Inventor · disambiguated record
Dong-Seok Nam
Also filed as: NAM DONG-SEOK
14 granted patents·7 pending applications·94 citations·filing 2002–2023
89Inventor score
Top patents by PatentIndex Score
21 records- 0191US6723607B2Method of forming fine patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 20, 2004·64 cites·20 claims
- 0281US8568944B2Reflective extreme ultraviolet mask and method of manufacturing the sameKIM HOON·Filed 2012·Granted Oct 29, 2013·4 cites·18 claims
- 0380US8187778B2Method for correcting a position error of lithography apparatusCHOI JIN·Filed 2010·Granted May 29, 2012·3 cites·15 claims
- 0476US10831095B2Critical dimension measurement system and method of measuring critical dimensions using sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Nov 10, 2020·2 cites·20 claims
- 0569US8435705B2Methods of correcting optical parameters in photomasksHAN HAEK-SEUNG·Filed 2011·Granted May 7, 2013·3 cites·13 claims
- 0665US6835970B2Semiconductor device having self-aligned contact pads and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 28, 2004·13 cites·22 claims
- 0764US7956983B2Exposure equipment having auxiliary photo mask and exposure method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jun 7, 2011·2 cites·19 claims
- 0864US2025328068A1Reflective member for euv lithographyASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0961US11397380B2Critical dimension measurement system and method of measuring critical dimensions using sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jul 26, 2022·0 cites·20 claims
- 1061US8968970B2Phase shift masks and methods of forming phase shift masksSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Mar 3, 2015·1 cites·13 claims
- 1156US8865375B2Halftone phase shift blank photomasks and halftone phase shift photomasksSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Oct 21, 2014·0 cites·19 claims
- 1254US8524426B2Method of manufacturing a photomaskCHOI JIN·Filed 2012·Granted Sep 3, 2013·0 cites·10 claims
- 1348US7139064B2Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Nov 21, 2006·2 cites·20 claims
- 1447US2009239158A1Method of maintaining mask for semiconductor processWOO SANG-GYUN·Filed 2009·Application pending·0 cites
- 1546US8329363B2Methods of fabricating halftone phase shift blank photomasks and halftone phase shift photomasksJANG IL-YONG·Filed 2010·Granted Dec 11, 2012·0 cites·16 claims
- 1646US2009059197A1Exposure apparatus and method of exposing a semiconductor substrateNAM DONG-SEOK·Filed 2008·Application pending·0 cites
- 1744US2014145091A1Electron beam exposure apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 1844US2008062397A1Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting PartNAM DONG-SEOK·Filed 2007·Application pending·0 cites
- 1942US2007054493A1Methods of forming patterns using phase change material and methods for removing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2040US8361679B2Phase shift masksSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Jan 29, 2013·0 cites·19 claims
- 2139US2005158637A1Template, method of forming the template and method of forming a pattern on a semiconductor device using the templateSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →