Inventor · disambiguated record
Hisato Nakamura
Also filed as: NAKAMURA HISATO
15 granted patents·631 citations·filing 1996–2017
95Inventor score
Top patents by PatentIndex Score
15 records- 0197US7098055B2Apparatus and method for testing defectsHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 29, 2006·36 cites·7 claims
- 0296US7940383B2Method of detecting defects on an objectHITACHI LTD·Filed 2009·Granted May 10, 2011·42 cites·20 claims
- 0396US7639350B2Apparatus and method for testing defectsHITACHI LTD·Filed 2007·Granted Dec 29, 2009·25 cites·20 claims
- 0496US6411377B1Optical apparatus for defect and particle size inspectionHITACHI LTD·Filed 1999·Granted Jun 25, 2002·174 cites·29 claims
- 0593US7443496B2Apparatus and method for testing defectsHITACHI LTD·Filed 2007·Granted Oct 28, 2008·16 cites·15 claims
- 0692US7037735B2Apparatus and method for testing defectsHITACHI HIGH TECH CORP·Filed 2002·Granted May 2, 2006·43 cites·18 claims
- 0791US7692779B2Apparatus and method for testing defectsHITACHI LTD·Filed 2005·Granted Apr 6, 2010·12 cites·20 claims
- 0888US6597448B1Apparatus and method of inspecting foreign particle or defect on a sampleHITACHI LTD·Filed 2000·Granted Jul 22, 2003·44 cites·20 claims
- 0987US5694214ASurface inspection method and apparatusHITACHI ELECTR ENG·Filed 1996·Granted Dec 2, 1997·86 cites·9 claims
- 1084US6365425B1Method of manufacturing semiconductor deviceHITACHI LTD·Filed 2000·Granted Apr 2, 2002·26 cites·9 claims
- 1179US5644393AExtraneous substance inspection method and apparatusHITACHI ELECTR ENG·Filed 1996·Granted Jul 1, 1997·51 cites·10 claims
- 1271US5880828ASurface defect inspection device and shading correction method thereforHITACHI ELECTR ENG·Filed 1997·Granted Mar 9, 1999·36 cites·10 claims
- 1370US5818576AExtraneous substance inspection apparatus for patterned waferHITACHI ELECTR ENG·Filed 1996·Granted Oct 6, 1998·36 cites·9 claims
- 1447US10365227B2Detection device and detection methodSHINETSU HANDOTAI KK·Filed 2017·Granted Jul 30, 2019·0 cites·13 claims
- 1534US5724132AExtraneous substance inspection apparatus for patterned waferHITACHI ELECTR ENG·Filed 1996·Granted Mar 3, 1998·4 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →