Inventor · disambiguated record
Sou Kamimura
Also filed as: KAMIMURA SOU
26 granted patents·10 pending applications·71 citations·filing 2007–2023
94Inventor score
Top patents by PatentIndex Score
36 records- 0197US9897922B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2016·Granted Feb 20, 2018·10 cites·12 claims
- 0291US7718344B2Resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted May 18, 2010·14 cites·13 claims
- 0385US9482958B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2015·Granted Nov 1, 2016·2 cites·12 claims
- 0484US8999621B2Pattern forming method, chemical amplification resist composition and resist filmENOMOTO YUICHIRO·Filed 2010·Granted Apr 7, 2015·4 cites·58 claims
- 0579US9128376B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Sep 8, 2015·4 cites·30 claims
- 0678US9097973B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Aug 4, 2015·2 cites·8 claims
- 0776US8507174B2Positive resist composition, pattern forming method using the composition, and compound for use in the compositionTAKAHASHI HIDENORI·Filed 2008·Granted Aug 13, 2013·4 cites·18 claims
- 0875US8709704B2Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming methodKAMIMURA SOU·Filed 2009·Granted Apr 29, 2014·4 cites·20 claims
- 0973US12346026B2Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic deviceFUJIFILM CORP·Filed 2022·Granted Jul 1, 2025·0 cites·15 claims
- 1072US10248019B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmFUJIFILM CORP·Filed 2012·Granted Apr 2, 2019·1 cites·9 claims
- 1172US9760003B2Pattern forming method and actinic-ray- or radiation-sensitive resin compositionIWATO KAORU·Filed 2011·Granted Sep 12, 2017·2 cites·36 claims
- 1272US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 1369US8110333B2Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compoundKAMIMURA SOU·Filed 2008·Granted Feb 7, 2012·10 cites·9 claims
- 1468US7695892B2Resist composition and pattern-forming method using sameFUJIFILM CORP·Filed 2008·Granted Apr 13, 2010·2 cites·18 claims
- 1567US7615330B2Positive resist composition and pattern formation method using the sameFUJIFILM CORP·Filed 2007·Granted Nov 10, 2009·9 cites·11 claims
- 1664US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 1764US2024053679A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1857US2014127629A1Method of forming patternFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 1955US2017102618A1Method of forming patternFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 2053US8663907B2Method of forming patternKATO KEITA·Filed 2011·Granted Mar 4, 2014·0 cites·18 claims
- 2149US8753802B2Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2012·Granted Jun 17, 2014·0 cites·16 claims
- 2248US8871642B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Oct 28, 2014·0 cites·29 claims
- 2348US2010028803A1Surface treating agent for resist pattern formation, resist composition, method of treating surface of resist pattern therewith and method of forming resist patternFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 2447US8859192B2Negative pattern forming method and resist patternFUJIFILM CORP·Filed 2013·Granted Oct 14, 2014·0 cites·9 claims
- 2544US9223219B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmENOMOTO YUICHIRO·Filed 2011·Granted Dec 29, 2015·0 cites·36 claims
- 2644US8092976B2Resist composition and pattern forming method using the sameKAMIMURA SOU·Filed 2007·Granted Jan 10, 2012·0 cites·8 claims
- 2743US8808965B2Pattern forming method, pattern, chemical amplification resist composition and resist filmIWATO KAORU·Filed 2011·Granted Aug 19, 2014·0 cites·27 claims
- 2839US9116437B2Pattern forming method, chemical amplification resist composition and resist filmENOMOTO YUICHIRO·Filed 2010·Granted Aug 25, 2015·0 cites·17 claims
- 2938US10126653B2Pattern forming method and resist compositionIWATO KAORU·Filed 2011·Granted Nov 13, 2018·0 cites·20 claims
- 3038US9513547B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Dec 6, 2016·0 cites·22 claims
- 3138US2013101812A1Method of forming patternKAMIMURA SOU·Filed 2011·Application pending·0 cites
- 3237US2012028196A1Method of forming pattern and organic processing liquid for use in the methodKAMIMURA SOU·Filed 2011·Application pending·0 cites
- 3337US2012322007A1Pattern forming method, chemical amplification resist composition and resist filmKATO KEITA·Filed 2011·Application pending·0 cites
- 3436US2016223905A1Active lightray-sensitive or radiation-sensitive resin composition and pattern forming methodFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 3535US2016004156A1Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development used therefor and method of manufacturing the same, method of manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 3635US2011311914A1Resist composition for negative-tone development and pattern forming method using the sameKAMIMURA SOU·Filed 2010·Application pending·0 cites
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