Inventor · disambiguated record
Kwon-Taek Lim
Also filed as: LIM KWON · LIM KWON TAEK
6 granted patents·2 pending applications·30 citations·filing 2007–2018
81Inventor score
Files withLEE HYO-SAN3LIM KWON TAEK2NAT UNIV PUKYONG IND UNIV COOP1SAMSUNG ELECTRONICS CO LTD1SEMES CO LTD1
Top patents by PatentIndex Score
8 records- 0187US8790470B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2011·Granted Jul 29, 2014·8 cites·35 claims
- 0284US8084367B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2007·Granted Dec 27, 2011·9 cites·31 claims
- 0382US8585917B2Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methodsLEE HYO-SAN·Filed 2011·Granted Nov 19, 2013·5 cites·36 claims
- 0478US11004675B2Substrate cleaning composition, substrate treating method, and substrate treating apparatusSEMES CO LTD·Filed 2018·Granted May 11, 2021·2 cites·17 claims
- 0565US8889563B2Method and apparatus for etching the silicon oxide layer of a semiconductor substrateLIM KWON-TAEK·Filed 2011·Granted Nov 18, 2014·3 cites·8 claims
- 0660US7808629B2Methods, assemblies and systems for inspecting a photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Oct 5, 2010·3 cites·14 claims
- 0742US2011117752A1Method and system for etching a silicon dioxide film using densified carbon dioxideLIM KWON TAEK·Filed 2009·Application pending·0 cites
- 0842US2009288689A1Ultrasonic cleaning system for removing high dose ion implanted photoresist in supercritical carbon dioxideNAT UNIV PUKYONG IND UNIV COOP·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →