Inventor · disambiguated record
Johanes F. Swenberg
Also filed as: SWENBERG JOHANES · SWENBERG JOHANES F · SWENBERG JOHANES F N · SWENBERG JOHANES FREDERICK NIELS
25 granted patents·17 pending applications·285 citations·filing 1997–2025
95Inventor score
Top patents by PatentIndex Score
42 records- 0194US8999106B2Apparatus and method for controlling edge performance in an inductively coupled plasma chamberLIU WEI·Filed 2007·Granted Apr 7, 2015·43 cites·17 claims
- 0294US7601648B2Method for fabricating an integrated gate dielectric layer for field effect transistorsAPPLIED MATERIALS INC·Filed 2006·Granted Oct 13, 2009·89 cites·18 claims
- 0392US7910497B2Method of forming dielectric layers on a substrate and apparatus thereforAPPLIED MATERIALS INC·Filed 2007·Granted Mar 22, 2011·27 cites·22 claims
- 0489US10872763B2Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2019·Granted Dec 22, 2020·5 cites·16 claims
- 0587US6019839AMethod and apparatus for forming an epitaxial titanium silicide film by low pressure chemical vapor depositionAPPLIED MATERIALS INC·Filed 1998·Granted Feb 1, 2000·73 cites·13 claims
- 0684US8481433B2Methods and apparatus for forming nitrogen-containing layersBEVAN MALCOLM J·Filed 2010·Granted Jul 9, 2013·6 cites·21 claims
- 0775US8546273B2Methods and apparatus for forming nitrogen-containing layersBEVAN MALCOLM J·Filed 2011·Granted Oct 1, 2013·3 cites·19 claims
- 0875US2024379349A1Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0974US11077410B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2018·Granted Aug 3, 2021·1 cites·19 claims
- 1074US8062472B2Method of correcting baseline skew by a novel motorized source coil assemblyLIU WEI·Filed 2007·Granted Nov 22, 2011·3 cites·19 claims
- 1173US9048190B2Methods and apparatus for processing substrates using an ion shieldAPPLIED MATERIALS INC·Filed 2013·Granted Jun 2, 2015·2 cites·14 claims
- 1273US7813895B2Methods for plasma matching between different chambers and plasma stability monitoring and controlAPPLIED MATERIALS INC·Filed 2007·Granted Oct 12, 2010·7 cites·22 claims
- 1368US11923441B2Gate all around I/O engineeringAPPLIED MATERIALS INC·Filed 2022·Granted Mar 5, 2024·0 cites·15 claims
- 1468US11529592B2Gas injector with baffleAPPLIED MATERIALS INC·Filed 2021·Granted Dec 20, 2022·0 cites·20 claims
- 1568US8871645B2Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereofGANGULY UDAYAN·Filed 2009·Granted Oct 28, 2014·3 cites·12 claims
- 1666US11450759B2Gate all around I/O engineeringAPPLIED MATERIALS INC·Filed 2020·Granted Sep 20, 2022·0 cites·19 claims
- 1763US8435906B2Methods for forming conformal oxide layers on semiconductor devicesTJANDRA AGUS S·Filed 2010·Granted May 7, 2013·2 cites·15 claims
- 1863US2025239452A1Direct nitration for backside power deliver network isolation moduleAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1962US11456178B2Gate interface engineering with doped layerAPPLIED MATERIALS INC·Filed 2021·Granted Sep 27, 2022·0 cites·20 claims
- 2062US9012336B2Method for conformal treatment of dielectric films using inductively coupled plasmaAPPLIED MATERIALS INC·Filed 2013·Granted Apr 21, 2015·1 cites·18 claims
- 2162US6022587AMethod and apparatus for improving film deposition uniformity on a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Feb 8, 2000·20 cites·20 claims
- 2260US2024339318A1Segmented formation of gate interfaceAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2360US2024234133A1Treatments to enhance material structuresAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2459US2025372369A1Methods of fabricating high-k gate structuresAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2559US2025379047A1Thin and high-quality oxide layersAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2656US11271097B2Cap oxidation for FinFET formationAPPLIED MATERIALS INC·Filed 2020·Granted Mar 8, 2022·0 cites·20 claims
- 2755US11189479B2Diffusion barrier layerAPPLIED MATERIALS INC·Filed 2020·Granted Nov 30, 2021·0 cites·13 claims
- 2855US9530898B2Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereofAPPLIED MATERIALS INC·Filed 2014·Granted Dec 27, 2016·0 cites·8 claims
- 2954US8993458B2Methods and apparatus for selective oxidation of a substrateAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·0 cites·13 claims
- 3051US11322347B2Conformal oxidation processes for 3D NANDAPPLIED MATERIALS INC·Filed 2019·Granted May 3, 2022·0 cites·12 claims
- 3150US12249511B2Treatments to improve device performanceAPPLIED MATERIALS INC·Filed 2021·Granted Mar 11, 2025·0 cites·7 claims
- 3249US2009162570A1Apparatus and method for processing a substrate using inductively coupled plasma technologyAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 3346US2015332941A1Methods and apparatus for processing substrates using an ion shieldAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3444US2020144397A1Methods and apparatus for silicon-germanium pre-cleanAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3544US2020075332A1Methods Of Forming Silicon-Containing LayersAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3642US2008216077A1Software sequencer for integrated substrate processing systemAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 3742US2014273530A1Post-Deposition Treatment Methods For Silicon NitrideNGUYEN VICTOR·Filed 2014·Application pending·0 cites
- 3839US2020210661A1Systems and methods for object trackingSWENBERG JOHANES FREDERICK NIELS·Filed 2020·Application pending·0 cites
- 3935US2011061810A1Apparatus and Methods for Cyclical Oxidation and EtchingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4035US2011061812A1Apparatus and Methods for Cyclical Oxidation and EtchingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4135US2011065276A1Apparatus and Methods for Cyclical Oxidation and EtchingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4230US2002020358A1Method and apparatus for improving film deposition uniformity on a substrateFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →