Inventor · disambiguated record
Jian J. Chen
Also filed as: CHEN JIAN · CHEN JIAN J · CHEN JIAN JANSON
35 granted patents·3 pending applications·1,848 citations·filing 1997–2025
98Inventor score
Top patents by PatentIndex Score
38 records- 0198US10950477B2Ceramic heater and esc with enhanced wafer edge performanceAPPLIED MATERIALS INC·Filed 2016·Granted Mar 16, 2021·280 cites·9 claims
- 0298US6583572B2Inductive plasma processor including current sensor for plasma excitation coilLAM RES CORP·Filed 2001·Granted Jun 24, 2003·458 cites·14 claims
- 0398US6164241AMultiple coil antenna for inductively-coupled plasma generation systemsLAM RES CORP·Filed 1998·Granted Dec 26, 2000·225 cites·54 claims
- 0498US6063234ATemperature sensing system for use in a radio frequency environmentLAM RES CORP·Filed 1997·Granted May 16, 2000·289 cites·33 claims
- 0597US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0697US6463875B1Multiple coil antenna for inductively-coupled plasma generation systemsLAM RES CORP·Filed 2000·Granted Oct 15, 2002·110 cites·20 claims
- 0796US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 0896US8587321B2System and method for current-based plasma excursion detectionCHEN JIAN J·Filed 2010·Granted Nov 19, 2013·53 cites·21 claims
- 0996US8502689B2System and method for voltage-based plasma excursion detectionCHEN JIAN J·Filed 2010·Granted Aug 6, 2013·50 cites·18 claims
- 1095US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 1193US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 1293US11508563B1Methods and apparatus for processing a substrate using improved shield configurationsAPPLIED MATERIALS INC·Filed 2021·Granted Nov 22, 2022·2 cites·20 claims
- 1393US7096819B2Inductive plasma processor having coil with plural windings and method of controlling plasma densityLAM RES CORP·Filed 2001·Granted Aug 29, 2006·47 cites·26 claims
- 1493US6872281B1Chamber configuration for confining a plasmaLAM RES CORP·Filed 2000·Granted Mar 29, 2005·66 cites·27 claims
- 1593US6155199AParallel-antenna transformer-coupled plasma generation systemLAM RES CORP·Filed 1998·Granted Dec 5, 2000·91 cites·34 claims
- 1690US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 1790US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 1890US7094315B2Chamber configuration for confining a plasmaLAM RES CORP·Filed 2004·Granted Aug 22, 2006·46 cites·27 claims
- 1987US10450653B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2018·Granted Oct 22, 2019·1 cites·17 claims
- 2086US10347465B2Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamberAPPLIED MATERIALS INC·Filed 2018·Granted Jul 9, 2019·3 cites·14 claims
- 2185US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 2285US9865431B2Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Jan 9, 2018·5 cites·10 claims
- 2384US10125422B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2014·Granted Nov 13, 2018·4 cites·15 claims
- 2481US10032608B2Apparatus and method for tuning electrode impedance for high frequency radio frequency and terminating low frequency radio frequency to groundAPPLIED MATERIALS INC·Filed 2014·Granted Jul 24, 2018·4 cites·15 claims
- 2576US11621152B2Methods and apparatus for processing a substrate using improved shield configurationsAPPLIED MATERIALS INC·Filed 2022·Granted Apr 4, 2023·0 cites·16 claims
- 2673US10128118B2Bottom and side plasma tuning having closed loop controlAPPLIED MATERIALS INC·Filed 2013·Granted Nov 13, 2018·2 cites·18 claims
- 2773US10030306B2PECVD apparatus and processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 24, 2018·1 cites·16 claims
- 2871US9386680B2Detecting plasma arcs by monitoring RF reflected power in a plasma processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Jul 5, 2016·4 cites·18 claims
- 2970US6028286AMethod for igniting a plasma inside a plasma processing reactorLAM RES CORP·Filed 1998·Granted Feb 22, 2000·22 cites·30 claims
- 3069US10580626B2Arcing detection apparatus for plasma processingAPPLIED MATERIALS INC·Filed 2016·Granted Mar 3, 2020·1 cites·14 claims
- 3168US6527912B2Stacked RF excitation coil for inductive plasma processorLAM RES CORP·Filed 2001·Granted Mar 4, 2003·7 cites·31 claims
- 3265US2020010957A1High impedance rf filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3357US10910227B2Bottom and side plasma tuning having closed loop controlAPPLIED MATERIALS INC·Filed 2018·Granted Feb 2, 2021·0 cites·16 claims
- 3456US12249484B2Methods and apparatus for controlling radio frequency electrode impedances in process chambersAPPLIED MATERIALS INC·Filed 2021·Granted Mar 11, 2025·0 cites·18 claims
- 3552US11450511B2Methods and apparatus for zone control of RF bias for stress uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Sep 20, 2022·0 cites·18 claims
- 3650US12500586B2Resistor voltage-bearing type on-state voltage drop measurement circuit for junction temperature monitoring and monitoring methodUNIV SOUTHWEST JIAOTONG·Filed 2025·Granted Dec 16, 2025·0 cites·3 claims
- 3745US2016017494A1Apparatus and method for tuning a plasma profile using a tuning ring in a processing chamberAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3844US2004045506A1Inductive plasma processor methodLAM RES CORP·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →