Inventor · disambiguated record
Masami Ikota
Also filed as: IKOTA MASAMI
13 granted patents·1 pending application·189 citations·filing 1997–2022
89Inventor score
Top patents by PatentIndex Score
14 records- 0187US6542830B1Process control systemHITACHI LTD·Filed 1997·Granted Apr 1, 2003·93 cites·25 claims
- 0284US6365425B1Method of manufacturing semiconductor deviceHITACHI LTD·Filed 2000·Granted Apr 2, 2002·26 cites·9 claims
- 0383US6757621B2Process management systemHITACHI LTD·Filed 2003·Granted Jun 29, 2004·35 cites·10 claims
- 0471US12148593B2Ion beam deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 19, 2024·1 cites·14 claims
- 0571US10943762B2Inspection system, image processing device and inspection methodHITACHI HIGH TECH CORP·Filed 2019·Granted Mar 9, 2021·1 cites·15 claims
- 0667US6661912B1Inspecting method and apparatus for repeated micro-miniature patternsHITACHI ELECTR ENG·Filed 1998·Granted Dec 9, 2003·29 cites·12 claims
- 0765US8358406B2Defect inspection method and defect inspection systemHITACHI HIGH TECH CORP·Filed 2009·Granted Jan 22, 2013·2 cites·10 claims
- 0863US10672119B2Inspection deviceHITACHI HIGH TECH CORP·Filed 2015·Granted Jun 2, 2020·1 cites·10 claims
- 0963US9823065B2Surface measurement apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 21, 2017·1 cites·25 claims
- 1053US2023230886A1Processor system, semiconductor inspection system, and programHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1149US9831062B2Method for pattern measurement, method for setting device parameters of charged particle radiation device, and charged particle radiation deviceHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 28, 2017·0 cites·10 claims
- 1247US11713963B2Pattern shape evaluation device, pattern shape evaluation system, and pattern shape evaluation methodHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 1, 2023·0 cites·16 claims
- 1346US11430106B2Image processing device, image processing method and charged particle microscopeHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 30, 2022·0 cites·4 claims
- 1441US10295339B2Pattern measurement method and measurement apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted May 21, 2019·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →