Inventor · disambiguated record
Muneo Furuse
Also filed as: FURUSE MUNEO
13 granted patents·15 pending applications·826 citations·filing 1993–2012
92Inventor score
Files withHITACHI HIGH TECH CORP8FURUSE MUNEO5HITACHI LTD3HASHIMOTO TAKAHISA1HITCHI HIGH TECHNOLOGIES CORP1
Top patents by PatentIndex Score
28 records- 0198US6158383APlasma processing method and apparatusHITACHI LTD·Filed 1999·Granted Dec 12, 2000·339 cites·8 claims
- 0297US6875477B2Method for coating internal surface of plasma processing chamberHITACHI HIGH TECH CORP·Filed 2003·Granted Apr 5, 2005·411 cites·7 claims
- 0378US5804033AMicrowave plasma processing method and apparatusHITACHI LTD·Filed 1993·Granted Sep 8, 1998·32 cites·6 claims
- 0472US8569177B2Plasma processing apparatus and plasma processing methodOHASHI TOMOHIRO·Filed 2012·Granted Oct 29, 2013·3 cites·4 claims
- 0572US6796269B2Apparatus and method for monitoring plasma processing apparatusHITCHI HIGH TECHNOLOGIES CORP·Filed 2002·Granted Sep 28, 2004·15 cites·5 claims
- 0668US8006340B2Cleaning apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Aug 30, 2011·2 cites·9 claims
- 0763US6914005B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jul 5, 2005·6 cites·14 claims
- 0862US8197704B2Plasma processing apparatus and method for operating the sameHASHIMOTO TAKAHISA·Filed 2009·Granted Jun 12, 2012·2 cites·3 claims
- 0961US7526948B2Device and method for detecting foreign material on the surface of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted May 5, 2009·1 cites·13 claims
- 1060US5886473ASurface wave plasma processing apparatusHITACHI LTD·Filed 1997·Granted Mar 23, 1999·14 cites·5 claims
- 1152US2008314321A1Plasma processing apparatusFURUSE MUNEO·Filed 2008·Application pending·0 cites
- 1252US2010050938A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
- 1348US7052731B2Plasma processing apparatus, protecting layer therefor and installation of protecting layerHITACHI HIGH TECH CORP·Filed 2004·Granted May 30, 2006·1 cites·10 claims
- 1447US6837937B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Jan 4, 2005·0 cites·10 claims
- 1547US2008236494A1Plasma processing apparatusKAWAGUCHI TADAYOSHI·Filed 2007·Application pending·0 cites
- 1646US8024831B2Cleaning methodHITACHI HIGH TECH CORP·Filed 2010·Granted Sep 27, 2011·0 cites·2 claims
- 1746US2009183835A1Etching process apparatus and member for etching process chamberFURUSE MUNEO·Filed 2008·Application pending·0 cites
- 1845US2005084617A1Method for coating internal surface of plasma processing chamberFiled 2004·Application pending·0 cites
- 1945US2005051089A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 2044US2007215278A1Plasma etching apparatus and method for forming inner wall of plasma processing chamberFURUSE MUNEO·Filed 2006·Application pending·0 cites
- 2144US2005051270A1Method for monitoring plasma processing apparatusFiled 2004·Application pending·0 cites
- 2244US2005199183A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 2343US2008236744A1Plasma etching equipmentFURUSE MUNEO·Filed 2007·Application pending·0 cites
- 2442US2006157198A1Member for plasma processing apparatus and plasma processing apparatusFURUSE MUNEO·Filed 2005·Application pending·0 cites
- 2541US2007044914A1Vacuum processing apparatusMATANO KATSUJI·Filed 2005·Application pending·0 cites
- 2640US2005112289A1Method for coating internal surface of plasma processing chamberFiled 2004·Application pending·0 cites
- 2740US2003159778A1Plasma processing apparatus, protecting layer therefor and installation of protecting layerFiled 2002·Application pending·0 cites
- 2840US2005193951A1Plasma processing apparatusFiled 2004·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Muneo Furuse files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →