Method for coating internal surface of plasma processing chamber

Abstract

The present invention comprises an aluminum base material constituting the plasma processing chamber of the plasma processing apparatus, a bonding layer 3 deposited on the base material consisting of a transition metal or transition metal alloy that modifies the difference in thermal expansion efficient of the base material and the material constituting plasma contact surface, and the plasma contact surface 1 formed a material selected from a group consisting of La 2 O 3 , LaAlO 3 , MgLaAl 11 O 19 , and a mixture of La 2 O 3 and Al 2 O 3 being a metal oxide including at least La and O deposited on the bonding layer 3 via a thermal spray process.

1 . A method for coating an internal surface of a plasma processing chamber comprising forming a plasma contact surface by depositing LaAlO 3  on a base material constituting the plasma processing chamber via a thermal spray process.  
     
     
         2 . A method for coating an internal surface of a plasma processing chamber comprising coating a transition material on a base material constituting the plasma processing chamber, and forming a plasma contact surface by depositing LaAlO 3  on the transition material via a thermal spray process.