Inventor · disambiguated record
Yuan-Hsun Wu
Also filed as: WU YUAN-HSUN
20 granted patents·9 pending applications·174 citations·filing 2001–2014
92Inventor score
Top patents by PatentIndex Score
29 records- 0195US7504184B2Phase-shifting mask for equal line/space dense line patternsNANYA TECHNOLOGY CORP·Filed 2005·Granted Mar 17, 2009·109 cites·7 claims
- 0283US7419882B2Alignment mark and alignment method for the fabrication of trench-capacitor dram devicesNANYA TECHNOLOGY CORP·Filed 2005·Granted Sep 2, 2008·13 cites·5 claims
- 0377US7014965B2Photolithography method for reducing effects of lens aberrationNANYA TECHNOLOGY CORP·Filed 2003·Granted Mar 21, 2006·16 cites·18 claims
- 0475US8043794B2Method of double patterning, method of processing a plurality of semiconductor wafers and semiconductor deviceQIMONDA AG·Filed 2008·Granted Oct 25, 2011·6 cites·24 claims
- 0575US6977715B2Method for optimizing NILS of exposed linesNANYA TECHNOLOGY CORP·Filed 2004·Granted Dec 20, 2005·13 cites·21 claims
- 0662US7504183B2Chromeless phase-shifting mask for equal line/space dense line patternsNANYA TECHNOLOGY CORP·Filed 2005·Granted Mar 17, 2009·2 cites·17 claims
- 0755US6866975B2Best focus determining methodNANYA TECHNOLOGY CORP·Filed 2002·Granted Mar 15, 2005·4 cites·8 claims
- 0854US6858355B2Mask and method for defining a guard ring patternNANYA TECHNOLOGY CORP·Filed 2002·Granted Feb 22, 2005·6 cites·19 claims
- 0950US8994197B2Alignment mark and method of manufacturing the sameNANYA TECHNOLOGY CORP·Filed 2014·Granted Mar 31, 2015·0 cites·5 claims
- 1050US7012763B2Aperture plate for lithography systemsNANYA TECHNOLOGY CORP·Filed 2004·Granted Mar 14, 2006·2 cites·11 claims
- 1149US7811723B2Phase-shift mask and method for forming a patternNANYA TECHNOLOGY CORP·Filed 2008·Granted Oct 12, 2010·0 cites·8 claims
- 1249US2006121368A1Photomask structure and method of reducing lens aberration and pattern displacementNANYA TECHNOLOGY CORP·Filed 2006·Application pending·0 cites
- 1345US2005221560A1Method of forming a vertical memory device with a rectangular trenchNANYA TECHNOLOGY CORP·Filed 2005·Application pending·0 cites
- 1443US6847445B2Method for estimating repair accuracy of a mask shopNANYA TECHNOLOGY CORP·Filed 2001·Granted Jan 25, 2005·0 cites·7 claims
- 1541US2004219438A1Photomask structure and method of reducing lens aberration and pattern displacementNANYA TECHNOLOGY CORP·Filed 2003·Application pending·0 cites
- 1640US7205075B2Method of forming a vertical memory device with a rectangular trenchNANYA TECHNOLOGY CORP·Filed 2003·Granted Apr 17, 2007·0 cites·5 claims
- 1739US7165233B2Test ket layout for precisely monitoring 3-foil lens aberration effectsNANYA TECHNOLOGY CORP·Filed 2004·Granted Jan 16, 2007·0 cites·5 claims
- 1838US6929902B2Method of preventing repeated collapse in a reworked photoresist layerNANYA TECHNOLOGY CORP·Filed 2003·Granted Aug 16, 2005·0 cites·12 claims
- 1938US6759328B2Masks and method for contact hole exposureNANYA TECHNOLOGY CORP·Filed 2002·Granted Jul 6, 2004·3 cites·18 claims
- 2037US8723341B2Alignment mark and method of manufacturing the sameCHIANG CHEN KU·Filed 2011·Granted May 13, 2014·0 cites·12 claims
- 2137US6699800B2Pattern design method for lithography C/H processNANYA TECHNOLOGY CORP·Filed 2002·Granted Mar 2, 2004·0 cites·4 claims
- 2237US6654703B2Method for estimating repair accuracy of a mask shopNANYA TECHNOLOGY CORP·Filed 2001·Granted Nov 25, 2003·0 cites·10 claims
- 2337US2004029394A1Method and structure for preventing wafer edge defocusNANYA TECHNOLOGY CORP·Filed 2002·Application pending·0 cites
- 2437US2005214651A1Aperture plate for optical lithography systemsWU YUAN-HSUN·Filed 2004·Application pending·0 cites
- 2537US2004079729A1Process for etching metal layerNANYA TECHNOLOGY CORP·Filed 2003·Application pending·0 cites
- 2636US2007054201A1Phase shifting mask for equal line/space dense line patternsHUNG YUNG-LONG·Filed 2006·Application pending·0 cites
- 2736US2003180629A1Masks and method for contact hole exposureNANYA TECHNOLOGY CORP·Filed 2002·Application pending·0 cites
- 2835US6998226B2Method of forming patterned photoresist layerNANYA TECHNOLOGY CORP·Filed 2002·Granted Feb 14, 2006·0 cites·15 claims
- 2935US2003117605A1Apparatus and method for contact hole exposureNANYA TECHNOLOGY CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →