Inventor · disambiguated record
Kenneth P. Macwilliams
Also filed as: MACWILLIAMS KENNETH · MACWILLIAMS KENNETH P
10 granted patents·4 pending applications·436 citations·filing 1994–2011
91Inventor score
Top patents by PatentIndex Score
14 records- 0194US7811924B2Air gap formation and integration using a patterning capAPPLIED MATERIALS INC·Filed 2008·Granted Oct 12, 2010·28 cites·18 claims
- 0293US6417092B1Low dielectric constant etch stop filmsNOVELLUS SYSTEMS INC·Filed 2000·Granted Jul 9, 2002·97 cites·11 claims
- 0393US5580802ASilicon-on-insulator gate-all-around mosfet fabrication methodsAEROSPACE CORP·Filed 1995·Granted Dec 3, 1996·116 cites·5 claims
- 0491US6251770B1Dual-damascene dielectric structures and methods for making the sameLAM RES CORP·Filed 1999·Granted Jun 26, 2001·106 cites·4 claims
- 0587US5497019ASilicon-on-insulator gate-all-around MOSFET devices and fabrication methodsAEROSPACE CORP·Filed 1994·Granted Mar 5, 1996·65 cites·6 claims
- 0664US7060605B2Methods for making dual-damascene dielectric structuresLAM RES CORP·Filed 2001·Granted Jun 13, 2006·7 cites·10 claims
- 0760US6909190B2Dual-damascene dielectric structuresLAM RES CORP·Filed 2001·Granted Jun 21, 2005·5 cites·11 claims
- 0859US8293460B2Double exposure patterning with carbonaceous hardmaskCHEN HUI W·Filed 2008·Granted Oct 23, 2012·2 cites·8 claims
- 0952US7501339B2Methods for making dual-damascene dielectric structuresLAM RES CORP·Filed 2006·Granted Mar 10, 2009·0 cites·17 claims
- 1052US2011272024A1MULTI-LAYER SiN FOR FUNCTIONAL AND OPTICAL GRADED ARC LAYERS ON CRYSTALLINE SOLAR CELLSAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 1145US2013045560A1Techniques and systems for fabricating anti-reflective and passivation layers on solar cellsMACWILLIAMS GRAHAM T·Filed 2011·Application pending·0 cites
- 1242US6214526B1Semiconductor processing using antireflective layer having high wet etch rateNOVELLUS SYSTEMS INC·Filed 1998·Granted Apr 10, 2001·10 cites·12 claims
- 1342US2009004875A1Methods of trimming amorphous carbon film for forming ultra thin structures on a substrateSHEN MEIHUA·Filed 2008·Application pending·0 cites
- 1436US2003036280A1Low dielectric constant etch stop filmsNOVELLUS SYSTEM INC·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →