Inventor · disambiguated record
Tsutomu Higashiura
Also filed as: HIGASHIURA TSUTOMU
5 granted patents·8 pending applications·42 citations·filing 2002–2008
78Inventor score
Top patents by PatentIndex Score
13 records- 0189US8251011B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2007·Granted Aug 28, 2012·13 cites·19 claims
- 0280US7527016B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 5, 2009·16 cites·11 claims
- 0368US7025857B2Plasma treatment apparatus, matching box, impedance matching device, and couplerTOKYO ELECTRON LTD·Filed 2002·Granted Apr 11, 2006·9 cites·8 claims
- 0458US2008257498A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0556US7244475B2Plasma treatment apparatus and control method thereofTOKYO ELECTRON LTD·Filed 2002·Granted Jul 17, 2007·4 cites·9 claims
- 0649US2008179005A1Plasma processing apparatus and control method thereofTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 0748US2007113787A1Plasma process apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0844US7682982B2Plasma processing apparatus and control method thereofTOKYO ELECTRON LTD·Filed 2005·Granted Mar 23, 2010·0 cites·16 claims
- 0942US2005139321A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1038US2004255863A1Plasma process apparatusFiled 2002·Application pending·0 cites
- 1138US2005274324A1Plasma processing apparatus and mounting unit thereofTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1236US2005236111A1Processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1336US2005069651A1Plasma processing systemTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →