Inventor · disambiguated record
Doug Van Den Broeke
Also filed as: VAN DEN BROEKE DOUG
7 granted patents·2 pending applications·68 citations·filing 1998–2013
84Inventor score
Top patents by PatentIndex Score
9 records- 0189US6851103B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2003·Granted Feb 1, 2005·44 cites·18 claims
- 0284US8644589B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2013·Granted Feb 4, 2014·8 cites·12 claims
- 0378US7549140B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2005·Granted Jun 16, 2009·5 cites·13 claims
- 0463US7421677B2Illuminator controlled tone reversal printingASML NETHERLANDS BV·Filed 2004·Granted Sep 2, 2008·6 cites·12 claims
- 0561US7667216B2Method of achieving CD linearity control for full-chip CPL manufacturingASML MASKTOOLS BV·Filed 2007·Granted Feb 23, 2010·1 cites·11 claims
- 0645US6567719B2Method and apparatus for creating an improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locationsPHOTRONICS INC·Filed 2001·Granted May 20, 2003·1 cites·5 claims
- 0740US2004207829A1Illuminator controlled tone reversal printingASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
- 0839US2006146307A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 0933US6360134B1Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locationsPHOTRONICS INC·Filed 1998·Granted Mar 19, 2002·3 cites·48 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →