Inventor · disambiguated record
Dieter Kraus
Also filed as: KRAUS DIETER
11 granted patents·4 pending applications·85 citations·filing 2008–2021
89Inventor score
Top patents by PatentIndex Score
15 records- 0190US8382301B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2009·Granted Feb 26, 2013·18 cites·34 claims
- 0287US8585224B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2013·Granted Nov 19, 2013·11 cites·34 claims
- 0386US9272408B2Hand-held machine toolKOCH OLAF·Filed 2011·Granted Mar 1, 2016·18 cites·19 claims
- 0486US8953145B2Detection of contaminating substances in an EUV lithography apparatusKRAUS DIETER·Filed 2011·Granted Feb 10, 2015·7 cites·29 claims
- 0581US7868263B2Percussion hand-held power tool with contactless manual switch located in side handleHILTI AG·Filed 2008·Granted Jan 11, 2011·17 cites·4 claims
- 0678US8054446B2EUV lithography apparatus and method for determining the contamination status of an EUV-reflective optical surfaceZEISS CARL SMT GMBH·Filed 2008·Granted Nov 8, 2011·5 cites·15 claims
- 0775US9046794B2Cleaning module, EUV lithography device and method for the cleaning thereofHEMBACHER STEFAN·Filed 2010·Granted Jun 2, 2015·3 cites·40 claims
- 0874US7911598B2Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography deviceZEISS CARL SMT AG·Filed 2009·Granted Mar 22, 2011·3 cites·30 claims
- 0972US8885141B2EUV lithography device and method for processing an optical elementSINGER WOLFGANG·Filed 2011·Granted Nov 11, 2014·2 cites·20 claims
- 1059US8717531B2Mirror for guiding a radiation bundleWALDIS SEVERIN·Filed 2010·Granted May 6, 2014·1 cites·20 claims
- 1155US2010071720A1Method and system for removing contaminants from a surfaceZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1248US2010112494A1Apparatus and method for measuring the outgassing and euv lithography apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 1346US11784527B2Linear motor stator arrangement with external convective forced coolingINTRASYS GMBH INNOVATIVE TRANSP·Filed 2021·Granted Oct 10, 2023·0 cites·20 claims
- 1445US2011058147A1Cleaning module and euv lithography device with cleaning moduleZEISS CARL SMT AG·Filed 2010·Application pending·0 cites
- 1534US2012086925A1Method for avoiding contamination and euv-lithography-systemKRAUS DIETER·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →