Methods, assemblies and systems for inspecting a photomask

Abstract

A method of inspecting a photomask, the method comprising, inspecting at least a portion of the photomask to provide a location of defects having with a first resolution, determining at least one defect region in the location of the defects, the defect region having a defect therein, and imaging the at least one defect region to provide a defect image having a second resolution that is finer than the first resolution.

1. A method of inspecting a photomask, the method comprising:
 inspecting at least a portion of the photomask to provide a location of defects with a first resolution in a first system; 
 determining at least one defect region in the location of the defects, the defect region having a defect therein in the first system; 
 reviewing the at least one defect region to provide a defect image having a second resolution that is finer than the first resolution in a second system that is different from the first system; 
 repairing the defect in patterns of the photomask in a third system that is different from the first and second systems, wherein the repair is based on the defect image from the second system; 
 imaging the at least one defect region in the second system to provide a repaired defect image after repairing the defect; and 
 evaluating whether the defect is sufficiently repaired using the repaired defect image from the second system. 
 
     
     
       2. The method of  claim 1 , further comprising identifying the defect based on the defect image. 
     
     
       3. The method of  claim 2 , wherein identifying the defect includes classifying the defect as at least one of a spot defect, a pin hole defect, a bridge defect, a dark defect, a clear extension defect, and a particle defect. 
     
     
       4. The method of  claim 2 , further comprising providing repair information for repairing the defect based on identifying the defect. 
     
     
       5. The method of  claim 2 , wherein determining at least one defect region of the photomask includes determining coordinate data identifying a location of the at least one defect region. 
     
     
       6. The method of  claim 1 , further comprising performing additional repairs if the defect is not sufficiently repaired. 
     
     
       7. The method of  claim 1 , further comprising displaying the at least one defect region. 
     
     
       8. An assembly for inspecting a photomask, the assembly comprising:
 a first system configured to inspect the photomask to provide a location of defects having a first resolution; 
 a second system that is different from the first system, the second system being configured to review the location of defects having a second resolution that is finer than the first resolution; and 
 a third system that is different from the first and second systems, the third system being configured to repair the defect in patterns of the photomask based on the repair coordinate data from the second system, 
 wherein the second system is configured to image the at least one defect region after the third system repairs the defect to provide a repaired defect image and to evaluate whether the at least one defect region is sufficiently repaired. 
 
     
     
       9. The assembly of  claim 8 , wherein the first system comprises:
 a first stage mounting configured to mount a photomask thereon; and 
 a first plurality of lenses configured to inspect patterns of the photomask mounted on the first stage. 
 
     
     
       10. The assembly of  claim 9 , further comprising a controller configured to create a defect coordinate data. 
     
     
       11. The assembly of  claim 8 , wherein the second system comprises:
 a second stage configured to mount the photomask thereon; 
 a coordinate analyzing unit receiving configured to receive the defect coordinate data from the first system; and 
 a second plurality of lenses configured to review the at least one defect region based on the defect coordinate data. 
 
     
     
       12. The assembly of  claim 11 , wherein the second system further comprises:
 a stage driving unit configured to drive the second stage on the basis of coordinates that are analyzed by the coordinate analyzing unit; 
 an image processor configured to receive optical signals from the second plurality of lenses to form image data; and 
 a data processor configured to receive image data from the image processor and to classify defects of patterns of the photomask into types, and creating repair coordinate data having coordinate information of defects to be repaired, wherein the image data is made by a second resolution that is finer than the first resolution. 
 
     
     
       13. The assembly of  claim 12 , wherein the data processor is configured to determine repair coordinate data for repairing a defect in the defect region. 
     
     
       14. The assembly of  claim 8 , wherein the second system is configured to display patterns of the photomask as a visual image on a monitor.