Inventor · disambiguated record
Eiji Kitamura
Also filed as: KITAMURA EIJI
12 granted patents·3 pending applications·198 citations·filing 1998–2025
91Inventor score
Top patents by PatentIndex Score
15 records- 0192USD431505SRadiator grill of a motor vehicleMAZDA CORP·Filed 1998·Granted Oct 3, 2000·78 cites·1 claims
- 0284USD452837SRadiator grill of a motor vehicleMAZDA MOTOR·Filed 1998·Granted Jan 8, 2002·29 cites·1 claims
- 0380US7790517B2Method of manufacturing semiconductor deviceELPIDA MEMORY INC·Filed 2007·Granted Sep 7, 2010·9 cites·14 claims
- 0476USD430521SRadiator grill of a motor vehicleMAZDA MOTOR·Filed 1999·Granted Sep 5, 2000·21 cites·1 claims
- 0570USD421588SRear portion of a motor vehicleMAZDA MOTOR·Filed 1999·Granted Mar 14, 2000·16 cites·1 claims
- 0666USD430836SRadiator grill of a motor vehicleMAZDA MOTOR·Filed 1999·Granted Sep 12, 2000·14 cites·1 claims
- 0760USD432065SFront portion of a motor vehicleMAZDA MOTOR·Filed 1999·Granted Oct 17, 2000·11 cites·1 claims
- 0857USD430837SRadiator grill of a motor vehicleMAZDA MOTOR·Filed 1999·Granted Sep 12, 2000·10 cites·1 claims
- 0956US8729642B2Semiconductor device comprising a gate electrode having an openingKITAMURA EIJI·Filed 2011·Granted May 20, 2014·1 cites·20 claims
- 1055USD422547SFront portion of a motor vehicleMAZDA MOTOR·Filed 1998·Granted Apr 11, 2000·9 cites·1 claims
- 1152US2025147527A1Control apparatus, control method and program thereofDENSO CORP·Filed 2025·Application pending·0 cites
- 1251US2009189248A1Semiconductor device and method of manufacturing the sameELPIDA MEMORY INC·Filed 2009·Application pending·0 cites
- 1335US2004171241A1Semiconductor device having gate electrode of polymetal gate structure processed by side nitriding in anmonia atmosphereFiled 2004·Application pending·0 cites
- 1434US8395232B2Semiconductor device and method of manufacturing the sameHORIBA SHINICHI·Filed 2010·Granted Mar 12, 2013·0 cites·20 claims
- 1529USD422548SFront portion of a motor vehicleMAZDA MOTOR·Filed 1998·Granted Apr 11, 2000·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →