Inventor · disambiguated record
Donny Young
Also filed as: YOUNG DONNY
18 granted patents·4 pending applications·63 citations·filing 2002–2020
92Inventor score
Top patents by PatentIndex Score
22 records- 0186US10763090B2High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2016·Granted Sep 1, 2020·3 cites·19 claims
- 0285US8790499B2Process kit components for titanium sputtering chamberYOUNG DONNY·Filed 2006·Granted Jul 29, 2014·9 cites·16 claims
- 0384US9343274B2Process kit shield for plasma enhanced processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted May 17, 2016·2 cites·9 claims
- 0481US8668815B2Process kit for RF physical vapor depositionYOUNG DONNY·Filed 2012·Granted Mar 11, 2014·4 cites·10 claims
- 0575US9534286B2PVD target for self-centering process shieldAPPLIED MATERIALS INC·Filed 2013·Granted Jan 3, 2017·4 cites·18 claims
- 0675US9340866B2Substrate support with radio frequency (RF) return pathRITCHIE ALAN·Filed 2012·Granted May 17, 2016·3 cites·20 claims
- 0775US9123511B2Process kit for RF physical vapor depositionYOUNG DONNY·Filed 2009·Granted Sep 1, 2015·3 cites·11 claims
- 0875US8647485B2Process kit shield for plasma enhanced processing chamberRASHEED MUHAMMAD·Filed 2012·Granted Feb 11, 2014·4 cites·7 claims
- 0972US7561015B2Magnet secured in a two part shellAPPLIED MATERIALS INC·Filed 2003·Granted Jul 14, 2009·10 cites·25 claims
- 1071US7674360B2Mechanism for varying the spacing between sputter magnetron and targetAPPLIED MATERIALS INC·Filed 2004·Granted Mar 9, 2010·12 cites·22 claims
- 1168US2020357616A1High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1265US8647484B2Target for sputtering chamberRITCHIE ALAN ALEXANDER·Filed 2006·Granted Feb 11, 2014·2 cites·24 claims
- 1364US8795488B2Apparatus for physical vapor deposition having centrally fed RF energyRASHEED MUHAMMAD·Filed 2011·Granted Aug 5, 2014·1 cites·20 claims
- 1464US8702918B2Apparatus for enabling concentricity of plasma dark spaceRITCHIE ALAN·Filed 2011·Granted Apr 22, 2014·1 cites·20 claims
- 1563US9303311B2Substrate processing system with mechanically floating target assemblyYOUNG DONNY·Filed 2012·Granted Apr 5, 2016·1 cites·20 claims
- 1657US9404174B2Pinned target design for RF capacitive coupled plasmaAPPLIED MATERIALS INC·Filed 2013·Granted Aug 2, 2016·0 cites·11 claims
- 1754US6875927B2High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applicationsAPPLIED MATERIALS INC·Filed 2002·Granted Apr 5, 2005·4 cites·28 claims
- 1852US9255322B2Substrate processing system having symmetric RF distribution and return pathsYOUNG DONNY·Filed 2012·Granted Feb 9, 2016·0 cites·20 claims
- 1951US2010252417A1High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this processAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 2046US2017145553A1Pre-coated shield using in vhf-rf pvd chambersAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 2145US9695502B2Process kit with plasma-limiting gapRITCHIE ALAN·Filed 2012·Granted Jul 4, 2017·0 cites·14 claims
- 2238US2011209995A1Physical Vapor Deposition With A Variable Capacitive Tuner and Feedback CircuitAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →