Inventor · disambiguated record
Miwa Miyairi
Also filed as: MIYAIRI MIWA
17 granted patents·4 pending applications·359 citations·filing 1999–2007
94Inventor score
Top patents by PatentIndex Score
21 records- 0198US7323287B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 29, 2008·77 cites·1 claims
- 0297US7074543B2Positive resist composition and method of forming resist pattern from the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 11, 2006·151 cites·20 claims
- 0391US6936400B2Negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 30, 2005·40 cites·27 claims
- 0490US6406829B1Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jun 18, 2002·44 cites·7 claims
- 0573US6455228B1Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 24, 2002·13 cites·6 claims
- 0668US7435530B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Oct 14, 2008·5 cites·55 claims
- 0762US7316885B2Method of forming resist pattern, positive resist composition, and layered productTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Jan 8, 2008·6 cites·16 claims
- 0855US7316889B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 8, 2008·2 cites·8 claims
- 0954US7316888B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 8, 2008·2 cites·7 claims
- 1047US7276575B2Process for refining crude resin for resistTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Oct 2, 2007·1 cites·20 claims
- 1147US6171749B1Negative-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jan 9, 2001·12 cites·14 claims
- 1244US7033731B2Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 25, 2006·0 cites·7 claims
- 1340US7501221B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Mar 10, 2009·0 cites·5 claims
- 1440US7390612B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jun 24, 2008·0 cites·8 claims
- 1540US2002146645A1Multilayered body for photolithographic patterningFiled 2002·Application pending·0 cites
- 1639US6544712B1Negative working resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Apr 8, 2003·5 cites·7 claims
- 1739US2006194141A1Positive resist composition and method for forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 1838US2006141382A1Resist composition and method of forming resist pattern using sameTAKESHITA MASARU·Filed 2003·Application pending·0 cites
- 1937US2006147832A1Polymer and positive type resist compositionHADA HIDEO·Filed 2004·Application pending·0 cites
- 2035US7326515B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Feb 5, 2008·0 cites·15 claims
- 2133US6864036B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 8, 2005·1 cites·25 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →