Inventor · disambiguated record
Makiko Umezaki
Also filed as: UMEZAKI MAKIKO
8 granted patents·2 pending applications·1 citations·filing 2010–2020
72Inventor score
Top patents by PatentIndex Score
10 records- 0163US9436085B2Composition for forming photosensitive resist underlayer filmHORIGUCHI YUSUKE·Filed 2010·Granted Sep 6, 2016·1 cites·2 claims
- 0260US11459414B2Film forming composition containing fluorine-containing surfactantNISSAN CHEMICAL IND LTD·Filed 2020·Granted Oct 4, 2022·0 cites·9 claims
- 0355US9957644B2Fiber-forming composition and bio-compatible material using said fiberNISSAN CHEMICAL IND LTD·Filed 2014·Granted May 1, 2018·0 cites·5 claims
- 0451US2016305044A1Fibers, composition for producing fibers, and biomaterial containing fibersNISSAN CHEMICAL IND LTD·Filed 2014·Application pending·0 cites
- 0549US9140989B2Photosensitive organic particlesKISHIOKA TAKAHIRO·Filed 2012·Granted Sep 22, 2015·0 cites·12 claims
- 0645US11479627B2Film forming composition containing fluorine-containing surfactantNISSAN CHEMICAL IND LTD·Filed 2015·Granted Oct 25, 2022·0 cites·6 claims
- 0744US10240122B2Active-ester-group-containing composition for producing fibers, and cell culture scaffold material using fibers produced from active-ester-group-containing compositionNISSAN CHEMICAL IND LTD·Filed 2015·Granted Mar 26, 2019·0 cites·10 claims
- 0840US10724028B2Ligand-binding fiber and cell culture substrate using said fiberNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jul 28, 2020·0 cites·15 claims
- 0940US9340561B2Organic silicon compound and silane coupling agent containing the sameUMEZAKI MAKIKO·Filed 2012·Granted May 17, 2016·0 cites·11 claims
- 1029US2012288795A1Composition for formation of photosensitive resist underlayer film and method for formation of resist patternUMEZAKI MAKIKO·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →