Inventor · disambiguated record
Steve S. Y. Mak
Also filed as: MAK STEVE · MAK STEVE S Y
19 granted patents·1 pending application·1,917 citations·filing 1994–2008
96Inventor score
Top patents by PatentIndex Score
20 records- 0199US6120640ABoron carbide parts and coatings in a plasma reactorAPPLIED MATERIALS INC·Filed 1996·Granted Sep 19, 2000·348 cites·43 claims
- 0298US5885358AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1996·Granted Mar 23, 1999·203 cites·30 claims
- 0398US5643394AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1994·Granted Jul 1, 1997·215 cites·73 claims
- 0497US5746875AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1995·Granted May 5, 1998·169 cites·18 claims
- 0596US5756400AMethod and apparatus for cleaning by-products from plasma chamber surfacesAPPLIED MATERIALS INC·Filed 1995·Granted May 26, 1998·407 cites·13 claims
- 0693US6270687B1RF plasma methodAPPLIED MATERIALS INC·Filed 2000·Granted Aug 7, 2001·42 cites·28 claims
- 0792US6071372ARF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber wallsAPPLIED MATERIALS INC·Filed 1997·Granted Jun 6, 2000·69 cites·49 claims
- 0891US5545289APassivating, stripping and corrosion inhibition of semiconductor substratesAPPLIED MATERIALS INC·Filed 1994·Granted Aug 13, 1996·184 cites·91 claims
- 0986US6277251B1Apparatus and method for shielding a dielectric member to allow for stable power transmission into a plasma processing chamberAPPLIED MATERIALS INC·Filed 2000·Granted Aug 21, 2001·25 cites·23 claims
- 1084US6598615B1Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamberAPPLIED MATERIALS INC·Filed 2000·Granted Jul 29, 2003·20 cites·13 claims
- 1181US6919168B2Masking methods and etching sequences for patterning electrodes of high density RAM capacitorsAPPLIED MATERIALS INC·Filed 2002·Granted Jul 19, 2005·31 cites·28 claims
- 1281US5942039ASelf-cleaning focus ringAPPLIED MATERIALS INC·Filed 1997·Granted Aug 24, 1999·66 cites·17 claims
- 1381US5891348AProcess gas focusing apparatus and methodAPPLIED MATERIALS INC·Filed 1996·Granted Apr 6, 1999·61 cites·54 claims
- 1473US6323132B1Etching methods for anisotropic platinum profileAPPLIED MATERIALS INC·Filed 1999·Granted Nov 27, 2001·36 cites·27 claims
- 1563US6265318B1Iridium etchant methods for anisotropic profileAPPLIED MATERIALS INC·Filed 1999·Granted Jul 24, 2001·30 cites·140 claims
- 1657US7270761B2Fluorine free integrated process for etching aluminum including chamber dry cleanAPPLEID MATERIALS INC·Filed 2002·Granted Sep 18, 2007·7 cites·34 claims
- 1756US6749770B2Method of etching an anisotropic profile in platinumFiled 2001·Granted Jun 15, 2004·4 cites·19 claims
- 1849US8734660B2Advanced mask patterning with patterning layerMA JIAN·Filed 2008·Granted May 27, 2014·0 cites·6 claims
- 1943US7460209B2Advanced mask patterning with patterning layerINTEL CORP·Filed 2005·Granted Dec 2, 2008·0 cites·9 claims
- 2037US2001050267A1Method for allowing a stable power transmission into a plasma processing chamberFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →