Inventor · disambiguated record
Thaddeus Gerard Dziura
Also filed as: DZIURA THADDEUS · DZIURA THADDEUS G · DZIURA THADDEUS GERARD
33 granted patents·2 pending applications·512 citations·filing 2002–2025
97Inventor score
Top patents by PatentIndex Score
35 records- 0198US10352695B2X-ray scatterometry metrology for high aspect ratio structuresKLA TENCOR CORP·Filed 2016·Granted Jul 16, 2019·68 cites·21 claims
- 0297US11145559B2Process monitoring of deep structures with X-ray scatterometryKLA CORP·Filed 2020·Granted Oct 12, 2021·4 cites·12 claims
- 0397US10775323B2Full beam metrology for X-ray scatterometry systemsKLA TENCOR CORP·Filed 2017·Granted Sep 15, 2020·19 cites·21 claims
- 0497US10727142B2Process monitoring of deep structures with X-ray scatterometryKLA TENCOR CORP·Filed 2018·Granted Jul 28, 2020·17 cites·13 claims
- 0597US9778213B2Metrology tool with combined XRF and SAXS capabilitiesKLA TENCOR CORP·Filed 2014·Granted Oct 3, 2017·39 cites·20 claims
- 0697US7317531B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2003·Granted Jan 8, 2008·83 cites·30 claims
- 0796US8860937B1Metrology systems and methods for high aspect ratio and large lateral dimension structuresKLA TENCOR CORP·Filed 2013·Granted Oct 14, 2014·35 cites·19 claims
- 0895US10325004B1Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrologyDZIURA THADDEUS G·Filed 2016·Granted Jun 18, 2019·11 cites·14 claims
- 0995US9816810B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2016·Granted Nov 14, 2017·11 cites·14 claims
- 1095US8879073B2Optical metrology using targets with field enhancement elementsKLA TENCOR CORP·Filed 2013·Granted Nov 4, 2014·23 cites·20 claims
- 1195US7933016B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2009·Granted Apr 26, 2011·15 cites·20 claims
- 1295US7663753B2Apparatus and methods for detecting overlay errors using scatterometryKLA TENCOR TECH CORP·Filed 2007·Granted Feb 16, 2010·19 cites·45 claims
- 1394US10152678B2System, method and computer program product for combining raw data from multiple metrology toolsKLA TENCOR CORP·Filed 2015·Granted Dec 11, 2018·21 cites·21 claims
- 1494US9490182B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2014·Granted Nov 8, 2016·12 cites·19 claims
- 1593US7656512B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2008·Granted Feb 2, 2010·15 cites·40 claims
- 1693US7382447B2Method for determining lithographic focus and exposureKLA TENCOR TECH CORP·Filed 2002·Granted Jun 3, 2008·46 cites·18 claims
- 1792US11099137B2Visualization of three-dimensional semiconductor structuresKLA CORP·Filed 2020·Granted Aug 24, 2021·3 cites·21 claims
- 1891US11313816B2Full beam metrology for x-ray scatterometry systemsKLA CORP·Filed 2020·Granted Apr 26, 2022·2 cites·19 claims
- 1989US10612916B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2017·Granted Apr 7, 2020·4 cites·5 claims
- 2089US10502694B2Methods and apparatus for patterned wafer characterizationKLA TENCOR CORP·Filed 2014·Granted Dec 10, 2019·7 cites·27 claims
- 2189US10151986B2Signal response metrology based on measurements of proxy structuresKLA TENCOR CORP·Filed 2015·Granted Dec 11, 2018·6 cites·22 claims
- 2288US8666703B2Method for automated determination of an optimally parameterized scatterometry modelFERNS JASON·Filed 2010·Granted Mar 4, 2014·12 cites·17 claims
- 2386US9535018B2Combined x-ray and optical metrologyKLA TENCOR CORP·Filed 2013·Granted Jan 3, 2017·7 cites·20 claims
- 2485US10794839B2Visualization of three-dimensional semiconductor structuresKLA TENCOR CORP·Filed 2019·Granted Oct 6, 2020·4 cites·21 claims
- 2583US9255877B2Metrology system optimization for parameter trackingKLA TENCOR CORP·Filed 2014·Granted Feb 9, 2016·6 cites·20 claims
- 2682US9435735B1Optical parametric model optimizationDZIURA THADDEUS GERARD·Filed 2013·Granted Sep 6, 2016·6 cites·21 claims
- 2779US12320763B2Full beam metrology for x-ray scatterometry systemsKLA CORP·Filed 2022·Granted Jun 3, 2025·0 cites·20 claims
- 2876US9310296B2Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrologyDZIURA THADDEUS G·Filed 2011·Granted Apr 12, 2016·4 cites·24 claims
- 2975US9311431B2Secondary target design for optical measurementsKLA TENCOR CORP·Filed 2012·Granted Apr 12, 2016·5 cites·32 claims
- 3074US12480893B2Optical and X-ray metrology methods for patterned semiconductor structures with randomnessKLA CORP·Filed 2024·Granted Nov 25, 2025·0 cites·39 claims
- 3173US11955391B2Process monitoring of deep structures with X-ray scatterometryKLA CORP·Filed 2021·Granted Apr 9, 2024·0 cites·12 claims
- 3269US10255385B2Model optimization approach based on spectral sensitivityPANDEV STILIAN IVANOV·Filed 2013·Granted Apr 9, 2019·4 cites·31 claims
- 3368US2025237619A1Optical and x-ray metrology methods for patterned semiconductor structures with randomnessKLA CORP·Filed 2025·Application pending·0 cites
- 3462US8090558B1Optical parametric model optimizationDZIURA THADDEUS G·Filed 2009·Granted Jan 3, 2012·4 cites·1 claims
- 3553US2022252395A1Methods And Systems For Accurate Measurement Of Deep Structures Having Distorted GeometryKLA CORP·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →