Inventor · disambiguated record
Thomas I. Wallow
Also filed as: WALLOW THOMAS · WALLOW THOMAS I · WALLOW THOMAS INGOLF
37 granted patents·1 pending application·760 citations·filing 1997–2021
97Inventor score
Files withASML NETHERLANDS BV6GLOBALFOUNDRIES INC5IBM5SUMITOMO BAKELITE CO4ADVANCED MICRO DEVICES INC3
Top patents by PatentIndex Score
38 records- 0196US5843624AEnergy-sensitive resist material and a process for device fabrication using an energy-sensitive resist materialLUCENT TECHNOLOGIES INC·Filed 1997·Granted Dec 1, 1998·310 cites·18 claims
- 0295US6420503B1Norbornene sulfonamide polymersSUMITOMO BAKELITE CO·Filed 2000·Granted Jul 16, 2002·74 cites·20 claims
- 0392US7723704B2EUV pellicle with increased EUV light transmittanceGLOBALFOUNDRIES INC·Filed 2006·Granted May 25, 2010·15 cites·15 claims
- 0491US7390377B1Bonding thermoplastic polymersSANDIA CORP·Filed 2005·Granted Jun 24, 2008·16 cites·10 claims
- 0589US8889343B2Optimizing lithographic processes using laser annealing techniquesGLOBALFOUNDRIES INC·Filed 2012·Granted Nov 18, 2014·6 cites·22 claims
- 0688US7663127B2EUV debris mitigation filter and method for fabricating semiconductor dies using sameGLOBALFOUNDRIES INC·Filed 2007·Granted Feb 16, 2010·9 cites·20 claims
- 0786US6165678ALithographic photoresist composition and process for its use in the manufacture of integrated circuitsIBM·Filed 1998·Granted Dec 26, 2000·59 cites·18 claims
- 0885US10417359B2Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurementASML NETHERLANDS BV·Filed 2016·Granted Sep 17, 2019·6 cites·26 claims
- 0985US7718529B2Inverse self-aligned spacer lithographyGLOBALFOUNDRIES INC·Filed 2007·Granted May 18, 2010·10 cites·20 claims
- 1082US6723486B2Photoresist compositions comprising polycyclic polymers with acid labile pendant groupsSUMITOMO BAKELITE CO·Filed 2001·Granted Apr 20, 2004·42 cites·19 claims
- 1182US6677419B1Preparation of copolymersIBM·Filed 2002·Granted Jan 13, 2004·18 cites·21 claims
- 1282US6251560B1Photoresist compositions with cyclic olefin polymers having lactone moietyIBM·Filed 2000·Granted Jun 26, 2001·20 cites·31 claims
- 1378US10754256B2Method and apparatus for pattern correction and verificationASML NETHERLANDS BV·Filed 2016·Granted Aug 25, 2020·2 cites·21 claims
- 1476US6451499B1Polycyclic resist compositions with increased etch resistanceGOODRICH CO B F·Filed 2000·Granted Sep 17, 2002·12 cites·16 claims
- 1576US5998099AEnergy-sensitive resist material and a process for device fabrication using an energy-sensitive resist materialLUCENT TECHNOLOGIES INC·Filed 1998·Granted Dec 7, 1999·38 cites·24 claims
- 1675US7851136B2Stabilization of deep ultraviolet photoresistGLOBALFOUNDRIES INC·Filed 2006·Granted Dec 14, 2010·4 cites·17 claims
- 1774US11658004B2Method for scanning a sample by a charged particle beam systemASML NETHERLANDS BV·Filed 2021·Granted May 23, 2023·0 cites·18 claims
- 1873US6525153B1Polycyclic polymers containing pendant cyclic anhydride groupsSUMITOMO BAKELITE CO·Filed 2000·Granted Feb 25, 2003·10 cites·8 claims
- 1972US8153351B2Methods for performing photolithography using BARCs having graded optical propertiesWALLOW THOMAS I·Filed 2008·Granted Apr 10, 2012·4 cites·21 claims
- 2070US10663870B2Gauge pattern selectionASML NETHERLANDS BV·Filed 2016·Granted May 26, 2020·1 cites·21 claims
- 2170US10627722B2Etch-assist featuresASML NETHERLANDS BV·Filed 2016·Granted Apr 21, 2020·1 cites·21 claims
- 2270US8586269B2Method for forming a high resolution resist pattern on a semiconductor waferOKOROANYANWU UZODINMA·Filed 2007·Granted Nov 19, 2013·3 cites·20 claims
- 2369US6177228B1Photoresist composition and process for its useIBM·Filed 1997·Granted Jan 23, 2001·35 cites·47 claims
- 2469US5879857AEnergy-sensitive resist material and a process for device fabrication using an energy-sensitive resist materialLUCENT TECHNOLOGIES INC·Filed 1997·Granted Mar 9, 1999·28 cites·26 claims
- 2566US11127563B2Method for scanning a sample by a charged particle beam systemASML NETHERLANDS BV·Filed 2019·Granted Sep 21, 2021·0 cites·15 claims
- 2665US8236592B2Method of forming semiconductor deviceKIM RYOUNG-HAN·Filed 2007·Granted Aug 7, 2012·2 cites·20 claims
- 2765US6147177APolycyclic resist compositions with increased etch resistanceGOODRICH CO B F·Filed 1999·Granted Nov 14, 2000·22 cites·13 claims
- 2861US8642474B2Spacer lithographyKIM RYOUNG-HAN·Filed 2007·Granted Feb 4, 2014·1 cites·19 claims
- 2952US7858276B2Method for determining suitability of a resist in semiconductor wafer fabricationADVANCED MICRO DEVICES INC·Filed 2007·Granted Dec 28, 2010·0 cites·19 claims
- 3052US6794459B2Modified polycyclic polymersSUMITOMO BAKELITE CO·Filed 2002·Granted Sep 21, 2004·2 cites·11 claims
- 3147US7504198B2Methods for enhancing resolution of a chemically amplified photoresistADVANCED MICRO DEVICES INC·Filed 2006·Granted Mar 17, 2009·0 cites·25 claims
- 3246US6451945B1Modified polycyclic polymersGOODRICH CO B F·Filed 1999·Granted Sep 17, 2002·7 cites·5 claims
- 3345US2008292991A1High fidelity multiple resist patterningADVANCED MICRO DEVICES INC·Filed 2007·Application pending·0 cites
- 3444US8715912B2Method for producing a high resolution resist pattern on a semiconductor waferOKOROANYANWU UZODINMA·Filed 2007·Granted May 6, 2014·0 cites·20 claims
- 3544US8067252B2Method for determining low-noise power spectral density for characterizing line edge roughness in semiconductor wafer processingMA YUANSHENG·Filed 2007·Granted Nov 29, 2011·0 cites·13 claims
- 3642US8852854B2Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysisWALLOW THOMAS·Filed 2007·Granted Oct 7, 2014·0 cites·11 claims
- 3741US8815748B2Method of forming semiconductor device with multiple level patterningWALLOW THOMAS INGOLF·Filed 2007·Granted Aug 26, 2014·0 cites·19 claims
- 3833US6165673AResist composition with radiation sensitive acid generatorIBM·Filed 1997·Granted Dec 26, 2000·3 cites·48 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →