Inventor · disambiguated record
Toshihiko Tsuji
Also filed as: TSUJI TOSHIHIKO
57 granted patents·10 pending applications·1,560 citations·filing 1975–2012
99Inventor score
Top patents by PatentIndex Score
67 records- 0197US7265816B2Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generatorCANON KK·Filed 2005·Granted Sep 4, 2007·44 cites·8 claims
- 0297US5486919AInspection method and apparatus for inspecting a particle, if any, on a substrate having a patternCANON KK·Filed 1993·Granted Jan 23, 1996·155 cites·28 claims
- 0397US5424552AProjection exposing apparatusNIKON CORP·Filed 1993·Granted Jun 13, 1995·162 cites·32 claims
- 0496US7538856B2Illumination optical system and exposure apparatus including the sameCANON KK·Filed 2008·Granted May 26, 2009·36 cites·6 claims
- 0595US7239375B2Illumination apparatus, exposure apparatus and device manufacturing methodCANON KK·Filed 2006·Granted Jul 3, 2007·19 cites·9 claims
- 0695US7130025B2Illumination apparatus, exposure apparatus and device manufacturing methodCANON KK·Filed 2005·Granted Oct 31, 2006·21 cites·6 claims
- 0791US5767962AInspection system and device manufacturing method using the sameCANON KK·Filed 1996·Granted Jun 16, 1998·102 cites·7 claims
- 0891US5270794AFine structure evaluation apparatus and methodCANON KK·Filed 1992·Granted Dec 14, 1993·97 cites·21 claims
- 0988US5137349AProjection-type optical apparatusNIKON CORP·Filed 1990·Granted Aug 11, 1992·63 cites·4 claims
- 1085US6885432B2Projection exposure apparatus and device manufacturing methodCANON KK·Filed 2003·Granted Apr 26, 2005·19 cites·9 claims
- 1182US7116396B2Exposure device, exposure method and device manufacturing methodNIKON CORP·Filed 2004·Granted Oct 3, 2006·20 cites·40 claims
- 1282US6922910B2Exposure apparatusNIKON CORP·Filed 2003·Granted Aug 2, 2005·20 cites·22 claims
- 1382US6549277B1Illuminance meter, illuminance measuring method and exposure apparatusNIKON CORP·Filed 2000·Granted Apr 15, 2003·31 cites·23 claims
- 1482US6392742B1Illumination system and projection exposure apparatusCANON KK·Filed 1999·Granted May 21, 2002·46 cites·25 claims
- 1581US6919951B2Illumination system, projection exposure apparatus and device manufacturing methodCANON KK·Filed 2002·Granted Jul 19, 2005·19 cites·4 claims
- 1681US6816234B2Illumination optical system in exposure apparatusCANON KK·Filed 2001·Granted Nov 9, 2004·16 cites·22 claims
- 1781US6285855B1Illumination system and exposure apparatus having the sameCANON KK·Filed 1998·Granted Sep 4, 2001·46 cites·22 claims
- 1881US6151122AInspection method and apparatus for projection optical systemsNIKON CORP·Filed 1999·Granted Nov 21, 2000·34 cites·153 claims
- 1981US5432603AOptical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detectedCANON KK·Filed 1993·Granted Jul 11, 1995·36 cites·13 claims
- 2080US5461474AInspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the sameCANON KK·Filed 1994·Granted Oct 24, 1995·49 cites·26 claims
- 2179US6850327B2Inspection method and apparatus for projection optical systemsNIKON CORP·Filed 2002·Granted Feb 1, 2005·12 cites·27 claims
- 2277US5798838AProjection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the sameNIKON CORP·Filed 1996·Granted Aug 25, 1998·40 cites·26 claims
- 2376US7714987B2Exposure apparatusCANON KK·Filed 2007·Granted May 11, 2010·4 cites·7 claims
- 2476US7274435B2Exposure apparatus and device fabrication method using the sameCANON KK·Filed 2003·Granted Sep 25, 2007·20 cites·6 claims
- 2576US6542222B1Beam output control method, beam output apparatus and exposure system, and device manufacturing method using the exposure systemNIKON CORP·Filed 2000·Granted Apr 1, 2003·23 cites·20 claims
- 2676US5652657AInspection system for original with pellicleCANON KK·Filed 1995·Granted Jul 29, 1997·44 cites·6 claims
- 2775US5894341AExposure apparatus and method for measuring a quantity of light with temperature variationsNIKON CORP·Filed 1996·Granted Apr 13, 1999·34 cites·77 claims
- 2875US5751426APositional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same objectCANON KK·Filed 1995·Granted May 12, 1998·37 cites·14 claims
- 2973US5861952AOptical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection positionCANON KK·Filed 1992·Granted Jan 19, 1999·37 cites·8 claims
- 3072US6169602B1Inspection method and apparatus for projection optical systemsNIKON CORP·Filed 1999·Granted Jan 2, 2001·31 cites·41 claims
- 3172US4052588AElectric heater panelNIPPON KINZOKU CO LTD·Filed 1975·Granted Oct 4, 1977·27 cites·2 claims
- 3271US9329376B2Imaging apparatusHIGAKI YOSHINARI·Filed 2012·Granted May 3, 2016·2 cites·14 claims
- 3371US5585918AForeign particle inspecting systemCANON KK·Filed 1995·Granted Dec 17, 1996·39 cites·10 claims
- 3470US7106414B2Exposure system and method for manufacturing deviceSENDAI NIKON CORP·Filed 2004·Granted Sep 12, 2006·11 cites·21 claims
- 3566US6525817B1Inspection method and apparatus for projection optical systemsNIKON CORP·Filed 2000·Granted Feb 25, 2003·6 cites·45 claims
- 3665US5591985ASurface state inspecting system including a scanning optical system for scanning a surface to be inspected with a first light and for simultaneously scanning a diffraction grating with a second lightCANON KK·Filed 1995·Granted Jan 7, 1997·27 cites·8 claims
- 3763US6603532B2Illuminance measurement apparatus, exposure apparatus, and exposure methodNIKON CORP·Filed 2001·Granted Aug 5, 2003·8 cites·10 claims
- 3862US7064806B2Illumination optical system and exposure apparatusCANON KK·Filed 2004·Granted Jun 20, 2006·5 cites·18 claims
- 3962US6903799B2Exposure method and exposure apparatusNIKON CORP·Filed 2003·Granted Jun 7, 2005·6 cites·30 claims
- 4062US6806477B1Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the sameCANON KK·Filed 2000·Granted Oct 19, 2004·6 cites·20 claims
- 4161US8891062B2Illumination optical system, exposure apparatus, and method of manufacturing deviceTSUJI TOSHIHIKO·Filed 2011·Granted Nov 18, 2014·1 cites·9 claims
- 4261US8035668B2Exposure apparatus and device manufacturing methodCANON KK·Filed 2006·Granted Oct 11, 2011·1 cites·14 claims
- 4361US6946666B2Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the sameCANON KK·Filed 1998·Granted Sep 20, 2005·20 cites·12 claims
- 4457US7324187B2Illumination system and exposure apparatusCANON KK·Filed 2004·Granted Jan 29, 2008·4 cites·6 claims
- 4555US7110084B2Illumination optical system and exposure apparatusCANON KK·Filed 2004·Granted Sep 19, 2006·3 cites·16 claims
- 4655US4227166AReactorNIPPON KINZOKU CO LTD·Filed 1978·Granted Oct 7, 1980·11 cites·5 claims
- 4752US6211947B1Illuminance distribution measuring method, exposing method and device manufacturing methodNIKON CORP·Filed 1998·Granted Apr 3, 2001·13 cites·16 claims
- 4852US4390209APlastic seat-back framework and method for the manufacture thereofTOYO KOGYO CO·Filed 1981·Granted Jun 28, 1983·22 cites·3 claims
- 4950US6753943B2Scanning exposure apparatus and device manufacturing method using the sameCANON KK·Filed 2001·Granted Jun 22, 2004·2 cites·10 claims
- 5050US5742386AApparatus for detecting foreign matter on a substrate, and an exposure apparatus including the sameCANON KK·Filed 1997·Granted Apr 21, 1998·14 cites·10 claims
Showing the top 50 of 67 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →