Inventor · disambiguated record
Ilya Lavitsky
Also filed as: LAVITSKY ILYA
22 granted patents·8 pending applications·281 citations·filing 2002–2022
95Inventor score
Top patents by PatentIndex Score
30 records- 0197US11915918B2Cleaning of sin with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2021·Granted Feb 27, 2024·4 cites·8 claims
- 0297USD934315SDeposition ring for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Oct 26, 2021·35 cites·1 claims
- 0393USD941372SProcess shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 18, 2022·19 cites·1 claims
- 0493USD937329SSputter target for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2020·Granted Nov 30, 2021·19 cites·1 claims
- 0593US6730174B2Unitary removable shield assemblyAPPLIED MATERIALS INC·Filed 2002·Granted May 4, 2004·51 cites·24 claims
- 0692US10998172B2Substrate processing chamber having improved process volume sealingAPPLIED MATERIALS INC·Filed 2018·Granted May 4, 2021·4 cites·17 claims
- 0791US11670493B2Isolator ring clamp and physical vapor deposition chamber incorporating sameAPPLIED MATERIALS INC·Filed 2020·Granted Jun 6, 2023·2 cites·20 claims
- 0891USD941371SProcess shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 18, 2022·17 cites·1 claims
- 0991US7569125B2Shields usable with an inductively coupled plasma reactorAPPLIED MATERIALS INC·Filed 2005·Granted Aug 4, 2009·16 cites·17 claims
- 1090USD970566SSputter target for a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2021·Granted Nov 22, 2022·12 cites·1 claims
- 1188US8865602B2Edge ring lipAPPLIED MATERIALS INC·Filed 2012·Granted Oct 21, 2014·8 cites·14 claims
- 1287US7041201B2Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewithAPPLIED MATERIALS INC·Filed 2003·Granted May 9, 2006·31 cites·18 claims
- 1382US7670436B2Support ring assemblyAPPLIED MATERIALS INC·Filed 2004·Granted Mar 2, 2010·26 cites·13 claims
- 1482US6776848B2Motorized chamber lidAPPLIED MATERIALS INC·Filed 2002·Granted Aug 17, 2004·21 cites·21 claims
- 1569US12027354B2Cleaning of SIN with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2022·Granted Jul 2, 2024·0 cites·10 claims
- 1665US9928997B2Apparatus for PVD dielectric depositionAPPLIED MATERIALS INC·Filed 2015·Granted Mar 27, 2018·1 cites·18 claims
- 1764US9564348B2Shutter blade and robot blade with CTE compensationAPPLIED MATERIALS INC·Filed 2014·Granted Feb 7, 2017·1 cites·20 claims
- 1863US11339466B2Heated shield for physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2020·Granted May 24, 2022·0 cites·20 claims
- 1962US11618943B2PVD target having self-retained low friction padsAPPLIED MATERIALS INC·Filed 2020·Granted Apr 4, 2023·0 cites·17 claims
- 2061US2008116067A1Physical vapor deposition chamber having an adjustable targetLAVITSKY ILYA·Filed 2007·Application pending·0 cites
- 2160US7371285B2Motorized chamber lidAPPLIED MATERIALS INC·Filed 2004·Granted May 13, 2008·8 cites·12 claims
- 2250US6688838B2Cleanroom lift having an articulated armAPPLIED MATERIALS INC·Filed 2002·Granted Feb 10, 2004·5 cites·17 claims
- 2349US2006096851A1Physical vapor deposition chamber having an adjustable targetLAVITSKY ILYA·Filed 2004·Application pending·0 cites
- 2449US2007151841A1Flexible magnetron including partial rolling support and centering pinsAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2548USD1037954SSelf-retained low friction padAPPLIED MATERIALS INC·Filed 2020·Granted Aug 6, 2024·1 cites·1 claims
- 2648US2021043432A1Substrate support systemAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2745US2020312683A1Substrate support pedestalAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2844US2020013592A1Methods and apparatus for linear scan physical vapor deposition with reduced chamber footprintAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2941US2020321202A1Shield kit for process chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3040US2006096857A1Physical vapor deposition chamber having a rotatable substrate pedestalLAVITSKY ILYA·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →