Inventor · disambiguated record
Ming Xi
Also filed as: XI MING
75 granted patents·25 pending applications·4,996 citations·filing 1996–2018
99Inventor score
Top patents by PatentIndex Score
100 records- 0199US6551929B1Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2000·Granted Apr 22, 2003·396 cites·60 claims
- 0298US7465666B2Method for forming tungsten materials during vapor deposition processesAPPLIED MATERIALS INC·Filed 2007·Granted Dec 16, 2008·47 cites·33 claims
- 0398US7235486B2Method for forming tungsten materials during vapor deposition processesAPPLIED MATERIALS INC·Filed 2006·Granted Jun 26, 2007·43 cites·39 claims
- 0498US7094680B2Formation of a tantalum-nitride layerAPPLIED MATERIALS INC·Filed 2005·Granted Aug 22, 2006·59 cites·22 claims
- 0598US6846516B2Multiple precursor cyclical deposition systemAPPLIED MATERIALS INC·Filed 2002·Granted Jan 25, 2005·197 cites·15 claims
- 0698US6624064B1Chamber seasoning method to improve adhesion of F-containing dielectric film to metal for VLSI applicationAPPLIED MATERIALS INC·Filed 1997·Granted Sep 23, 2003·583 cites·17 claims
- 0798US5837058AHigh temperature susceptorAPPLIED MATERIALS INC·Filed 1996·Granted Nov 17, 1998·551 cites·22 claims
- 0897US7674715B2Method for forming tungsten materials during vapor deposition processesAPPLIED MATERIALS INC·Filed 2008·Granted Mar 9, 2010·35 cites·25 claims
- 0997US7465665B2Method for depositing tungsten-containing layers by vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2007·Granted Dec 16, 2008·43 cites·20 claims
- 1097US7405158B2Methods for depositing tungsten layers employing atomic layer deposition techniquesAPPLIED MATERIALS INC·Filed 2005·Granted Jul 29, 2008·105 cites·29 claims
- 1197US7211144B2Pulsed nucleation deposition of tungsten layersAPPLIED MATERIALS INC·Filed 2002·Granted May 1, 2007·161 cites·25 claims
- 1297US7115494B2Method and system for controlling the presence of fluorine in refractory metal layersAPPLIED MATERIALS INC·Filed 2006·Granted Oct 3, 2006·30 cites·54 claims
- 1397US7094685B2Integration of titanium and titanium nitride layersAPPLIED MATERIALS INC·Filed 2005·Granted Aug 22, 2006·34 cites·40 claims
- 1497US7026238B2Reliability barrier integration for Cu applicationAPPLIED MATERIALS INC·Filed 2002·Granted Apr 11, 2006·99 cites·21 claims
- 1597US6998014B2Apparatus and method for plasma assisted depositionAPPLIED MATERIALS INC·Filed 2002·Granted Feb 14, 2006·167 cites·17 claims
- 1697US6951804B2Formation of a tantalum-nitride layerAPPLIED MATERIALS INC·Filed 2001·Granted Oct 4, 2005·106 cites·25 claims
- 1797US6866746B2Clamshell and small volume chamber with fixed substrate supportAPPLIED MATERIALS INC·Filed 2002·Granted Mar 15, 2005·130 cites·27 claims
- 1896US8734663B2Purging of porogen from UV cure chamberNOVELLUS SYSTEMS INC·Filed 2013·Granted May 27, 2014·19 cites·10 claims
- 1996US8282768B1Purging of porogen from UV cure chamberSMARGIASSI EUGENE·Filed 2009·Granted Oct 9, 2012·38 cites·20 claims
- 2096US7745333B2Methods for depositing tungsten layers employing atomic layer deposition techniquesAPPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·47 cites·15 claims
- 2196US7709385B2Method for depositing tungsten-containing layers by vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2008·Granted May 4, 2010·33 cites·20 claims
- 2296US7695563B2Pulsed deposition process for tungsten nucleationAPPLIED MATERIALS INC·Filed 2007·Granted Apr 13, 2010·38 cites·30 claims
- 2396US7605083B2Formation of composite tungsten filmsAPPLIED MATERIALS INC·Filed 2008·Granted Oct 20, 2009·39 cites·25 claims
- 2496US7220673B2Method for depositing tungsten-containing layers by vapor deposition techniquesAPPLIED MATERIALS INC·Filed 2006·Granted May 22, 2007·29 cites·38 claims
- 2596US6939804B2Formation of composite tungsten filmsAPPLIED MATERIALS INC·Filed 2002·Granted Sep 6, 2005·116 cites·61 claims
- 2696US6911391B2Integration of titanium and titanium nitride layersAPPLIED MATERIALS INC·Filed 2002·Granted Jun 28, 2005·77 cites·24 claims
- 2796US6720027B2Cyclical deposition of a variable content titanium silicon nitride layerAPPLIED MATERIALS INC·Filed 2002·Granted Apr 13, 2004·104 cites·35 claims
- 2896US6660126B2Lid assembly for a processing system to facilitate sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2001·Granted Dec 9, 2003·128 cites·28 claims
- 2996US6066836AHigh temperature resistive heater for a process chamberAPPLIED MATERIALS INC·Filed 1996·Granted May 23, 2000·80 cites·38 claims
- 3095US7867914B2System and method for forming an integrated barrier layerAPPLIED MATERIALS INC·Filed 2007·Granted Jan 11, 2011·23 cites·3 claims
- 3195US7473638B2Plasma-enhanced cyclic layer deposition process for barrier layersAPPLIED MATERIALS INC·Filed 2006·Granted Jan 6, 2009·20 cites·36 claims
- 3295US7175713B2Apparatus for cyclical deposition of thin filmsAPPLIED MATERIALS INC·Filed 2003·Granted Feb 13, 2007·110 cites·11 claims
- 3395US6797340B2Method for depositing refractory metal layers employing sequential deposition techniquesAPPLIED MATERIALS INC·Filed 2002·Granted Sep 28, 2004·167 cites·20 claims
- 3495US6734020B2Valve control system for atomic layer deposition chamberAPPLIED MATERIALS INC·Filed 2001·Granted May 11, 2004·135 cites·11 claims
- 3594US8518210B2Purging of porogen from UV cure chamberSMARGIASSI EUGENE·Filed 2012·Granted Aug 27, 2013·16 cites·18 claims
- 3694US7101795B1Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layerAPPLIED MATERIALS INC·Filed 2000·Granted Sep 5, 2006·50 cites·14 claims
- 3794US7085616B2Atomic layer deposition apparatusAPPLIED MATERIALS INC·Filed 2001·Granted Aug 1, 2006·42 cites·39 claims
- 3894US6809026B2Selective deposition of a barrier layer on a metal filmAPPLIED MATERIALS INC·Filed 2002·Granted Oct 26, 2004·92 cites·43 claims
- 3993US5849092AProcess for chlorine trifluoride chamber cleaningAPPLIED MATERIALS INC·Filed 1997·Granted Dec 15, 1998·111 cites·24 claims
- 4092US8027746B2Atomic layer deposition apparatusAPPLIED MATERIALS INC·Filed 2010·Granted Sep 27, 2011·4 cites·15 claims
- 4192US7384867B2Formation of composite tungsten filmsAPPLIED MATERIALS INC·Filed 2005·Granted Jun 10, 2008·16 cites·48 claims
- 4292US7279432B2System and method for forming an integrated barrier layerAPPLIED MATERIALS INC·Filed 2003·Granted Oct 9, 2007·50 cites·18 claims
- 4392US6211065B1Method of depositing and amorphous fluorocarbon film using HDP-CVDAPPLIED MATERIALS INC·Filed 1997·Granted Apr 3, 2001·100 cites·19 claims
- 4491US10121682B2Purging of porogen from UV cure chamberNOVELLUS SYSTEMS INC·Filed 2016·Granted Nov 6, 2018·5 cites·10 claims
- 4591US9384959B2Purging of porogen from UV cure chamberNOVELLUS SYSTEMS INC·Filed 2014·Granted Jul 5, 2016·7 cites·9 claims
- 4691US7033922B2Method and system for controlling the presence of fluorine in refractory metal layersAPPLIED MATERIALS INC·Filed 2004·Granted Apr 25, 2006·30 cites·26 claims
- 4790US7396565B2Multiple precursor cyclical deposition systemAPPLIED MATERIALS INC·Filed 2004·Granted Jul 8, 2008·33 cites·15 claims
- 4889US9073100B2Method and apparatuses for reducing porogen accumulation from a UV-cure chamberNOVELLUS SYSTEMS INC·Filed 2013·Granted Jul 7, 2015·8 cites·23 claims
- 4989US7860597B2Atomic layer deposition apparatusAPPLIED MATERIALS INC·Filed 2009·Granted Dec 28, 2010·5 cites·19 claims
- 5088US8626330B2Atomic layer deposition apparatusCHIN BARRY L·Filed 2011·Granted Jan 7, 2014·4 cites·14 claims
Showing the top 50 of 100 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →