Inventor · disambiguated record
Sharma Pamarthy
Also filed as: PAMARTHY SHARMA · PAMARTHY SHARMA V
9 granted patents·4 pending applications·104 citations·filing 2000–2014
88Inventor score
Top patents by PatentIndex Score
13 records- 0190US8753474B2Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactorNANGOY ROY C·Filed 2010·Granted Jun 17, 2014·11 cites·14 claims
- 0283US6979652B2Etching multi-shaped openings in siliconAPPLIED MATERIALS INC·Filed 2002·Granted Dec 27, 2005·30 cites·28 claims
- 0382US8475625B2Apparatus for etching high aspect ratio featuresPAMARTHY SHARMA·Filed 2006·Granted Jul 2, 2013·15 cites·22 claims
- 0482US8158522B2Method of forming a deep trench in a substrateSIRAJUDDIN KHALID M·Filed 2010·Granted Apr 17, 2012·10 cites·16 claims
- 0578US6593244B1Process for etching conductors at high etch ratesAPPLIED MATERIALS INC·Filed 2000·Granted Jul 15, 2003·22 cites·13 claims
- 0667US6897155B2Method for etching high-aspect-ratio featuresAPPLIED MATERIALS INC·Filed 2002·Granted May 24, 2005·11 cites·19 claims
- 0766US9070633B2Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted Jun 30, 2015·1 cites·6 claims
- 0852US6905616B2Method of releasing devices from a substrateAPPLIED MATERIALS INC·Filed 2003·Granted Jun 14, 2005·4 cites·9 claims
- 0946US2009272717A1Method and apparatus of a substrate etching system and processAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 1039US9039908B2Post etch reactive plasma milling to smooth through substrate via sidewalls and other deeply etched featuresFARR JON·Filed 2008·Granted May 26, 2015·0 cites·16 claims
- 1137US2003153195A1Method and apparatus for providing modulated bias power to a plasma etch reactorAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 1235US2003052088A1Method for increasing capacitance in stacked and trench capacitorsFiled 2001·Application pending·0 cites
- 1334US2011217832A1Method of filling a deep trench in a substrateRAORANE DIGVIJAY·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →