Inventor · disambiguated record
Juyeon Chang
Also filed as: CHANG JUYEON
7 granted patents·5 pending applications·18 citations·filing 2008–2025
79Inventor score
Top patents by PatentIndex Score
12 records- 0187US10920107B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2020·Granted Feb 16, 2021·2 cites·14 claims
- 0287US10619076B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2019·Granted Apr 14, 2020·2 cites·8 claims
- 0383US9597768B1Selective nitride slurries with improved stability and improved polishing characteristicsCABOT MICROELECTRONICS CORP·Filed 2015·Granted Mar 21, 2017·3 cites·23 claims
- 0481US10619075B2Self-stopping polishing composition and method for bulk oxide planarizationCABOT MICROELECTRONICS CORP·Filed 2018·Granted Apr 14, 2020·1 cites·10 claims
- 0578US7955586B2Synthesis of I-III-V12 nanoparticles and fabrication of polycrystalline absorber layersUNIV SUNGKYUNKWAN FOUND·Filed 2008·Granted Jun 7, 2011·10 cites·19 claims
- 0664US2025297134A1High rate bulk oxide cmp compositionENTEGRIS INC·Filed 2025·Application pending·0 cites
- 0758US2025297135A1Ceria and hydroxamic acid cmp compositionENTEGRIS INC·Filed 2025·Application pending·0 cites
- 0853US12269969B2Polishing composition and method with high selectivity for silicon nitride and polysilicon over silicon oxideCMC MAT INC·Filed 2020·Granted Apr 8, 2025·0 cites·8 claims
- 0952US12116502B2Self-stopping polishing composition and method for high topological selectivityCMC MAT INC·Filed 2021·Granted Oct 15, 2024·0 cites·25 claims
- 1047US2023242790A1Ceria-based slurry compositions for selective and nonselective cmp of silicon oxide, silicon nitride, and polysiliconCMC MAT INC·Filed 2022·Application pending·0 cites
- 1147US2023242791A1Ceria-based slurry compositions for selective and nonselective cmp of silicon oxide, silicon nitride, and polysiliconCMC MAT INC·Filed 2022·Application pending·0 cites
- 1244US2021115301A1Self-stopping polishing composition and methodCMC MAT INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →