Inventor · disambiguated record
Mitsunori Toyoda
Also filed as: TOYODA MITSUNORI
14 granted patents·14 pending applications·281 citations·filing 2000–2018
93Inventor score
Top patents by PatentIndex Score
28 records- 0196US6913373B2Optical illumination device, exposure device and exposure methodNIKON CORP·Filed 2003·Granted Jul 5, 2005·136 cites·34 claims
- 0295US6741394B1Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatusNIKON CORP·Filed 2000·Granted May 25, 2004·63 cites·46 claims
- 0391US7095560B2Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure methodNIKON CORP·Filed 2004·Granted Aug 22, 2006·44 cites·47 claims
- 0490US9164209B2Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization directionTOYODA MITSUNORI·Filed 2011·Granted Oct 20, 2015·5 cites·29 claims
- 0589US8305552B2Exposure apparatus, exposure method, and method for producing deviceNISHINAGA HISASHI·Filed 2006·Granted Nov 6, 2012·10 cites·20 claims
- 0687US9885872B2Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of lightNIPPON KOGAKU KK·Filed 2013·Granted Feb 6, 2018·5 cites·49 claims
- 0783US8139198B2Exposure apparatus, exposure method, and method for producing deviceNISHINAGA HISASHI·Filed 2006·Granted Mar 20, 2012·5 cites·12 claims
- 0880US10025194B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2016·Granted Jul 17, 2018·1 cites·15 claims
- 0976US9513558B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2014·Granted Dec 6, 2016·1 cites·38 claims
- 1076US8749759B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2012·Granted Jun 10, 2014·1 cites·30 claims
- 1175US10281632B2Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization directionTOYODA MITSUNORI·Filed 2011·Granted May 7, 2019·1 cites·30 claims
- 1269US7618767B2Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure methodNIKON CORP·Filed 2006·Granted Nov 17, 2009·2 cites·51 claims
- 1365US2018348643A1Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2018·Application pending·0 cites
- 1464US2017351100A1Beam transforming optical system, illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thickness to rotate linear polarization directionTOYODA MITSUNORI·Filed 2017·Application pending·0 cites
- 1563US7379160B2Optical integrator, illumination optical device, exposure apparatus, and exposure methodNIKON CORP·Filed 2003·Granted May 27, 2008·7 cites·38 claims
- 1660US2009147235A1Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknessesNIKON CORP·Filed 2009·Application pending·0 cites
- 1760US2009147233A1Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknessesNIKON CORP·Filed 2009·Application pending·0 cites
- 1859US2015338663A1Beam transforming optical system, illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thickness to rotate linear polarization directionNIKON CORP·Filed 2015·Application pending·0 cites
- 1954US2009323041A1Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknessesNIKON CORP·Filed 2009·Application pending·0 cites
- 2053US2009147234A1Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknessesNIKON CORP·Filed 2009·Application pending·0 cites
- 2149US2006158624A1Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure methodNIKON CORP·Filed 2005·Application pending·0 cites
- 2247US2010002219A1Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure methodNIKON CORP·Filed 2009·Application pending·0 cites
- 2343US2004263817A1Illumination optical apparatus and exposure apparatus provided with illumination optical apparatusNIKON CORP·Filed 2004·Application pending·0 cites
- 2442US2004174512A1Illumination optical apparatus, exposure apparatus and method of exposureNIKON CORP·Filed 2004·Application pending·0 cites
- 2541US2004125459A1Optical integrator, illumination optical apparatus, exposure apparatus, and observation apparatusNIKON CORP·Filed 2003·Application pending·0 cites
- 2641US2002085276A1Illumination optical apparatus and exposure apparatus provided with illumination optical apparatusNIKON CORP·Filed 2001·Application pending·0 cites
- 2740US2003038931A1Illumination optical apparatus, exposure apparatus and method of exposureNIKON CORP·Filed 2002·Application pending·0 cites
- 2839US7307693B2Illumination optical device, photolithography machine, and exposure methodNIKON CORP·Filed 2003·Granted Dec 11, 2007·0 cites·20 claims
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