Inventor · disambiguated record
Timothy A. Brunner
Also filed as: BRUNNER TIMOTHY A · BRUNNER TIMOTHY ALLAN
58 granted patents·5 pending applications·2,434 citations·filing 1983–2023
99Inventor score
Top patents by PatentIndex Score
63 records- 0199US6130750AOptical metrology tool and method of using sameIBM·Filed 1997·Granted Oct 10, 2000·295 cites·10 claims
- 0299US4929083AFocus and overlay characterization and optimization for photolithographic exposureXEROX CORP·Filed 1989·Granted May 29, 1990·265 cites·6 claims
- 0398US5805290AMethod of optical metrology of unresolved pattern arraysIBM·Filed 1996·Granted Sep 8, 1998·209 cites·20 claims
- 0497US6317211B1Optical metrology tool and method of using sameIBM·Filed 1999·Granted Nov 13, 2001·141 cites·12 claims
- 0596US4703434AApparatus for measuring overlay errorPERKIN ELMER CORP·Filed 1984·Granted Oct 27, 1987·109 cites·12 claims
- 0694US10012898B2EUV mask for monitoring focus in EUV lithographyIBM·Filed 2017·Granted Jul 3, 2018·4 cites·7 claims
- 0794US7455939B2Method of improving grating test pattern for lithography monitoring and controllingIBM·Filed 2006·Granted Nov 25, 2008·18 cites·10 claims
- 0894US5532089ASimplified fabrication methods for rim phase-shift masksIBM·Filed 1993·Granted Jul 2, 1996·105 cites·16 claims
- 0994US5300786AOptical focus phase shift test pattern, monitoring system and processIBM·Filed 1992·Granted Apr 5, 1994·202 cites·30 claims
- 1093US5965309AFocus or exposure dose parameter control system using tone reversing patternsIBM·Filed 1997·Granted Oct 12, 1999·116 cites·10 claims
- 1193US5914784AMeasurement method for linewidth metrologyIBM·Filed 1997·Granted Jun 22, 1999·101 cites·25 claims
- 1293US5675164AHigh performance multi-mesa field effect transistorIBM·Filed 1995·Granted Oct 7, 1997·119 cites·32 claims
- 1393US4475811AOverlay test measurement systemsPERKIN ELMER CORP·Filed 1983·Granted Oct 9, 1984·69 cites·13 claims
- 1492US7439001B2Focus blur measurement and control methodIBM·Filed 2005·Granted Oct 21, 2008·13 cites·4 claims
- 1591US9310674B2Mask that provides improved focus control using orthogonal edgesIBM·Filed 2014·Granted Apr 12, 2016·7 cites·40 claims
- 1691US8271910B2EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layerTIRAPU-AZPIROZ JAIONE·Filed 2010·Granted Sep 18, 2012·9 cites·13 claims
- 1791US6027842AProcess for controlling etching parametersIBM·Filed 1999·Granted Feb 22, 2000·102 cites·11 claims
- 1891US5976740AProcess for controlling exposure dose or focus parameters using tone reversing patternIBM·Filed 1997·Granted Nov 2, 1999·100 cites·11 claims
- 1991US5953128AOptically measurable serpentine edge tone reversed targetsIBM·Filed 1997·Granted Sep 14, 1999·91 cites·23 claims
- 2090US6004706AEtching parameter control system processIBM·Filed 1999·Granted Dec 21, 1999·86 cites·10 claims
- 2189US9588440B2Method for monitoring focus in EUV lithographyIBM·Filed 2015·Granted Mar 7, 2017·3 cites·11 claims
- 2289US6842237B2Phase shifted test pattern for monitoring focus and aberrations in optical projection systemsIBM·Filed 2001·Granted Jan 11, 2005·36 cites·17 claims
- 2388US8368890B2Polarization monitoring reticle design for high numerical aperture lithography systemsIBM·Filed 2010·Granted Feb 5, 2013·5 cites·33 claims
- 2488US6879400B2Single tone process window metrology target and method for lithographic processingIBM·Filed 2000·Granted Apr 12, 2005·32 cites·22 claims
- 2584US8239789B2System and method of predicting problematic areas for lithography in a circuit designBRUNNER TIMOTHY A·Filed 2011·Granted Aug 7, 2012·3 cites·8 claims
- 2682US8582078B2Test method for determining reticle transmission stabilityBRUNNER TIMOTHY A·Filed 2011·Granted Nov 12, 2013·4 cites·17 claims
- 2781US6541166B2Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposuresIBM·Filed 2001·Granted Apr 1, 2003·19 cites·23 claims
- 2878US8679708B2Polarization monitoring reticle design for high numerical aperture lithography systemsIBM·Filed 2012·Granted Mar 25, 2014·2 cites·20 claims
- 2978US8238644B2Fast method to model photoresist images using focus blur and resist blurBRUNNER TIMOTHY A·Filed 2006·Granted Aug 7, 2012·5 cites·22 claims
- 3077US9997348B2Wafer stress control and topography compensationIBM·Filed 2016·Granted Jun 12, 2018·2 cites·20 claims
- 3176US7585601B2Method to optimize grating test pattern for lithography monitoring and controlIBM·Filed 2008·Granted Sep 8, 2009·3 cites·24 claims
- 3275US9075944B2System and method of predicting problematic areas for lithography in a circuit designMENTOR GRAPHICS CORP·Filed 2013·Granted Jul 7, 2015·1 cites·14 claims
- 3374US8484586B2System and method of predicting problematic areas for lithography in a circuit designBRUNNER TIMOTHY A·Filed 2012·Granted Jul 9, 2013·1 cites·20 claims
- 3474US8001495B2System and method of predicting problematic areas for lithography in a circuit designIBM·Filed 2008·Granted Aug 16, 2011·2 cites·10 claims
- 3573US6436605B1Plasma resistant composition and use thereofIBM·Filed 1999·Granted Aug 20, 2002·31 cites·25 claims
- 3672US7473648B2Double exposure double resist layer process for forming gate patternsIBM·Filed 2006·Granted Jan 6, 2009·5 cites·9 claims
- 3770US5470681APhase shift mask using liquid phase oxide depositionIBM·Filed 1993·Granted Nov 28, 1995·21 cites·18 claims
- 3869US9899183B1Structure and method to measure focus-dependent pattern shift in integrated circuit imagingGLOBALFOUNDRIES INC·Filed 2016·Granted Feb 20, 2018·1 cites·20 claims
- 3969US8119322B2Method for producing self-aligned mask, articles produced by same and composition for sameBRUNNER TIMOTHY A·Filed 2008·Granted Feb 21, 2012·3 cites·17 claims
- 4069US7378738B2Method for producing self-aligned mask, articles produced by same and composition for sameIBM·Filed 2003·Granted May 27, 2008·13 cites·10 claims
- 4169US6048651AFresnel zone mask for pupilgramIBM·Filed 1998·Granted Apr 11, 2000·27 cites·25 claims
- 4267US7074525B2Critical dimension control of printed features using non-printing fill patternsIBM·Filed 2003·Granted Jul 11, 2006·11 cites·36 claims
- 4366US8023102B2Test method for determining reticle transmission stabilityIBM·Filed 2008·Granted Sep 20, 2011·1 cites·17 claims
- 4465US7416820B2Pellicle film optimized for immersion lithography systems with NA>1IBM·Filed 2007·Granted Aug 26, 2008·1 cites·14 claims
- 4564US8227180B2Photolithography focus improvement by reduction of autofocus radiation transmission into substrateBRUNNER TIMOTHY ALLAN·Filed 2011·Granted Jul 24, 2012·1 cites·9 claims
- 4663US2025199418A1Measuring contrast and critical dimension using an alignment sensorASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4762US5948571AAsymmetrical resist sidewallIBM·Filed 1997·Granted Sep 7, 1999·23 cites·10 claims
- 4861US9921466B2Method for monitoring focus in EUV lithographyIBM·Filed 2017·Granted Mar 20, 2018·0 cites·7 claims
- 4957US6950183B2Apparatus and method for inspection of photolithographic maskIBM·Filed 2003·Granted Sep 27, 2005·1 cites·15 claims
- 5057US2023296986A1Lithographic apparatus and methods for multi-exposure of a substrateASML HOLDING NV·Filed 2021·Application pending·0 cites
Showing the top 50 of 63 patent records by PatentIndex Score.
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