Inventor · disambiguated record
Carsten Hartig
Also filed as: HARTIG CARSTEN
14 granted patents·2 pending applications·347 citations·filing 2001–2016
92Inventor score
Top patents by PatentIndex Score
16 records- 0197US7259091B2Technique for forming a passivation layer prior to depositing a barrier layer in a copper metallization layerADVANCED MICRO DEVICES INC·Filed 2005·Granted Aug 21, 2007·268 cites·10 claims
- 0285US7410885B2Method of reducing contamination by removing an interlayer dielectric from the substrate edgeADVANCED MICRO DEVICES INC·Filed 2006·Granted Aug 12, 2008·12 cites·12 claims
- 0382US8892237B2Systems and methods for fabricating semiconductor device structures using different metrology toolsGLOBALFOUNDRIES INC·Filed 2013·Granted Nov 18, 2014·5 cites·20 claims
- 0477US9091667B2Detection of particle contamination on wafersGLOBALFOUNDRIES INC·Filed 2013·Granted Jul 28, 2015·3 cites·15 claims
- 0569US6720242B2Method of forming a substrate contact in a field effect transistor formed over a buried insulator layerADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 13, 2004·18 cites·15 claims
- 0666US7098140B2Method of compensating for etch rate non-uniformities by ion implantationADVANCED MICRO DEVICES INC·Filed 2004·Granted Aug 29, 2006·10 cites·31 claims
- 0766US6724096B2Die corner alignment structureADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 20, 2004·14 cites·18 claims
- 0863US9029855B2Layout for reticle and wafer scanning electron microscope registration or overlay measurementsNING GUO XIANG·Filed 2013·Granted May 12, 2015·2 cites·12 claims
- 0962US9177873B2Systems and methods for fabricating semiconductor device structuresGLOBALFOUNDRIES INC·Filed 2013·Granted Nov 3, 2015·1 cites·18 claims
- 1060US6936383B2Method of defining the dimensions of circuit elements by using spacer deposition techniquesADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 30, 2005·8 cites·20 claims
- 1159US10115621B2Method for in-die overlay control using FEOL dummy fill layerGLOBALFOUNDRIES INC·Filed 2016·Granted Oct 30, 2018·1 cites·11 claims
- 1258US7663766B2Incorporating film optical property measurements into scatterometry metrologyADVANCED MICRO DEVICES INC·Filed 2007·Granted Feb 16, 2010·3 cites·20 claims
- 1348US9171765B2Inline residual layer detection and characterization post via post etch using CD-SEMGLOBALFOUNDRIES INC·Filed 2014·Granted Oct 27, 2015·0 cites·20 claims
- 1448US6838010B2System and method for wafer-based controlled patterning of features with critical dimensionsADVANCED MICRO DEVICES INC·Filed 2002·Granted Jan 4, 2005·2 cites·41 claims
- 1540US2015221565A1Layout for reticle and wafer scanning electron microscope registration or overlay measurementsGLOBALFOUNDRIES SG PTE LTD·Filed 2015·Application pending·0 cites
- 1638US2004084619A1Method and an apparatus for determining the dimension of a feature by varying a resolution determining parameterFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →