Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses

Abstract

A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis of the incident beam; and a second basic element made of an optical material with optical activity, for forming a second region distribution of the predetermined light intensity distribution on the basis of the incident beam, wherein the first basic element and the second basic element have their respective thicknesses different from each other along a direction of transmission of light.

1 . A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam, comprising:
 a first basic element made of an optical material with optical activity, which forms a first region distribution of the predetermined light intensity distribution on the basis of the incident beam; and   a second basic element made of an optical material with optical activity, which forms a second region distribution of the predetermined light intensity distribution on the basis of the incident beam,   wherein the first basic element and the second basic element have their respective thicknesses different from each other along a direction of transmission of light.   
     
     
         2 . The beam transforming element according to  claim 1 , wherein the thickness of the first basic element and the thickness of the second basic element are so set that with incidence of linearly polarized light a direction of polarization of linearly polarized light forming the first region distribution is different from a direction of polarization of linearly polarized light forming the second region distribution. 
     
     
         3 . The beam transforming element according to  claim 2 , wherein the first region distribution and the second region distribution are positioned in at least a part of a predetermined annular region, which is a predetermined annular region centered around a predetermined point on the predetermined surface, and
 wherein beams passing through the first region distribution and through the second region distribution have a polarization state in which a principal component is linearly polarized light having a direction of polarization along a circumferential direction of the predetermined annular region.   
     
     
         4 . The beam transforming element according to  claim 3 , wherein the predetermined light intensity distribution has a contour of a shape substantially identical with the predetermined annular region,
 wherein the polarization state of the beam passing through the first region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the first region distribution, and   wherein the polarization state of the beam passing through the second region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the second region distribution.   
     
     
         5 . The beam transforming element according to  claim 3 , wherein the predetermined light intensity distribution is a distribution of a multipole shape in the predetermined annular region,
 wherein the polarization state of the beam passing through the first region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the first region distribution, and   wherein the polarization state of the beam passing through the second region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the second region distribution.   
     
     
         6 . The beam transforming element according to  claim 3 , the beam transforming element including substantially the same number of said first basic elements and said second basic elements. 
     
     
         7 . The beam transforming element according to  claim 6 , further comprising:
 a third basic element made of an optical material with optical activity that forms a third region distribution of the predetermined light intensity distribution on the basis of the incident beam; and   a fourth basic element made of an optical material with optical activity, that forms a fourth region distribution of the predetermined light intensity distribution on the basis of the incident beam.   
     
     
         8 . The beam transforming element according to  claim 3 , wherein the first basic element and the second basic element have diffracting action or refracting action. 
     
     
         9 . The beam transforming element according to  claim 8 , wherein the first basic element forms at least two said first region distributions on the predetermined surface on the basis of the incident beam, and
 wherein the second basic element forms at least two said second region distributions on the predetermined surface on the basis of the incident beam.   
     
     
         10 . The beam transforming element according to  claim 3 , wherein the first basic element and the second basic element are integrally formed. 
     
     
         11 . The beam transforming element according to  claim 3 , the beam transforming element being used in an illumination optical apparatus for illuminating a surface to be illuminated, based on a beam from a light source,
 wherein an illumination pupil distribution is formed on or near an illumination pupil of the illumination optical apparatus.   
     
     
         12 . The beam transforming element according to  claim 1 , wherein the first basic element and the second basic element are made of an optical material with an optical rotatory power of not less than 100°/mm for light of a wavelength used. 
     
     
         13 . The beam transforming element according to  claim 12 , wherein the first basic element and the second basic element are made of crystalline quartz. 
     
     
         14 . The beam transforming element according to  claim 1 , wherein the first basic element and the second basic element are integrally formed. 
     
     
         15 . The beam transforming element according to  claim 14 , the beam transforming element being used in an illumination optical apparatus for illuminating a surface to be illuminated, based on a beam from a light source,
 wherein an illumination pupil distribution is formed on or near an illumination pupil of the illumination optical apparatus.   
     
     
         16 . A beam transforming element which, based on an incident beam, forms a predetermined light intensity distribution of a shape different from a sectional shape of the incident beam, on a predetermined surface, comprising:
 a diffracting surface or a refracting surface which forms the predetermined light intensity distribution on the predetermined surface,   wherein the predetermined light intensity distribution is a distribution in at least a part of a predetermined annular region, which is a predetermined annular region centered around a predetermined point on the predetermined surface, and   wherein a beam from the beam transforming element passing through the predetermined annular region has a polarization state in which a principal component is linearly polarized light having a direction of polarization along a circumferential direction of the predetermined annular region.   
     
     
         17 . The beam transforming element according to  claim 16 , wherein the predetermined light intensity distribution has a contour of a multipole shape or an annular shape. 
     
     
         18 . The beam transforming element according to  claim 17 , the beam transforming element being made of an optical material with optical activity. 
     
     
         19 . The beam transforming element according to  claim 18 , comprising:
 a first basic element made of an optical material with optical activity that forms a first region distribution of the predetermined light intensity distribution on the basis of the incident beam; and   a second basic element made of an optical material with optical activity that forms a second region distribution of the predetermined light intensity distribution on the basis of the incident beam,   wherein the first basic element and the second basic element have their respective thicknesses different from each other along a direction of transmission of light.   
     
     
         20 . The beam transforming element according to  claim 19 , wherein the thickness of the first basic element and the thickness of the second basic element are so set that with incidence of linearly polarized light a direction of polarization of linearly polarized light forming the first region distribution is different from a direction of polarization of linearly polarized light forming the second region distribution. 
     
     
         21 . The beam transforming element according to  claim 20 , wherein the first region distribution and the second region distribution are positioned in at least a part of a predetermined annular region, which is a predetermined annular region centered around a predetermined point on the predetermined surface, and
 wherein beams passing through the first region distribution and through the second region distribution have a polarization state in which a principal component is linearly polarized light having a direction of polarization along a circumferential direction of the predetermined annular region.   
     
     
         22 . The beam transforming element according to  claim 21 , wherein the predetermined light intensity distribution has a contour of a shape substantially identical with the predetermined annular region,
 wherein the polarization state of the beam passing through the first region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the first region distribution, and   wherein the polarization state of the beam passing through the second region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the second region distribution.   
     
     
         23 . The beam transforming element according to  claim 21 , wherein the predetermined light intensity distribution is a distribution of a multipole shape in the predetermined annular region,
 wherein the polarization state of the beam passing through the first region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the first region distribution, and   wherein the polarization state of the beam passing through the second region distribution has a linear polarization component substantially coincident with a tangential direction to a circle centered around the predetermined point, at a central position along a circumferential direction of the second region distribution.   
     
     
         24 . The beam transforming element according to  claim 19 , the beam transforming element including substantially the same number of said first basic elements and said second basic elements. 
     
     
         25 . The beam transforming element according to  claim 19 , wherein the first basic element and the second basic element have diffracting action or refracting action. 
     
     
         26 . The beam transforming element according to  claim 19 , wherein the first basic element forms at least two said first region distributions on the predetermined surface on the basis of the incident beam, and
 wherein the second basic element forms at least two said second region distributions on the predetermined surface on the basis of the incident beam.   
     
     
         27 . The beam transforming element according to  claim 19 , further comprising:
 a third basic element made of an optical material with optical activity, that forms a third region distribution of the predetermined light intensity distribution on the basis of the incident beam; and   a fourth basic element made of an optical material with optical activity, that forms a fourth region distribution of the predetermined light intensity distribution on the basis of the incident beam.   
     
     
         28 . The beam transforming element according to  claim 19 , wherein the first basic element and the second basic element are integrally formed. 
     
     
         29 . The beam transforming element according to  claim 17 , the beam transforming element being used in an illumination optical apparatus for illuminating a surface to be illuminated, based on a beam from a light source,
 wherein an illumination pupil distribution is formed on or near an illumination pupil of the illumination optical apparatus.   
     
     
         30 . The beam transforming element according to  claim 16 , the beam transforming element being used in an illumination optical apparatus for illuminating a surface to be illuminated, based on a beam from a light source,
 wherein an illumination pupil distribution is formed on or near an illumination pupil of the illumination optical apparatus.   
     
     
         31 . An illumination optical apparatus that illuminates a surface to be illuminated, based on a beam from a light source, comprising:
 the beam transforming element as defined in  claim 1 , that transforms the beam from the light source in order to form an illumination pupil distribution on or near an illumination pupil of the illumination optical apparatus.   
     
     
         32 . The illumination optical apparatus according to  claim 31 , wherein the beam transforming element is arranged to be replaceable with another beam transforming element having a different characteristic. 
     
     
         33 . The illumination optical apparatus according to  claim 32 , further comprising:
 a wavefront splitting optical integrator disposed in an optical path between the beam transforming element and the surface to be illuminated,   wherein the beam transforming element forms the predetermined light intensity distribution on an entrance surface of the optical integrator on the basis of the incident beam.   
     
     
         34 . The illumination optical apparatus according to  claim 33 , wherein at least one of the light intensity distribution on the predetermined surface, and the polarization state of the beam from the beam transforming element passing through the predetermined annular region is set in consideration of influence of an optical member disposed in an optical path between the light source and the surface to be illuminated. 
     
     
         35 . The illumination optical apparatus according to  claim 31 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the surface to be illuminated is in a polarization state in which a principal component is s-polarized light. 
     
     
         36 . An exposure apparatus comprising the illumination optical apparatus as defined in  claim 31 , that illuminates a predetermined pattern, wherein the predetermined pattern is projected onto a photosensitive substrate. 
     
     
         37 . The exposure apparatus according to  claim 36 , wherein at least one of the light intensity distribution on the predetermined surface, and the polarization state of the beam from the beam transforming element passing through the predetermined annular region is set in consideration of influence of an optical member disposed in an optical path between the light source and the photosensitive substrate. 
     
     
         38 . The exposure apparatus according to  claim 37 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         39 . An exposure method comprising:
 illuminating a predetermined pattern with the illumination optical apparatus as defined in  claim 31 ; and   projecting a pattern of the predetermined pattern onto a photosensitive substrate.   
     
     
         40 . The exposure method according to  claim 39 , wherein at least one of the light intensity distribution on the predetermined surface, and the polarization state of the beam from the beam transforming element passing through the predetermined annular region is set in consideration of influence of an optical member disposed in an optical path between the light source and the photosensitive substrate. 
     
     
         41 . The exposure method according to  claim 39 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         42 . A device manufacturing method comprising:
 illuminating a predetermined pattern by use of the illumination optical apparatus as defined in  claim 31 ;   projecting the pattern onto a photosensitive substrate; and   developing the photosensitive substrate.   
     
     
         43 . The device manufacturing method according to  claim 42 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         44 . An illumination optical apparatus for illuminating a surface to be illuminated, based on a beam from a light source, comprising:
 the beam transforming element as defined in  claim 16 , that transforms the beam from the light source in order to form an illumination pupil distribution on or near an illumination pupil of the illumination optical apparatus.   
     
     
         45 . The illumination optical apparatus according to  claim 44 , wherein the beam transforming element is arranged to be replaceable with another beam transforming element having a different characteristic. 
     
     
         46 . The illumination optical apparatus according to  claim 44 , further comprising:
 a wavefront splitting optical integrator disposed in an optical path between the beam transforming element and the surface to be illuminated,   wherein the beam transforming element forms the predetermined light intensity distribution on an entrance surface of the optical integrator on the basis of the incident beam.   
     
     
         47 . The illumination optical apparatus according to  claim 44 , wherein at least one of the light intensity distribution on the predetermined surface, and the polarization state of the beam from the beam transforming element passing through the predetermined annular region is set in consideration of influence of an optical member disposed in an optical path between the light source and the surface to be illuminated. 
     
     
         48 . The illumination optical apparatus according to  claim 44 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the surface to be illuminated is in a polarization state in which a principal component is s-polarized light. 
     
     
         49 . An exposure apparatus comprising the illumination optical apparatus as defined in  claim 44 , that illuminates a predetermined pattern, wherein the predetermined pattern is projected onto a photosensitive substrate. 
     
     
         50 . The exposure apparatus according to  claim 49 , wherein at least one of the light intensity distribution on the predetermined surface, and the polarization state of the beam from the beam transforming element passing through the predetermined annular region is set in consideration of influence of an optical member disposed in an optical path between the light source and the photosensitive substrate. 
     
     
         51 . The exposure apparatus according to  claim 49 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         52 . An exposure method comprising:
 illuminating a predetermined pattern by use of the illumination optical apparatus as defined in  claim 44 ; and   projecting a pattern of the predetermined pattern onto a photosensitive substrate.   
     
     
         53 . The exposure method according to  claim 52 , wherein at least one of the light intensity distribution on the predetermined surface, and the polarization state of the beam from the beam transforming element passing through the predetermined annular region is set in consideration of influence of an optical member disposed in an optical path between the light source and the photosensitive substrate. 
     
     
         54 . The exposure method according to  claim 52 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         55 . A device manufacturing method comprising:
 illuminating a predetermined pattern by use of the illumination optical apparatus as defined in  claim 44 ;   projecting the pattern onto a photosensitive substrate; and   developing the photosensitive substrate.   
     
     
         56 . The device manufacturing method according to  claim 55 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         57 . A diffraction optical element used in an illumination optical apparatus that illuminates an object to be illuminated, based on a beam from a light source, comprising:
 an optical member of an uneven shape made of an optical material with optical activity,   wherein the optical member comprises portions with different thicknesses.   
     
     
         58 . The diffraction optical element according to  claim 57 , wherein the object to be illuminated is a mask on which a predetermined pattern is formed. 
     
     
         59 . The diffraction optical element according to  claim 57 , the diffraction optical element being one disposed in an optical path between the light source and the object to be illuminated. 
     
     
         60 . An illumination optical apparatus for illuminating a predetermined pattern, comprising:
 the diffraction optical element as defined in  claim 57 .   
     
     
         61 . An exposure apparatus comprising the illumination optical apparatus as defined in  claim 60 ,
 the exposure apparatus projecting the pattern onto a photosensitive substrate.   
     
     
         62 . An exposure method comprising:
 illuminating a predetermined pattern with the illumination optical apparatus as defined in  claim 60 ; and   projecting the pattern onto a photosensitive substrate.   
     
     
         63 . A device manufacturing method comprising:
 illuminating a predetermined pattern with the illumination optical apparatus as defined in  claim 60 ;   projecting the pattern onto a photosensitive substrate; and   developing the photosensitive substrate.   
     
     
         64 . A diffraction optical element used in an illumination optical apparatus that illuminates a predetermined pattern on the basis of a beam from a light source, comprising:
 an optical member of an uneven shapemade of an optical material with optical activity,   wherein the optical member comprises portions with different thicknesses.   
     
     
         65 . The diffraction optical element according to  claim 64 , wherein the predetermined surface is an illumination pupil plane of the illumination optical apparatus or a plane near the illumination pupil plane. 
     
     
         66 . The diffraction optical element according to  claim 65 , the diffraction optical element being one disposed in an optical path between the light source and the predetermined pattern. 
     
     
         67 . The diffraction optical element according to  claim 66 , wherein the predetermined polarization state has a polarization state in which a principal component is linearly polarized light having a direction of polarization along a circumferential direction of a predetermined annular region, which is a predetermined annular region centered around a predetermined point on the predetermined surface. 
     
     
         68 . The diffraction optical element according to  claim 67 , wherein the predetermined light intensity distribution is of an annular shape or a multipole shape positioned in the predetermined annular region. 
     
     
         69 . The diffraction optical element according to  claim 66 , wherein the predetermined light intensity distribution is of an annular shape or a multipole shape. 
     
     
         70 . The diffraction optical element according to  claim 66 , wherein the optical member of the uneven shape is made of crystalline quartz. 
     
     
         71 . The diffraction optical element according to  claim 66 , wherein the optical member of the uneven shape is made of an optical material with optical activity. 
     
     
         72 . An illumination optical apparatus for illuminating a predetermined pattern, comprising:
 the diffraction optical element as defined in  claim 64 .   
     
     
         73 . An exposure apparatus comprising the illumination optical apparatus as defined in  claim 72 ,
 the exposure apparatus projecting the pattern onto a photosensitive substrate.   
     
     
         74 . An exposure method comprising:
 illuminating the predetermined pattern by use of the illumination optical apparatus as defined in  claim 72 ; and   projecting the pattern onto a photosensitive substrate.   
     
     
         75 . A device manufacturing method comprising:
 illuminating a predetermined pattern by use of the illumination optical apparatus as defined in  claim 72 ;   projecting the pattern onto a photosensitive substrate; and   developing the photosensitive substrate.   
     
     
         76 . A polarization transforming element used in an illumination optical apparatus that illuminates a predetermined pattern on the basis of a beam from a light source, comprising:
 a plurality of optical members with different thicknesses, each optical member made of an optical material with optical activity,   wherein each of the plurality of optical member provides a predetermined polarization state on a predetermined surface according to the thickness of the optical member.   
     
     
         77 . The polarization transforming element according to  claim 76 , wherein the predetermined surface is an illumination pupil plane of the illumination optical apparatus or a plane near the illumination pupil plane. 
     
     
         78 . The polarization transforming element according to  claim 77 , wherein a predetermined light intensity distribution of an annular shape or a multipole shape positioned in a predetermined annular region formed on the predetermined surface, and wherein the predetermined annular region is centered around a predetermined point on the predetermined surface. 
     
     
         79 . The polarization transforming element according to  claim 77 , wherein the diffraction optical element being one disposed in an optical path between the light source and the predetermined pattern. 
     
     
         80 . The polarization transforming element according to  claim 77 , wherein the predetermined polarization state has a polarization state in which a principal component is linearly polarized light having a direction of polarization along a circumferential direction of a predetermined annular region, which is a predetermined annular region centered around a predetermined point on the predetermined surface. 
     
     
         81 . The polarization transforming element according to  claim 80 , wherein a predetermined light intensity distribution of an annular shape or a multipole shape positioned in the predetermined annular region formed on the predetermined surface. 
     
     
         82 . The polarization transforming element according to  claim 80 , wherein the optical members are made of crystalline quartz. 
     
     
         83 . The polarization transforming element according to  claim 82 , wherein an optical axis of the crystalline quartz is aligned along a traveling direction of the beam. 
     
     
         84 . The polarization transforming element according to  claim 76 , wherein the optical members are made of an optical material with optical activity. 
     
     
         85 . An illumination optical apparatus for illuminating a surface to be illuminated, based on a beam from a light source, comprising:
 the polarization transforming element as defined in  claim 76 , for transforming the beam from the light source in order to form a predetermined polarization distribution on or near an illumination pupil of the illumination optical apparatus.   
     
     
         86 . The illumination optical apparatus according to  claim 85 , wherein the polarization transforming element is arranged to be replaceable with another polarization transforming element having a different characteristic. 
     
     
         87 . The illumination optical apparatus according to  claim 85 , further comprising:
 a wavefront splitting optical integrator disposed in an optical path between the polarization transforming element and the surface to be illuminated,   wherein the polarization transforming element forms the predetermined polarization distribution on an entrance surface of the optical integrator on the basis of the incident beam.   
     
     
         88 . The illumination optical apparatus according to  claim 85 , wherein the polarization state of the beam from the polarization transforming element is so set that light illuminating the surface to be illuminated is in a polarization state in which a principal component is s-polarized light. 
     
     
         89 . An exposure apparatus comprising the illumination optical apparatus as defined in  claim 76 , that illuminates a predetermined pattern, wherein a predetermined pattern is projected onto a photosensitive substrate. 
     
     
         90 . The exposure apparatus according to  claim 89 , wherein the polarization state of the beam from the polarization transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         91 . An exposure method comprising:
 illuminating a predetermined pattern by use of the illumination optical apparatus as defined in  claim 76 ; and   projecting the predetermined pattern onto a photosensitive substrate.   
     
     
         92 . The exposure method according to  claim 91 , wherein the polarization state of the beam from the beam transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         93 . A device manufacturing method comprising:
 illuminating a predetermined pattern by use of the illumination optical apparatus as defined in  claim 76 ;   projecting the pattern onto a photosensitive substrate; and   developing the photosensitive substrate.   
     
     
         94 . The device manufacturing method according to  claim 93 , wherein the polarization state of the beam from the polarization transforming element is so set that light illuminating the photosensitive substrate is in a polarization state in which a principal component is s-polarized light. 
     
     
         95 . The beam transforming element according to  claim 1 , wherein an optical axis of the optical material of the first basic element is aligned along a traveling direction of the incident beam, and wherein an optical axis of the optical material of the second basic element is aligned along the traveling direction of the incident beam. 
     
     
         96 . The diffraction optical element according to  claim 57 , wherein an optical axis of the optical material of the optical member of the uneven shape is aligned along a traveling direction of the incident beam. 
     
     
         97 . The polarization transforming element according to  claim 76 , wherein each optical axis of the optical material of the optical member is aligned along a traveling direction of the incident beam.