Inventor · disambiguated record
Tuqiang Ni
Also filed as: NI TUQIANG · NI TUQIANG O
63 granted patents·15 pending applications·1,468 citations·filing 1998–2022
99Inventor score
Files withLAM RES CORP30ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA22ADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI10ADVANCED MICRO FAB EQUIP INC5NI TUQIANG4
Top patents by PatentIndex Score
78 records- 0198US9190302B2System and method for controlling plasma with an adjustable coupling to ground circuitLAM RES CORP·Filed 2013·Granted Nov 17, 2015·154 cites·11 claims
- 0298US6527911B1Configurable plasma volume etch chamberLAM RES CORP·Filed 2001·Granted Mar 4, 2003·218 cites·31 claims
- 0397US6461974B1High temperature tungsten etching processLAM RES CORP·Filed 2000·Granted Oct 8, 2002·226 cites·32 claims
- 0496US9633884B2Performance enhancement of coating packaged ESC for semiconductor apparatusADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Apr 25, 2017·32 cites·17 claims
- 0596US8025731B2Gas injection system for plasma processingLAM RES CORP·Filed 2010·Granted Sep 27, 2011·24 cites·13 claims
- 0696US6230651B1Gas injection system for plasma processingLAM RES CORP·Filed 1998·Granted May 15, 2001·111 cites·30 claims
- 0795US7503996B2Multiple frequency plasma chamber, switchable RF system, and processes using sameADVANCED MICRO FAB EQUIP INC·Filed 2007·Granted Mar 17, 2009·33 cites·21 claims
- 0893US11545342B2Plasma processor and processing methodADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2020·Granted Jan 3, 2023·4 cites·18 claims
- 0992US7785417B2Gas injection system for plasma processingLAM RES CORP·Filed 2001·Granted Aug 31, 2010·35 cites·18 claims
- 1092US6746961B2Plasma etching of dielectric layer with etch profile controlLAM RES CORP·Filed 2001·Granted Jun 8, 2004·61 cites·20 claims
- 1190US8336488B2Multi-station plasma reactor with multiple plasma regionsCHEN AIHUA·Filed 2007·Granted Dec 25, 2012·11 cites·28 claims
- 1289US6692649B2Inductively coupled plasma downstream strip moduleLAM RES CORP·Filed 2001·Granted Feb 17, 2004·42 cites·15 claims
- 1388US6257168B1Elevated stationary uniformity ring designLAM RES CORP·Filed 1999·Granted Jul 10, 2001·57 cites·28 claims
- 1487US7009281B2Small volume process chamber with hot inner surfacesLAM CORP·Filed 2003·Granted Mar 7, 2006·39 cites·7 claims
- 1587US6716303B1Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating sameLAM RES CORP·Filed 2000·Granted Apr 6, 2004·20 cites·21 claims
- 1687US6388383B1Method of an apparatus for obtaining neutral dissociated gas atomsLAM RES CORP·Filed 2000·Granted May 14, 2002·28 cites·31 claims
- 1786US8366829B2Multi-station decoupled reactive ion etch chamberADVANCED MICRO FAB EQUIP INC·Filed 2007·Granted Feb 5, 2013·10 cites·17 claims
- 1885US7992518B2Silicon carbide gas distribution plate and RF electrode for plasma etch chamberADVANCED MICRO FAB EQUIP INC·Filed 2007·Granted Aug 9, 2011·10 cites·11 claims
- 1985US6514378B1Method for improving uniformity and reducing etch rate variation of etching polysiliconLAM RES CORP·Filed 2000·Granted Feb 4, 2003·36 cites·20 claims
- 2084US8111499B2System and method of sensing and removing residual charge from a processed waferNI TUQIANG·Filed 2009·Granted Feb 7, 2012·13 cites·23 claims
- 2184US6526355B1Integrated full wavelength spectrometer for wafer processingLAM RES CORP·Filed 2000·Granted Feb 25, 2003·23 cites·6 claims
- 2283US9275870B2Plasma processing method and plasma processing deviceADVANCED MICRO FAB EQUIP INC·Filed 2013·Granted Mar 1, 2016·7 cites·20 claims
- 2383US6617257B2Method of plasma etching organic antireflective coatingLAM RES CORP·Filed 2001·Granted Sep 9, 2003·35 cites·20 claims
- 2481US6709547B1Moveable barrier for multiple etch processesLAM RES CORP·Filed 1999·Granted Mar 23, 2004·50 cites·4 claims
- 2581US6531029B1Vacuum plasma processor apparatus and methodLAM RES CORP·Filed 2000·Granted Mar 11, 2003·15 cites·33 claims
- 2680US8114246B2Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating sameNI TUQIANG·Filed 2006·Granted Feb 14, 2012·4 cites·20 claims
- 2779US6062729ARapid IR transmission thermometry for wafer temperature sensingLAM RES CORP·Filed 1998·Granted May 16, 2000·55 cites·21 claims
- 2878US8297225B2Capacitive CVD reactor and methods for plasma CVD processYIN GERALD·Filed 2009·Granted Oct 30, 2012·6 cites·14 claims
- 2976US12062524B2Plasma reactor having a variable coupling of low frequency RF power to an annular electrodeADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2018·Granted Aug 13, 2024·2 cites·10 claims
- 3074US6622286B1Integrated electronic hardware for wafer processing control and diagnosticLAM RES CORP·Filed 2000·Granted Sep 16, 2003·20 cites·10 claims
- 3173US10529577B2Device of changing gas flow pattern and a wafer processing method and apparatusADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2015·Granted Jan 7, 2020·2 cites·11 claims
- 3273US6503766B1Method and system for detecting an exposure of a material on a semiconductor wafer during chemical-mechanical polishingLAM RES CORP·Filed 2000·Granted Jan 7, 2003·15 cites·26 claims
- 3371US8480913B2Plasma processing method and apparatus with control of plasma excitation powerNI TUQIANG·Filed 2011·Granted Jul 9, 2013·2 cites·50 claims
- 3470US6052176AProcessing chamber with optical window cleaned using process gasLAM RES CORP·Filed 1999·Granted Apr 18, 2000·32 cites·32 claims
- 3569US12094695B2Multi-zone temperature control plasma reactorADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2019·Granted Sep 17, 2024·2 cites·8 claims
- 3669US6855567B1Etch endpoint detectionLAM RES CORP·Filed 2000·Granted Feb 15, 2005·13 cites·15 claims
- 3769US2019338408A1Coating for performance enhancement of semiconductor apparatusADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2019·Application pending·0 cites
- 3866US11626314B2Lift pin assembly, an electrostatic chuck and a processing apparatus where the electrostatic chuck is locatedADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2019·Granted Apr 11, 2023·1 cites·10 claims
- 3965US10685814B2Processing chamber, combination of processing chamber and loadlock, and system for processing substratesADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2015·Granted Jun 16, 2020·1 cites·21 claims
- 4063US2014116338A1Coating for performance enhancement of semiconductor apparatusADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Application pending·0 cites
- 4162US8518211B2System and method for controlling plasma with an adjustable coupling to ground circuitNI TUQIANG·Filed 2005·Granted Aug 27, 2013·1 cites·16 claims
- 4261US12309891B2Control method for multi-zone active-matrix temperature control in plasma processing apparatusADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2021·Granted May 20, 2025·0 cites·16 claims
- 4355US12261012B2Plasma treatment apparatus, lower electrode assembly and forming method thereofADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2022·Granted Mar 25, 2025·0 cites·8 claims
- 4455US11676803B2Liner assembly for vacuum treatment apparatus, and vacuum treatment apparatusADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2020·Granted Jun 13, 2023·0 cites·24 claims
- 4555US10187965B2Plasma confinement apparatus, and method for confining a plasmaADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2013·Granted Jan 22, 2019·0 cites·18 claims
- 4655US9431216B2ICP source design for plasma uniformity and efficiency enhancementADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Aug 30, 2016·0 cites·8 claims
- 4755US7077971B2Methods for detecting the endpoint of a photoresist stripping processLAM RES CORP·Filed 2002·Granted Jul 18, 2006·2 cites·25 claims
- 4854US2025037971A1Plasma processing deviceADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2022·Application pending·0 cites
- 4953US11371141B2Plasma process apparatus with low particle contamination and method of operating the sameADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2018·Granted Jun 28, 2022·0 cites·11 claims
- 5051US11363680B2Plasma reactor and heating apparatus thereforADVANCED MICRO FABRICATION EQUIPMENT INC CHINA·Filed 2019·Granted Jun 14, 2022·0 cites·10 claims
Showing the top 50 of 78 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →