patents by PatentIndex Score
147 records- 0199US7915139B1CVD flowable gap fillNOVELLUS SYSTEMS INC·Filed 2009·Granted Mar 29, 2011·807 cites·25 claims
- 0299US7888233B1Flowable film dielectric gap fill processNOVELLUS SYSTEMS INC·Filed 2009·Granted Feb 15, 2011·572 cites·30 claims
- 0399US7582555B1CVD flowable gap fillNOVELLUS SYSTEMS INC·Filed 2005·Granted Sep 1, 2009·605 cites·20 claims
- 0499US7524735B1Flowable film dielectric gap fill processNOVELLUS SYSTEMS INC·Filed 2006·Granted Apr 28, 2009·166 cites·19 claims
- 0599US6303523B2Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 1998·Granted Oct 16, 2001·751 cites·53 claims
- 0699US5178739AApparatus for depositing material into high aspect ratio holesIBM·Filed 1991·Granted Jan 12, 1993·429 cites·24 claims
- 0798US9857618B2Display enclosure with passive cooling systemBARNES MICHAEL S·Filed 2015·Granted Jan 2, 2018·54 cites·19 claims
- 0898US8809161B2Flowable film dielectric gap fill processNOVELLUS SYSTEMS INC·Filed 2013·Granted Aug 19, 2014·21 cites·27 claims
- 0998US7955986B2Capacitively coupled plasma reactor with magnetic plasma controlAPPLIED MATERIALS INC·Filed 2006·Granted Jun 7, 2011·70 cites·13 claims
- 1098US6170429B1Chamber liner for semiconductor process chambersLAM RES CORP·Filed 1998·Granted Jan 9, 2001·233 cites·15 claims
- 1197US6939434B2Externally excited torroidal plasma source with magnetic control of ion distributionAPPLIED MATERIALS INC·Filed 2002·Granted Sep 6, 2005·72 cites·48 claims
- 1297US6853141B2Capacitively coupled plasma reactor with magnetic plasma controlFiled 2002·Granted Feb 8, 2005·140 cites·30 claims
- 1397US6617794B2Method for controlling etch uniformityAPPLIED MATERIALS INC·Filed 2001·Granted Sep 9, 2003·87 cites·31 claims
- 1497US6583071B1Ultrasonic spray coating of liquid precursor for low K dielectric coatingsAPPLIED MATERIALS INC·Filed 2000·Granted Jun 24, 2003·146 cites·14 claims
- 1597US6562690B1Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 2000·Granted May 13, 2003·102 cites·26 claims
- 1697US6507155B1Inductively coupled plasma source with controllable power depositionAPPLIED MATERIALS INC·Filed 2000·Granted Jan 14, 2003·106 cites·61 claims
- 1797US6414648B1Plasma reactor having a symmetric parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·142 cites·36 claims
- 1897US6348725B2Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 1999·Granted Feb 19, 2002·161 cites·38 claims
- 1997US5800619AVacuum plasma processor having coil with minimum magnetic field in its centerLAM RES CORP·Filed 1996·Granted Sep 1, 1998·111 cites·41 claims
- 2097US5679215AMethod of in situ cleaning a vacuum plasma processing chamberLAM RES CORP·Filed 1996·Granted Oct 21, 1997·609 cites·20 claims
- 2196US7244672B2Selective etching of organosilicate films over silicon oxide stop etch layersAPPLIED MATERIALS INC·Filed 2005·Granted Jul 17, 2007·36 cites·18 claims
- 2296US6734115B2Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 2002·Granted May 11, 2004·67 cites·12 claims
- 2396US6685798B1Plasma reactor having a symmetrical parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Feb 3, 2004·75 cites·13 claims
- 2496US6660656B2Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 2001·Granted Dec 9, 2003·111 cites·11 claims
- 2596US6596655B1Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 2001·Granted Jul 22, 2003·77 cites·20 claims
- 2696US6569257B1Method for cleaning a process chamberAPPLIED MATERIALS INC·Filed 2000·Granted May 27, 2003·86 cites·67 claims
- 2796US6541282B1Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 2000·Granted Apr 1, 2003·80 cites·17 claims
- 2896US6277237B1Chamber liner for semiconductor process chambersLAM RES CORP·Filed 2000·Granted Aug 21, 2001·75 cites·12 claims
- 2996US6042687AMethod and apparatus for improving etch and deposition uniformity in plasma semiconductor processingLAM RES CORP·Filed 1997·Granted Mar 28, 2000·185 cites·29 claims
- 3096US6013155AGas injection system for plasma processingLAM RES CORP·Filed 1997·Granted Jan 11, 2000·294 cites·29 claims
- 3196US5689215AMethod of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processorLAM RES CORP·Filed 1996·Granted Nov 18, 1997·137 cites·35 claims
- 3296US5505816AEtching of silicon dioxide selectively to silicon nitride and polysiliconIBM·Filed 1993·Granted Apr 9, 1996·328 cites·15 claims
- 3395US8580697B1CVD flowable gap fillLANG CHI-I·Filed 2011·Granted Nov 12, 2013·44 cites·19 claims
- 3495US8481403B1Flowable film dielectric gap fill processGAURI VISHAL·Filed 2011·Granted Jul 9, 2013·30 cites·25 claims
- 3595US7901539B2Apparatus and methods for transporting and processing substratesINTEVAC INC·Filed 2006·Granted Mar 8, 2011·28 cites·11 claims
- 3695US7560377B2Plasma processes for depositing low dielectric constant filmsAPPLIED MATERIALS INC·Filed 2005·Granted Jul 14, 2009·19 cites·16 claims
- 3795US6962644B2Tandem etch chamber plasma processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Nov 8, 2005·108 cites·35 claims
- 3895US6893533B2Plasma reactor having a symmetric parallel conductor coil antennaFiled 2003·Granted May 17, 2005·64 cites·22 claims
- 3995US6818096B2Plasma reactor electrodeFiled 2001·Granted Nov 16, 2004·80 cites·15 claims
- 4095US6462481B1Plasma reactor having a symmetric parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Oct 8, 2002·68 cites·41 claims
- 4195US5892198AMethod of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for sameLAM RES CORP·Filed 1996·Granted Apr 6, 1999·102 cites·31 claims
- 4295US5241245AOptimized helical resonator for plasma processingIBM·Filed 1992·Granted Aug 31, 1993·158 cites·8 claims
- 4394US8349196B2System and method for commercial fabrication of patterned mediaINTEVAC INC·Filed 2008·Granted Jan 8, 2013·17 cites·14 claims
- 4494US6829056B1Monitoring dimensions of features at different locations in the processing of substratesFiled 2003·Granted Dec 7, 2004·107 cites·19 claims
- 4594US6706138B2Adjustable dual frequency voltage dividing plasma reactorAPPLIED MATERIALS INC·Filed 2001·Granted Mar 16, 2004·56 cites·12 claims
- 4694US6694915B1Plasma reactor having a symmetrical parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Feb 24, 2004·60 cites·38 claims
- 4794US6280563B1Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasmaLAM RES CORP·Filed 1997·Granted Aug 28, 2001·101 cites·27 claims
- 4894US5835334AVariable high temperature chuck for high density plasma chemical vapor depositionLAM RESEARCH·Filed 1996·Granted Nov 10, 1998·269 cites·51 claims
- 4994US5650032AApparatus for producing an inductive plasma for plasma processesIBM·Filed 1995·Granted Jul 22, 1997·92 cites·26 claims
- 5092US8303764B2Apparatus and methods for transporting and processing substratesBLUCK TERRY·Filed 2011·Granted Nov 6, 2012·13 cites·20 claims
Showing the top 50 of 147 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →