Inventor · disambiguated record
Anthony C. Speranza
Also filed as: SPERANZA ANTHONY C
14 granted patents·198 citations·filing 1995–2017
91Inventor score
Top patents by PatentIndex Score
14 records- 0184US9583401B2Nano deposition and ablation for the repair and fabrication of integrated circuitsIBM·Filed 2014·Granted Feb 28, 2017·2 cites·10 claims
- 0283US5770490AMethod for producing dual work function CMOS deviceIBM·Filed 1996·Granted Jun 23, 1998·65 cites·13 claims
- 0377US6028339ADual work function CMOS deviceIBM·Filed 1998·Granted Feb 22, 2000·42 cites·16 claims
- 0473US6417070B1Method for forming a liner in a trenchIBM·Filed 2000·Granted Jul 9, 2002·15 cites·19 claims
- 0568US9087839B2Semiconductor structures with metal linesIBM·Filed 2013·Granted Jul 21, 2015·2 cites·20 claims
- 0665US5518945AMethod of making a diffused lightly doped drain device with built in etch stopIBM·Filed 1995·Granted May 21, 1996·37 cites·9 claims
- 0763US7271044B2CMOS (complementary metal oxide semiconductor) technologyIBM·Filed 2005·Granted Sep 18, 2007·2 cites·10 claims
- 0862US5985768AMethod of forming a semiconductorIBM·Filed 1997·Granted Nov 16, 1999·21 cites·39 claims
- 0955US10607899B2Nano deposition and ablation for the repair and fabrication of integrated circuitsIBM·Filed 2017·Granted Mar 31, 2020·0 cites·5 claims
- 1052US9059258B2Controlled metal extrusion opening in semiconductor structure and method of formingIBM·Filed 2013·Granted Jun 16, 2015·0 cites·14 claims
- 1151US9484301B2Controlled metal extrusion opening in semiconductor structure and method of formingGLOBALFOUNDRIES INC·Filed 2015·Granted Nov 1, 2016·0 cites·2 claims
- 1251US7696037B2CMOS (complementary metal oxide semiconductor) technologyIBM·Filed 2008·Granted Apr 13, 2010·0 cites·5 claims
- 1349US7462528B2CMOS (Complementary metal oxide semiconductor) technology with leakage current mitigationIBM·Filed 2007·Granted Dec 9, 2008·0 cites·4 claims
- 1443US6121064ASTI fill for SOI which makes SOI inspectableIBM·Filed 1999·Granted Sep 19, 2000·12 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →