Inventor · disambiguated record
Nobuo Ishimaru
Also filed as: ISHIMARU NOBUO
18 granted patents·7 pending applications·137 citations·filing 2003–2020
94Inventor score
Files withHITACHI INT ELECTRIC INC14ISHIMARU NOBUO3KONTANI TADASHI2KOKUSAI ELECTRIC CORP1MIYASHITA TOMOYASU1
Top patents by PatentIndex Score
25 records- 0196US7900580B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Mar 8, 2011·27 cites·13 claims
- 0294US7861668B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Jan 4, 2011·19 cites·5 claims
- 0393US8261692B2Substrate processing apparatus and reaction containerKONTANI TADASHI·Filed 2010·Granted Sep 11, 2012·10 cites·7 claims
- 0490US8047158B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Nov 1, 2011·8 cites·11 claims
- 0589US8020514B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2009·Granted Sep 20, 2011·9 cites·6 claims
- 0686US8093072B2Substrate processing apparatus and method of manufacturing semiconductor deviceISHIMARU NOBUO·Filed 2009·Granted Jan 10, 2012·12 cites·7 claims
- 0786US8028652B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Oct 4, 2011·7 cites·18 claims
- 0886US7767053B2Substrate processing apparatus and substrate processing methodHITACHI INT ELECTRIC INC·Filed 2007·Granted Aug 3, 2010·14 cites·3 claims
- 0982US9039912B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2012·Granted May 26, 2015·3 cites·15 claims
- 1080US8453600B2Substrate processing apparatusMIYASHITA TOMOYASU·Filed 2005·Granted Jun 4, 2013·13 cites·11 claims
- 1179US8251012B2Substrate processing apparatus and semiconductor device producing methodISHIMARU NOBUO·Filed 2006·Granted Aug 28, 2012·6 cites·6 claims
- 1278US8297224B2Substrate processing apparatusISHIMARU NOBUO·Filed 2009·Granted Oct 30, 2012·3 cites·9 claims
- 1370US8875656B2Substrate processing apparatusKONTANI TADASHI·Filed 2009·Granted Nov 4, 2014·1 cites·9 claims
- 1465US7958842B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2005·Granted Jun 14, 2011·2 cites·14 claims
- 1563US8518182B2Substrate processing apparatusOGAWA SHIZUE·Filed 2011·Granted Aug 27, 2013·2 cites·5 claims
- 1661US8544411B2Batch-type remote plasma processing apparatusTOYODA KAZUYUKI·Filed 2009·Granted Oct 1, 2013·1 cites·5 claims
- 1759US9373499B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Jun 21, 2016·0 cites·18 claims
- 1854US2021090861A1Substrate processing apparatus and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2020·Application pending·0 cites
- 1950US2008023141A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Application pending·0 cites
- 2048US2004025786A1Substrate processing apparatus and reaction containerFiled 2003·Application pending·0 cites
- 2147US8092603B2Substrate processing apparatusSHIMIZU HIRONOBU·Filed 2009·Granted Jan 10, 2012·0 cites·7 claims
- 2246US2010323507A1Substrate processing apparatus and producing method of deviceHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 2346US2010258530A1Substrate processing apparatus and producing method of deviceHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
- 2443US2003164143A1Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2003·Application pending·0 cites
- 2541US2006260544A1Substrate processing and method of manufacturing deviceHITACHI INT ELECTRIC INC·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →