Inventor · disambiguated record
Arthur W. Zafiropoulo
Also filed as: ZAFIROPOULO ARTHUR W
21 granted patents·8 pending applications·619 citations·filing 1982–2016
96Inventor score
Top patents by PatentIndex Score
29 records- 0194US4715921AQuad processorGEN SIGNAL CORP·Filed 1986·Granted Dec 29, 1987·140 cites·25 claims
- 0293US4381965AMulti-planar electrode plasma etchingDRYTEK INC·Filed 1982·Granted May 3, 1983·119 cites·17 claims
- 0386US8501638B1Laser annealing scanning methods with reduced annealing non-uniformitiesZAFIROPOULO ARTHUR W·Filed 2012·Granted Aug 6, 2013·8 cites·10 claims
- 0485US8986562B2Methods of laser processing photoresist in a gaseous environmentULTRATECH INC·Filed 2013·Granted Mar 24, 2015·6 cites·33 claims
- 0579US8872408B2Betavoltaic power sources for mobile device applicationsULTRATECH INC·Filed 2013·Granted Oct 28, 2014·4 cites·15 claims
- 0678US8067305B2Electrically conductive structure on a semiconductor substrate formed from printingZAFIROPOULO ARTHUR W·Filed 2008·Granted Nov 29, 2011·36 cites·34 claims
- 0776US9583337B2Oxygen radical enhanced atomic-layer deposition using ozone plasmaULTRATECH INC·Filed 2015·Granted Feb 28, 2017·2 cites·15 claims
- 0876US5344542AMultiple-processing and contamination-free plasma etching systemGEN SIGNAL CORP·Filed 1991·Granted Sep 6, 1994·64 cites·26 claims
- 0976US4473435APlasma etchant mixtureDRYTEK·Filed 1983·Granted Sep 25, 1984·51 cites·12 claims
- 1075US5013385AQuad processorGEN SIGNAL CORP·Filed 1989·Granted May 7, 1991·43 cites·25 claims
- 1171US9266437B2Betavoltaic power sources for transportation applicationsULTRATECH INC·Filed 2013·Granted Feb 23, 2016·2 cites·19 claims
- 1270US6103055ASystem for processing substratesAPPLIED MATERIALS INC·Filed 1995·Granted Aug 15, 2000·39 cites·9 claims
- 1370US5308431ASystem providing multiple processing of substratesGEN SIGNAL CORP·Filed 1992·Granted May 3, 1994·48 cites·4 claims
- 1464US8796151B2Systems for and methods of laser-enhanced plasma processing of semiconductor materialsHAWRYLUK ANDREW M·Filed 2012·Granted Aug 5, 2014·1 cites·18 claims
- 1561USD275032SPlasma cassette etcherDRYTEK INC·Filed 1982·Granted Aug 7, 1984·8 cites·1 claims
- 1660US9613828B2Method of laser annealing a semiconductor wafer with localized control of ambient oxygenULTRATECH INC·Filed 2015·Granted Apr 4, 2017·1 cites·20 claims
- 1760US6413320B2Integrated processing system having multiple reactors connected to a central chamberAPPLIED MATERIALS INC·Filed 2001·Granted Jul 2, 2002·5 cites·11 claims
- 1854US6776846B2Integrated processing system having multiple reactors connected to a central chamberAPPLIED MATERIALS INC·Filed 2002·Granted Aug 17, 2004·3 cites·9 claims
- 1954US5102495AMethod providing multiple-processing of substratesGEN SIGNAL CORP·Filed 1991·Granted Apr 7, 1992·25 cites·1 claims
- 2054US2010140768A1Systems and processes for forming three-dimensional circuitsZAFIROPOULO ARTHUR W·Filed 2008·Application pending·0 cites
- 2154US2010084744A1Thermal processing of substrates with pre- and post-spike temperature controlZAFIROPOULO ARTHUR W·Filed 2008·Application pending·0 cites
- 2253US6214119B1Vacuum substrate processing system having multiple processing chambers and a central load/unload chamberAPPLIED MATERIALS INC·Filed 1998·Granted Apr 10, 2001·14 cites·13 claims
- 2351US2016240440A1Systems and processes for forming three-dimensional integrated circuitsULTRATECH INC·Filed 2016·Application pending·0 cites
- 2449US2011089523A1Systems and processes for forming three-dimensional circuitsULTRATECH INC·Filed 2010·Application pending·0 cites
- 2549US2012111838A1Thermal Processing of Substrates with Pre- and Post-Spike Temperature ControZAFIROPOULO ARTHUR W·Filed 2012·Application pending·0 cites
- 2648US2011298093A1Thermal Processing of Substrates with Pre- and Post-Spike Temperature ControlZAFIROPOULO ARTHUR W·Filed 2011·Application pending·0 cites
- 2747US2014238958A1Systems and methods for material processing using light-emitting diodesULTRATECH INC·Filed 2013·Application pending·0 cites
- 2837US2017062191A1Plasma-enhanced atomic layer deposition system with rotary reactor tubeULTRATECH INC·Filed 2016·Application pending·0 cites
- 2936US9318319B2Radical-enhanced atomic layer deposition using CF4 to enhance oxygen radical generationULTRATECH INC·Filed 2015·Granted Apr 19, 2016·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →