Inventor · disambiguated record
Lakmal C. Kalutarage
Also filed as: KALUTARAGE LAKMAL · KALUTARAGE LAKMAL C · KALUTARAGE LAKMAL CHARIDU
31 granted patents·35 pending applications·11 citations·filing 2012–2025
93Inventor score
Top patents by PatentIndex Score
66 records- 0194US11621172B2Vapor phase thermal etch solutions for metal oxo photoresistsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 4, 2023·2 cites·14 claims
- 0290US11398388B2Methods for selective dry etching gallium oxideAPPLIED MATERIALS INC·Filed 2020·Granted Jul 26, 2022·2 cites·13 claims
- 0385US11886120B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 30, 2024·1 cites·20 claims
- 0483US11562904B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·1 cites·6 claims
- 0581US12068170B2Vapor phase thermal etch solutions for metal oxo photoresistsAPPLIED MATERIALS INC·Filed 2023·Granted Aug 20, 2024·0 cites·10 claims
- 0678US12033866B2Vapor phase thermal etch solutions for metal oxo photoresistsAPPLIED MATERIALS INC·Filed 2023·Granted Jul 9, 2024·0 cites·6 claims
- 0778US8907115B2Synthesis and characterization of first row transition metal complexes containing α-keto hydrazonate ligands as potential precursors for use in metal film depositionUNIV WAYNE STATE·Filed 2012·Granted Dec 9, 2014·1 cites·23 claims
- 0876US11371136B2Methods for selective deposition of dielectric on silicon oxideAPPLIED MATERIALS INC·Filed 2018·Granted Jun 28, 2022·2 cites·20 claims
- 0974US12281382B2Methods for depositing blocking layers on conductive surfacesAPPLIED MATERIALS INC·Filed 2023·Granted Apr 22, 2025·0 cites·5 claims
- 1074US12131900B2Methods for depositing blocking layers on metal surfacesAPPLIED MATERIALS INC·Filed 2022·Granted Oct 29, 2024·0 cites·16 claims
- 1173US12300491B2Deposition of semiconductor integration filmsAPPLIED MATERIALS INC·Filed 2022·Granted May 13, 2025·0 cites·8 claims
- 1272US2025028242A1Integrated solution with low temperature dry develop for euv photoresistAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1371US2025224678A1Photoresist deposition using independent multichannel showerheadAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1470US10760159B2Methods and apparatus for depositing yttrium-containing filmsAPPLIED MATERIALS INC·Filed 2017·Granted Sep 1, 2020·0 cites·20 claims
- 1569US12282256B2Photoresist deposition using independent multichannel showerheadAPPLIED MATERIALS INC·Filed 2021·Granted Apr 22, 2025·0 cites·18 claims
- 1668US11942330B2Methods for selective dry etching gallium oxideAPPLIED MATERIALS INC·Filed 2022·Granted Mar 26, 2024·0 cites·17 claims
- 1768US11515149B2Deposition of flowable silicon-containing filmsAPPLIED MATERIALS INC·Filed 2017·Granted Nov 29, 2022·1 cites·20 claims
- 1868US9812318B2Low temperature molecular layer deposition of SiCONAPPLIED MATERIALS INC·Filed 2015·Granted Nov 7, 2017·1 cites·20 claims
- 1968US2020392624A1Methods and apparatus for depositing yttrium-containing filmsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2067US11702733B2Methods for depositing blocking layers on conductive surfacesAPPLIED MATERIALS INC·Filed 2021·Granted Jul 18, 2023·0 cites·13 claims
- 2167US2024160100A1Integrated solution with low temperature dry develop for euv photoresistAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2265US2025053086A1Post development treatment for metal-oxide photoresistsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2365US2024271276A1Multiple-metal-containing metal-oxo photoresist films by cvd and ald methodsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2465US2025321489A1Methods for euv dry developmentAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2564US9758866B2Synthesis and characterization of first row transition metal complexes containing α-imino alkoxides as precursors for deposition of metal filmsUNIV WAYNE STATE·Filed 2013·Granted Sep 12, 2017·0 cites·18 claims
- 2664US2025028248A1Dry development for metal-oxide photoresistsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2760US12500080B2Systems and methods for depositing low-K dielectric filmsAPPLIED MATERIALS INC·Filed 2022·Granted Dec 16, 2025·0 cites·20 claims
- 2860US2024248391A1Extreme ultraviolet pellicles and method of manufacturingAPPLIED MATEIALS INC·Filed 2024·Application pending·0 cites
- 2959US11417515B2Methods for depositing blocking layers on metal surfacesAPPLIED MATERIALS INC·Filed 2018·Granted Aug 16, 2022·0 cites·18 claims
- 3059US9714464B2Precursors for atomic layer depositionUNIV WAYNE STATE·Filed 2013·Granted Jul 25, 2017·0 cites·26 claims
- 3159US2025293017A1Methods of forming conformal silicon oxycarbonitride thin films on high aspect ratio semiconductor structuresAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3259US2025299946A1Method for forming conformal silicon oxide thin filmAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3358US12084764B2Vapor phase photoresists depositionAPPLIED MATERIALS INC·Filed 2021·Granted Sep 10, 2024·0 cites·14 claims
- 3458US12031209B2Reducing agents for atomic layer depositionAPPLIED MATERIALS INC·Filed 2021·Granted Jul 9, 2024·0 cites·16 claims
- 3558US2025046602A1Reactive-ion deposition processes for dielectric material formationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3658US2025125157A1Optimum material stacks for semiconductor contactsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3757US2024012325A1Method to optimize post deposition baking condition of photo resistive materialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3857US2023235451A1Molybdenum-dad precursors for deposition of molybdenum filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3957US2024332001A1Atomic layer deposition of silicon-carbon-and-nitrogen-containing materialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4057US2025125154A1Oxide quality differentiationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4156US12261049B2Selective etch of a substrateAPPLIED MATERIALS INC·Filed 2022·Granted Mar 25, 2025·0 cites·18 claims
- 4256US10354861B2Low temperature molecular layer deposition of SiCONAPPLIED MATERIALS INC·Filed 2017·Granted Jul 16, 2019·0 cites·20 claims
- 4356US2020071825A1Methods Of Depositing Metal Carbide FilmsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4455US2024038833A1Carbon mold for dram capacitorAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4555US2019309412A1Methods For Low Temperature ALD Of Metal OxidesAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4654US11217443B2Sequential deposition and high frequency plasma treatment of deposited film on patterned and un-patterned substratesAPPLIED MATERIALS INC·Filed 2019·Granted Jan 4, 2022·0 cites·20 claims
- 4753US11393678B2Low-k dielectric filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 19, 2022·0 cites·18 claims
- 4853US2023295803A1Methods of growing metal-containing filmsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4953US2025313950A1Precursor, gas mixture, and method for depositing a low k dielectric filmAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 5053US2024247370A1Atomic layer deposition of ruthenium oxide coatingsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
Showing the top 50 of 66 patent records by PatentIndex Score.
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