Inventor · disambiguated record
Tadashi Kontani
Also filed as: KONTANI TADASHI
15 granted patents·3 pending applications·94 citations·filing 2003–2020
92Inventor score
Files withHITACHI INT ELECTRIC INC10KOKUSAI ELECTRIC CORP2KONTANI TADASHI2OGAWA SHIZUE1TOYODA KAZUYUKI1
Top patents by PatentIndex Score
18 records- 0196US7900580B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Mar 8, 2011·27 cites·13 claims
- 0294US7861668B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Jan 4, 2011·19 cites·5 claims
- 0393US10825697B2Substrate processing apparatus, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2020·Granted Nov 3, 2020·3 cites·10 claims
- 0493US8261692B2Substrate processing apparatus and reaction containerKONTANI TADASHI·Filed 2010·Granted Sep 11, 2012·10 cites·7 claims
- 0590US8047158B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Nov 1, 2011·8 cites·11 claims
- 0689US8020514B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2009·Granted Sep 20, 2011·9 cites·6 claims
- 0786US8028652B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Oct 4, 2011·7 cites·18 claims
- 0882US9039912B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2012·Granted May 26, 2015·3 cites·15 claims
- 0970US8875656B2Substrate processing apparatusKONTANI TADASHI·Filed 2009·Granted Nov 4, 2014·1 cites·9 claims
- 1065US7958842B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2005·Granted Jun 14, 2011·2 cites·14 claims
- 1164US8555808B2Substrate processing apparatusYAMAMOTO TETSUO·Filed 2007·Granted Oct 15, 2013·2 cites·16 claims
- 1263US8518182B2Substrate processing apparatusOGAWA SHIZUE·Filed 2011·Granted Aug 27, 2013·2 cites·5 claims
- 1361US8544411B2Batch-type remote plasma processing apparatusTOYODA KAZUYUKI·Filed 2009·Granted Oct 1, 2013·1 cites·5 claims
- 1459US9373499B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Jun 21, 2016·0 cites·18 claims
- 1548US2004025786A1Substrate processing apparatus and reaction containerFiled 2003·Application pending·0 cites
- 1643US2003164143A1Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2003·Application pending·0 cites
- 1740US11289351B2Substrate processing apparatus, method of manufacturing semiconductor device, and recording mediumKOKUSAI ELECTRIC CORP·Filed 2020·Granted Mar 29, 2022·0 cites·7 claims
- 1834US2016002789A1Substrate processing apparatus, method for manufacturing semiconductor device, and recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →