Inventor · disambiguated record
Frank Chilese
Also filed as: CHILESE FRANK
16 granted patents·4 pending applications·97 citations·filing 2003–2021
91Inventor score
Top patents by PatentIndex Score
20 records- 0196US8414688B1Recirculation high purity system for protecting optical modules or inspection system during storage, transport and shippingDELGADO GILDARDO·Filed 2011·Granted Apr 9, 2013·41 cites·20 claims
- 0292US9544984B2System and method for generation of extreme ultraviolet lightKLA TENCOR CORP·Filed 2014·Granted Jan 10, 2017·10 cites·25 claims
- 0391US9448343B2Segmented mirror apparatus for imaging and method of using the sameKLA TENCOR CORP·Filed 2013·Granted Sep 20, 2016·8 cites·23 claims
- 0490US10021773B2Laser produced plasma light source having a target material coated on a cylindrically-symmetric elementKLA TENCOR CORP·Filed 2016·Granted Jul 10, 2018·4 cites·10 claims
- 0588US9810991B2System and method for cleaning EUV optical elementsKLA TENCOR CORP·Filed 2014·Granted Nov 7, 2017·5 cites·21 claims
- 0678US9244368B2Particle control near reticle and optics using showerheadDELGADO GILDARDO R·Filed 2013·Granted Jan 26, 2016·3 cites·16 claims
- 0778US9164388B2Temperature control in EUV reticle inspection toolCHILESE FRANK·Filed 2013·Granted Oct 20, 2015·4 cites·20 claims
- 0873US9348214B2Spectral purity filter and light monitor for an EUV reticle inspection systemKLA TENCOR CORP·Filed 2014·Granted May 24, 2016·2 cites·13 claims
- 0973US7050170B2Apparatus and method for maintaining uniform and stable temperature for cavity enhanced optical spectroscopyPICARRO INC·Filed 2003·Granted May 23, 2006·16 cites·12 claims
- 1070US10438769B1Array-based characterization toolKLA TENCOR CORP·Filed 2018·Granted Oct 8, 2019·2 cites·47 claims
- 1167US11419202B2Laser produced plasma light source having a target material coated on a cylindrically-symmetric elementKLA CORP·Filed 2021·Granted Aug 16, 2022·0 cites·18 claims
- 1259US10893599B2Laser produced plasma light source having a target material coated on a cylindrically-symmetric elementKLA TENCOR CORP·Filed 2018·Granted Jan 12, 2021·0 cites·9 claims
- 1358US8917432B2Multiplexing EUV sources in reticle inspectionWACK DANIEL·Filed 2012·Granted Dec 23, 2014·2 cites·19 claims
- 1453US2013271827A1Indexing optics for an actinic extreme ultra-violet (euv) reticle inspection toolKLA TENCOR CORP·Filed 2013·Application pending·0 cites
- 1550US2013270461A1Smart memory alloys for an extreme ultra-violet (euv) reticle inspection toolKLA TENCOR CORP·Filed 2013·Application pending·0 cites
- 1648US11566887B1Differential height measurement using interstitial mirror plateKLA CORP·Filed 2021·Granted Jan 31, 2023·0 cites·20 claims
- 1746US9759912B2Particle and chemical control using tunnel flowKLA TENCOR CORP·Filed 2013·Granted Sep 12, 2017·0 cites·13 claims
- 1844US10777377B2Multi-column spacing for photomask and reticle inspection and wafer print check verificationKLA TENCOR CORP·Filed 2018·Granted Sep 15, 2020·0 cites·21 claims
- 1944US2014151580A1Methods of using polished silicon wafer strips for euv homogenizerKLA TENCOR CORP·Filed 2013·Application pending·0 cites
- 2043US2013235357A1System and Method for Particle Control Near A ReticleKLA TENCOR CORP·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →