Inventor · disambiguated record
Hiroshi Nishizato
Also filed as: NISHIZATO HIROSHI
13 granted patents·2 pending applications·351 citations·filing 1988–2025
93Inventor score
Files withAPPLIED MATERIALS INC7HORIBA STEC CO LTD5CLARION CO LTD1MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1STEC INC1
Top patents by PatentIndex Score
15 records- 0189US5419924AChemical vapor deposition method and apparatus thereforeAPPLIED MATERIALS INC·Filed 1994·Granted May 30, 1995·77 cites·24 claims
- 0287US10138555B2Gas control system and program for gas control systemHORIBA STEC CO LTD·Filed 2016·Granted Nov 27, 2018·3 cites·7 claims
- 0387US5203925AApparatus for producing a thin film of tantalum oxideMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1992·Granted Apr 20, 1993·64 cites·4 claims
- 0484US10927462B2Gas control system and film formation apparatus provided with gas control systemHORIBA STEC CO LTD·Filed 2017·Granted Feb 23, 2021·4 cites·12 claims
- 0582US6752387B1Method and an apparatus for mixing and gasifying a reactant gas-liquid mixtureSTEC INC·Filed 2000·Granted Jun 22, 2004·33 cites·14 claims
- 0679US4879487ASurface-acoustic-wave deviceCLARION CO LTD·Filed 1988·Granted Nov 7, 1989·27 cites·6 claims
- 0773US5440887ALiquid vaporizer-feederAPPLIED MATERIALS INC·Filed 1993·Granted Aug 15, 1995·30 cites·7 claims
- 0870US5645642AMethod for in-situ liquid flow rate estimation and verificationAPPLIED MATERIALS INC·Filed 1996·Granted Jul 8, 1997·35 cites·8 claims
- 0965US5520969AMethod for in-situ liquid flow rate estimation and verificationAPPLIED MATERIALS INC·Filed 1994·Granted May 28, 1996·20 cites·9 claims
- 1061US5531183AVaporization sequence for multiple liquid precursors used in semiconductor thin film applicationsAPPLIED MATERIALS INC·Filed 1994·Granted Jul 2, 1996·29 cites·24 claims
- 1159US2025315067A1Fluid control device, control method for a fluid control valve, fluid control method, and fluid control programHORIBA STEC CO LTD·Filed 2025·Application pending·0 cites
- 1252US5272880ALiquid vaporizer-feederAPPLIED MATERIALS INC·Filed 1992·Granted Dec 28, 1993·18 cites·8 claims
- 1346US6464782B1Apparatus for vaporization sequence for multiple liquid precursors used in semiconductor thin film applicationsAPPLIED MATERIALS INC·Filed 1996·Granted Oct 15, 2002·11 cites·20 claims
- 1445US10747239B2Fluid control device, fluid control method, and program recording medium recorded with program for fluid control deviceHORIBA STEC CO LTD·Filed 2018·Granted Aug 18, 2020·0 cites·10 claims
- 1538US2019242818A1Absorbance meter and semiconductor manufacturing device using absorbance meterHORIBA STEC CO LTD·Filed 2017·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Hiroshi Nishizato files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →