Inventor · disambiguated record
Leonardus Henricus Marie Verstappen
Also filed as: VERSTAPPEN LEONARDUS HENRICUS · VERSTAPPEN LEONARDUS HENRICUS MARIE
14 granted patents·2 pending applications·118 citations·filing 2004–2023
90Inventor score
Top patents by PatentIndex Score
16 records- 0198US8724087B2Inspection apparatus for lithographyVAN DE KERKHOF MARCUS ADRIANUS·Filed 2009·Granted May 13, 2014·87 cites·19 claims
- 0290US10996176B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2020·Granted May 4, 2021·2 cites·19 claims
- 0389US10317191B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·4 cites·21 claims
- 0486US9798250B2Lithographic apparatus for measuring overlay error and a device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Oct 24, 2017·2 cites·7 claims
- 0585US10746668B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2019·Granted Aug 18, 2020·2 cites·27 claims
- 0684US7468795B2Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the sameASML NETHERLANDS BV·Filed 2006·Granted Dec 23, 2008·9 cites·34 claims
- 0783US9594029B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2012·Granted Mar 14, 2017·4 cites·16 claims
- 0877US7547495B2Device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2005·Granted Jun 16, 2009·4 cites·14 claims
- 0974US11977034B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2021·Granted May 7, 2024·0 cites·18 claims
- 1070US11580274B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted Feb 14, 2023·1 cites·20 claims
- 1169US12204826B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 1268US7630087B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Dec 8, 2009·2 cites·16 claims
- 1365US9201310B2Method of measuring overlay error and a device manufacturing methodVAN DE KERKHOF MARCUS ADRIANUS·Filed 2009·Granted Dec 1, 2015·1 cites·17 claims
- 1453US2016018742A1Method of Measuring Overlay Error and a Device Manufacturing MethodASML NETHERLANDS BV·Filed 2015·Application pending·0 cites
- 1540US8749775B2Inspection method and apparatusVERSTAPPEN LEONARDUS HENRICUS MARIE·Filed 2010·Granted Jun 10, 2014·0 cites·19 claims
- 1638US2005210438A1Modification of an image of a pattern during an imaging processASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →