Inventor · disambiguated record
Kyle M. Hanson
Also filed as: HANSON KYLE · HANSON KYLE M · HANSON KYLE MORAN
115 granted patents·50 pending applications·3,097 citations·filing 1997–2023
99Inventor score
Top patents by PatentIndex Score
165 records- 0199US6080291AApparatus for electrochemically processing a workpiece including an electrical contact assembly having a seal memberSEMITOOL INC·Filed 1998·Granted Jun 27, 2000·388 cites·8 claims
- 0297US9964863B1Post exposure processing apparatusAPPLIED MATERIALS INC·Filed 2017·Granted May 8, 2018·22 cites·14 claims
- 0397US6497801B1Electroplating apparatus with segmented anode arraySEMITOOL INC·Filed 1998·Granted Dec 24, 2002·120 cites·14 claims
- 0497US6228232B1Reactor vessel having improved cup anode and conductor assemblySEMITOOL INC·Filed 1998·Granted May 8, 2001·110 cites·22 claims
- 0596US6569297B2Workpiece processor having processing chamber with improved processing fluid flowSEMITOOL INC·Filed 2001·Granted May 27, 2003·39 cites·52 claims
- 0695US9958782B2Apparatus for post exposure bakeAPPLIED MATERIALS INC·Filed 2016·Granted May 1, 2018·9 cites·20 claims
- 0795US6254742B1Diffuser with spiral opening pattern for an electroplating reactor vesselSEMITOOL INC·Filed 1999·Granted Jul 3, 2001·130 cites·19 claims
- 0894US8496789B2Electrochemical processorMCHUGH PAUL R·Filed 2011·Granted Jul 30, 2013·9 cites·20 claims
- 0994US6547937B1Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpieceSEMITOOL INC·Filed 2000·Granted Apr 15, 2003·61 cites·34 claims
- 1094US6309520B1Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Oct 30, 2001·92 cites·61 claims
- 1194US6004440ACathode current control system for a wafer electroplating apparatusSEMITOOL INC·Filed 1997·Granted Dec 21, 1999·117 cites·25 claims
- 1294US5985126ASemiconductor plating system workpiece support having workpiece engaging electrodes with distal contact part and dielectric coverSEMITOOL INC·Filed 1997·Granted Nov 16, 1999·121 cites·28 claims
- 1393US6660137B2System for electrochemically processing a workpieceSEMITOOL INC·Filed 2001·Granted Dec 9, 2003·78 cites·18 claims
- 1493US6309524B1Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Oct 30, 2001·107 cites·39 claims
- 1593US6091498ASemiconductor processing apparatus having lift and tilt mechanismSEMITOOL INC·Filed 1997·Granted Jul 18, 2000·115 cites·12 claims
- 1692US11550224B2Apparatus for post exposure bakeAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·2 cites·20 claims
- 1792US11262662B2Post exposure processing apparatusAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·2 cites·19 claims
- 1892US7857958B2Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpiecesSEMITOOL INC·Filed 2007·Granted Dec 28, 2010·17 cites·23 claims
- 1992US6672820B1Semiconductor processing apparatus having linear conveyer systemSEMITOOL INC·Filed 1997·Granted Jan 6, 2004·145 cites·13 claims
- 2092US6368475B1Apparatus for electrochemically processing a microelectronic workpieceSEMITOOL INC·Filed 2000·Granted Apr 9, 2002·97 cites·33 claims
- 2192US6270647B1Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operationsSEMITOOL INC·Filed 1999·Granted Aug 7, 2001·134 cites·15 claims
- 2292US6139703ACathode current control system for a wafer electroplating apparatusSEMITOOL INC·Filed 1999·Granted Oct 31, 2000·67 cites·28 claims
- 2391US7002698B2Semiconductor processing apparatus having lift and tilt mechanismSEMITOOL INC·Filed 2003·Granted Feb 21, 2006·44 cites·11 claims
- 2491US6428660B2Reactor vessel having improved cup, anode and conductor assemblySEMITOOL INC·Filed 2001·Granted Aug 6, 2002·18 cites·18 claims
- 2590US6645355B2Semiconductor processing apparatus having lift and tilt mechanismSEMITOOL INC·Filed 2001·Granted Nov 11, 2003·54 cites·17 claims
- 2690US6428662B1Reactor vessel having improved cup, anode and conductor assemblySEMITOOL INC·Filed 1999·Granted Aug 6, 2002·39 cites·27 claims
- 2790US6280582B1Reactor vessel having improved cup, anode and conductor assemblySEMITOOL INC·Filed 1999·Granted Aug 28, 2001·39 cites·21 claims
- 2889US6699373B2Apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Mar 2, 2004·40 cites·42 claims
- 2989US6280583B1Reactor assembly and method of assemblySEMITOOL INC·Filed 1999·Granted Aug 28, 2001·36 cites·31 claims
- 3088US6409892B1Reactor vessel having improved cup, anode, and conductor assemblySEMITOOL INC·Filed 1999·Granted Jun 25, 2002·36 cites·11 claims
- 3187US8500968B2Deplating contacts in an electrochemical plating apparatusWOODRUFF DANIEL J·Filed 2010·Granted Aug 6, 2013·7 cites·15 claims
- 3287US7147760B2Electroplating apparatus with segmented anode arraySEMITOOL INC·Filed 2004·Granted Dec 12, 2006·12 cites·11 claims
- 3387US6921468B2Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operationsSEMITOOL INC·Filed 2001·Granted Jul 26, 2005·40 cites·8 claims
- 3487US6869510B2Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 2001·Granted Mar 22, 2005·26 cites·21 claims
- 3587US6303010B1Methods and apparatus for processing the surface of a microelectronic workpieceSEMITOOL INC·Filed 1999·Granted Oct 16, 2001·81 cites·8 claims
- 3686US7351315B2Chambers, systems, and methods for electrochemically processing microfeature workpiecesSEMITOOL INC·Filed 2003·Granted Apr 1, 2008·20 cites·26 claims
- 3786US7147765B2Apparatus and method for deposition of an electrophoretic emulsionSEMITOOL INC·Filed 2002·Granted Dec 12, 2006·16 cites·25 claims
- 3886US6921467B2Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpiecesSEMITOOL INC·Filed 2001·Granted Jul 26, 2005·37 cites·44 claims
- 3986US6916412B2Adaptable electrochemical processing chamberSEMITOOL INC·Filed 2001·Granted Jul 12, 2005·35 cites·20 claims
- 4086US6654122B1Semiconductor processing apparatus having lift and tilt mechanismSEMITOOL INC·Filed 2000·Granted Nov 25, 2003·31 cites·31 claims
- 4184US11982008B2Electroplating systemAPPLIED MATERIALS INC·Filed 2023·Granted May 14, 2024·0 cites·5 claims
- 4284US8961771B2Electrolytic process using cation permeable barrierBASKARAN RAJESH·Filed 2012·Granted Feb 24, 2015·2 cites·15 claims
- 4384US8808888B2Flow battery systemsWILSON GREGORY J·Filed 2010·Granted Aug 19, 2014·4 cites·13 claims
- 4484US8236159B2Electrolytic process using cation permeable barrierBASKARAN RAJESH·Filed 2006·Granted Aug 7, 2012·3 cites·38 claims
- 4584US7294244B2Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpieceSEMITOOL INC·Filed 2003·Granted Nov 13, 2007·20 cites·29 claims
- 4684US7267749B2Workpiece processor having processing chamber with improved processing fluid flowSEMITOOL INC·Filed 2003·Granted Sep 11, 2007·10 cites·32 claims
- 4784US7247223B2Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpiecesSEMITOOL INC·Filed 2003·Granted Jul 24, 2007·25 cites·44 claims
- 4884US6004828ASemiconductor processing workpiece support with sensory subsystem for detection of wafers or other semiconductor workpiecesSEMITOOL INC·Filed 1997·Granted Dec 21, 1999·58 cites·16 claims
- 4983US7645366B2Microelectronic workpiece holders and contact assemblies for use therewithSEMITOOL INC·Filed 2005·Granted Jan 12, 2010·6 cites·22 claims
- 5083US7628898B2Method and system for idle state operationSEMITOOL INC·Filed 2005·Granted Dec 8, 2009·3 cites·7 claims
Showing the top 50 of 165 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →