Inventor · disambiguated record
Hyu-Bum Park
Also filed as: PARK HYU B · PARK HYU-BUM
2 granted patents·6 pending applications·21 citations·filing 1996–2011
60Inventor score
Top patents by PatentIndex Score
8 records- 0181US8840798B2Chemical mechanical polishing slurry composition and method for producing semiconductor device using the sameHAN DEOK-SU·Filed 2011·Granted Sep 23, 2014·10 cites·11 claims
- 0241US5762900ACarbon-doped lithium manganese oxide and manufacturing method therefor using polyethylene glycolSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Jun 9, 1998·11 cites·7 claims
- 0340US2011124195A1Chemical Mechanical Polishing Composition Containing Polysilicon Polish FinisherTECHNO SEMICHEM CO LTD·Filed 2009·Application pending·0 cites
- 0440US2008096385A1Slurry composition for forming tungsten pattern and method for manufacturing semiconductor device using the sameHYNIX SEMICONDUCTOR INC·Filed 2007·Application pending·0 cites
- 0532US2009298289A1Chemical Mechanical Polishing Composition for Copper Comprising ZeoliteTECHNO SEMICHEM CO LTD·Filed 2007·Application pending·0 cites
- 0630US2011045741A1Auto-Stopping Abrasive Composition for Polishing High Step Height Oxide LayerTECHNO SEMICHEM CO LTD·Filed 2006·Application pending·0 cites
- 0728US2010176335A1CMP Slurry Composition for Copper Damascene ProcessTECHNO SEMICHEM CO LTD·Filed 2007·Application pending·0 cites
- 0826US2010015807A1Chemical Mechanical Polishing Composition for Copper Comprising ZeoliteTECHNO SEMICHEM CO LTD·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →