Inventor · disambiguated record
James Burdorf
Also filed as: BURDORF JAMES · BURDORF JAMES E · BURDORF JAMES ERWIN
11 granted patents·3 pending applications·1,080 citations·filing 1996–2023
94Inventor score
Top patents by PatentIndex Score
14 records- 0198US6091845AInspection technique of photomaskMICRON TECHNOLOGY INC·Filed 1998·Granted Jul 18, 2000·314 cites·32 claims
- 0297US6272236B1Inspection technique of photomaskMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 7, 2001·155 cites·32 claims
- 0397US6120952AMethods of reducing proximity effects in lithographic processesMICRON TECHNOLOGY INC·Filed 1998·Granted Sep 19, 2000·155 cites·35 claims
- 0497US5795688AProcess for detecting defects in photomasks through aerial image comparisonsMICRON TECHNOLOGY INC·Filed 1996·Granted Aug 18, 1998·206 cites·24 claims
- 0589US6519501B2Method of determining optimum exposure threshold for a given photolithographic modelMICRON TECHNOLOGY INC·Filed 2001·Granted Feb 11, 2003·36 cites·74 claims
- 0689US6319644B2Methods of reducing proximity effects in lithographic processesMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 20, 2001·29 cites·38 claims
- 0789US6284419B2Methods of reducing proximity effects in lithographic processesMICRON TECHNOLOGY INC·Filed 2001·Granted Sep 4, 2001·29 cites·38 claims
- 0889US6033814AMethod for multiple process parameter matchingMICRON TECHNOLOGY INC·Filed 1998·Granted Mar 7, 2000·95 cites·29 claims
- 0978US6463403B1System and method for process matchingMICRON TECHNOLOGY INC·Filed 1999·Granted Oct 8, 2002·31 cites·24 claims
- 1068US6178360B1Methods and apparatus for determining optimum exposure threshold for a given photolithographic modelMICRON TECHNOLOGY INC·Filed 1998·Granted Jan 23, 2001·26 cites·27 claims
- 1163US2025199397A1Mask Stitching for Extreme Ultraviolet LithographySYNOPSYS INC·Filed 2023·Application pending·0 cites
- 1244US6985847B2System and method for process matchingMICRON TECHNOLOGY INC·Filed 2002·Granted Jan 10, 2006·4 cites·31 claims
- 1343US2004179726A1Process for detecting defects in photomasksFiled 2004·Application pending·0 cites
- 1442US2003139833A1Methods and apparatus for determining optimum exposure threshold for a given photolithographic modelMICRON TECHNOLOGY INC·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →